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1. 发明申请

US20060081792A1 Alignment systems and methods for lithographic systems 有权
公开(公告)号：US20060081792A1
公开(公告)日：2006-04-20
申请号：US11294559
申请日：2005-12-06
申请人： Franciscus Van Bilsen , Jacobus Burghoorn , Richard Franciscus Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Tolsma , Hubertus Simons , Johny Schuurhuis , Sicco Schets , Brian Lee , Allan Dunbar
发明人： Franciscus Van Bilsen , Jacobus Burghoorn , Richard Franciscus Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Tolsma , Hubertus Simons , Johny Schuurhuis , Sicco Schets , Brian Lee , Allan Dunbar
IPC分类号： G01N21/86
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

2. 发明申请

US20060081791A1 Alignment systems and methods for lithographic systems 审中-公开
公开(公告)号：US20060081791A1
公开(公告)日：2006-04-20
申请号：US11294475
申请日：2005-12-06
申请人： Franciscus Van Bilsen , Jacobus Burghoorn , Richard Franciscus Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Tolsma , Hubertus Gertrudus Simons , Johny Schuurhuis , Sicco Schets , Brian Lee , Allan Dunbar
发明人： Franciscus Van Bilsen , Jacobus Burghoorn , Richard Franciscus Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Tolsma , Hubertus Gertrudus Simons , Johny Schuurhuis , Sicco Schets , Brian Lee , Allan Dunbar
IPC分类号： G01N21/86
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

3. 发明申请

US20060081790A1 Alignment systems and methods for lithographic systems 审中-公开
标题翻译：光刻系统的对准系统和方法
公开(公告)号：US20060081790A1
公开(公告)日：2006-04-20
申请号：US11294473
申请日：2005-12-06
申请人： Franciscus Van Bilsen , Jacobus Burghoorn , Richard Franciscus Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Tolsma , Hubertus Gertrudus Simons , Johny Schuurhuis , Sicco Schets , Brian Lee , Allan Dunbar
发明人： Franciscus Van Bilsen , Jacobus Burghoorn , Richard Franciscus Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Tolsma , Hubertus Gertrudus Simons , Johny Schuurhuis , Sicco Schets , Brian Lee , Allan Dunbar
IPC分类号： G01N21/86
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.
摘要翻译：用于光刻设备的对准系统具有对准辐射源; 具有第一检测器通道和第二检测器通道的检测系统; 以及与检测系统通信的位置确定单元。位置确定单元被构造成以组合方式处理来自所述第一和第二检测器通道的信息，以确定工件上的对准标记的位置，该组合考虑到工件的制造过程。光刻设备具有上述对准系统。使用光刻设备对准和制造器件的方法分别使用上述对准系统和光刻设备。

4. 发明申请

US20050189502A1 Alignment systems and methods for lithographic systems 有权
标题翻译：光刻系统的对准系统和方法
公开(公告)号：US20050189502A1
公开(公告)日：2005-09-01
申请号：US10665404
申请日：2003-09-22
申请人： Franciscus Van Bilsen , Jacobus Burghoorn , Richard Johannes Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Y Koren , Hoite Tolsma , Hubertus Simons , Johny Schuurhuis , Sicco Schets , Brian Lee , Allan Dunbar
发明人： Franciscus Van Bilsen , Jacobus Burghoorn , Richard Johannes Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Y Koren , Hoite Tolsma , Hubertus Simons , Johny Schuurhuis , Sicco Schets , Brian Lee , Allan Dunbar
IPC分类号： G01B11/00 , G01B11/02 , G01B21/00 , G02B5/18 , G03F7/00 , G03F7/20 , G03F9/00 , G03F9/02 , H01L21/027 , H01L21/3205 , H01L21/68 , H01L23/52 , H01S3/00 , G01N21/86
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.
摘要翻译：用于光刻设备的对准系统具有对准辐射源; 具有第一检测器通道和第二检测器通道的检测系统; 以及与检测系统通信的位置确定单元。位置确定单元被构造成以组合方式处理来自所述第一和第二检测器通道的信息，以确定工件上的对准标记的位置，该组合考虑到工件的制造过程。光刻设备具有上述对准系统。使用光刻设备对准和制造器件的方法分别使用上述对准系统和光刻设备。

5. 发明申请

US20070176128A1 Alignment systems and methods for lithographic systems 有权
公开(公告)号：US20070176128A1
公开(公告)日：2007-08-02
申请号：US11643772
申请日：2006-12-22
申请人： Franciscus Van Bilsen , Jacobus Burghoorn , Richard Franciscus Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Y Koren , Hoite Theodoor Tolsma , Hubertus Gertrudus Simons , Johny Schuurhuis , Sicco Schets , Brian Bok Lee , Allan Dunbar
发明人： Franciscus Van Bilsen , Jacobus Burghoorn , Richard Franciscus Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Y Koren , Hoite Theodoor Tolsma , Hubertus Gertrudus Simons , Johny Schuurhuis , Sicco Schets , Brian Bok Lee , Allan Dunbar
IPC分类号： G01N21/86
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

6. 发明申请

US20060091330A1 Alignment systems and methods for lithographic systems 有权
公开(公告)号：US20060091330A1
公开(公告)日：2006-05-04
申请号：US11294476
申请日：2005-12-06
申请人： Franciscus Van Bilsen , Jacobus Burghoorn , Richard Johannes Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Koren , Hoite Pieter Tolsma , Hubertus Johannes Simons , Johny Schuurhuis , Sicco Schets , Brian Lee , Allan Dunbar
发明人： Franciscus Van Bilsen , Jacobus Burghoorn , Richard Johannes Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Koren , Hoite Pieter Tolsma , Hubertus Johannes Simons , Johny Schuurhuis , Sicco Schets , Brian Lee , Allan Dunbar
IPC分类号： G01N21/86
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

7. 发明申请

US20060103822A1 ALIGNMENT STRATEGY OPTIMIZATION METHOD 有权
标题翻译：对齐策略优化方法
公开(公告)号：US20060103822A1
公开(公告)日：2006-05-18
申请号：US10990335
申请日：2004-11-17
申请人： Roy Werkman , Franciscus Van Bilsen , Bart Swinnen
发明人： Roy Werkman , Franciscus Van Bilsen , Bart Swinnen
IPC分类号： G03B27/52
CPC分类号： G03F7/70633 , G03F9/7046
摘要： The invention relates to a method of optimizing an alignment strategy for processing batches of substrates in a lithographic projection apparatus. First, all substrates in a plurality of batches of substrates in the lithographic projection apparatus are sequentially aligned and exposed using a predefined alignment strategy. Then, alignment data is determined for each substrate in the plurality of batches of substrates. Next, at least one substrate in each batch of substrates is selected to render a set of selected substrates comprising at least one substrate in each batch. In a metrology tool, overlay data for each of the selected substrates is determined. Then, overlay indicator values for a predefined overlay indicator are calculated for the predefined alignment strategy and for other possible alignment strategies. In this calculation, the alignment data and the overlay data of the selected substrates is used. Finally, an optimal alignment strategy is determined, the strategy being defined as alignment strategy among the predefined alignment strategy and the other possible alignment strategies with a lowest overlay indicator value.
摘要翻译：本发明涉及一种优化用于在光刻投影设备中处理批次的基板的对准策略的方法。首先，光刻投影设备中的多批基板中的所有基板使用预定义的对准策略顺序对准和曝光。然后，确定多批基板中的每个基板的对准数据。接下来，选择每批衬底中的至少一个衬底，以在每批中提供包含至少一个衬底的一组选定衬底。在计量工具中，确定每个所选择的基底的覆盖数据。然后，为预定义的对齐策略和其他可能的对准策略计算预定义重叠指示符的覆盖指示符值。在该计算中，使用所选择的基板的对准数据和覆盖数据。最后，确定最佳对准策略，该策略被定义为预定义对准策略中的对准策略和具有最低覆盖指标值的其他可能的对准策略。

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