专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07250611B2 LED curing apparatus and method 失效
标题翻译： LED固化装置及方法
公开(公告)号：US07250611B2
公开(公告)日：2007-07-31
申请号：US10726257
申请日：2003-12-02
申请人： Francis M. Aguirre , Michele A. Craton , Jack W. Lai , David L. Phillips , Peter T. Benson , Gordon D. Henson , Michael A. Meis
发明人： Francis M. Aguirre , Michele A. Craton , Jack W. Lai , David L. Phillips , Peter T. Benson , Gordon D. Henson , Michael A. Meis
IPC分类号： G01N21/00 , G01N21/33
CPC分类号： G02B6/4249 , A61C19/003 , A61C19/004 , F21K9/69 , F21V29/80 , G02B6/06 , G02B6/4201 , G02B6/4206 , G02B6/423 , G02B6/4231 , G02B6/4269 , G02B6/4298
摘要： A radiation curing apparatus comprises a plurality of solid state radiation sources to generate radiation that cures a first material. The solid state radiation sources can be disposed in an array pattern. Optical concentrators, arranged in a corresponding array pattern, receive radiation from corresponding solid state radiation sources. The concentrated radiation is received by a plurality of optical waveguides, also arranged in a corresponding array pattern. Each optical waveguide includes a first end to receive the radiation and a second end to output the radiation. The curing apparatus can be utilized for continuous substrate, sheet, piece part, spot curing, and/or 3D radiation-cure processes.
摘要翻译：辐射固化装置包括多个固态辐射源，以产生固化第一材料的辐射。固态辐射源可以以阵列图案布置。以相应的阵列图案布置的光学聚光器接收来自相应固态辐射源的辐射。集中辐射由多个光波导接收，光波导也以相应的阵列图形排列。每个光波导包括用于接收辐射的第一端和用于输出辐射的第二端。固化装置可以用于连续的基材，片，片部分，点固化和/或3D辐射固化过程。

2. 发明授权

US07189983B2 LED modifying apparatus and method 失效
公开(公告)号：US07189983B2
公开(公告)日：2007-03-13
申请号：US10869237
申请日：2004-06-16
申请人： Francis M. Aguirre , Peter T. Benson , Michele A. Craton , Gordon D. Henson , David L. Hofeldt , Jack W. Lai , Michael A. Meis , David L. Phillips
发明人： Francis M. Aguirre , Peter T. Benson , Michele A. Craton , Gordon D. Henson , David L. Hofeldt , Jack W. Lai , Michael A. Meis , David L. Phillips
IPC分类号： G01N21/33 , G01N21/00 , G02B6/43
CPC分类号： G02B6/4249 , A61C19/003 , A61C19/004 , F21K9/69 , F21V29/80 , G02B6/06 , G02B6/4201 , G02B6/4206 , G02B6/423 , G02B6/4231 , G02B6/4269 , G02B6/4298
摘要： A radiation modifying apparatus comprises a plurality of solid state radiation sources to generate radiation that modifies a first material such as by curing or creating alignment through polarization. The solid state radiation sources can be disposed in an array pattern. Optical concentrators, arranged in a corresponding array pattern, receive radiation from corresponding solid state radiation sources. The concentrated radiation is received by a plurality of optical waveguides, also arranged in a corresponding array pattern. Each optical waveguide includes a first end to receive the radiation and a second end to output the radiation. The radiation modifying apparatus can be utilized for continuous substrate, sheet, piece part, spot curing, and/or 3D radiation-cure processes.

3. 发明授权

US07202489B2 LED modifying apparatus and method 失效
公开(公告)号：US07202489B2
公开(公告)日：2007-04-10
申请号：US10869235
申请日：2004-06-16
申请人： Francis M. Aguirre , Michele A. Craton , Jack W. Lai , David L. Phillips , Peter T. Benson
发明人： Francis M. Aguirre , Michele A. Craton , Jack W. Lai , David L. Phillips , Peter T. Benson
IPC分类号： G01N21/00 , G01N21/33 , G02B6/43
CPC分类号： G02B6/4249 , A61C19/003 , A61C19/004 , F21K9/69 , F21V29/80 , G02B6/06 , G02B6/4201 , G02B6/4206 , G02B6/423 , G02B6/4231 , G02B6/4269 , G02B6/4298
摘要： A radiation modifying apparatus comprises a plurality of solid state radiation sources to generate radiation that modifies a first material such as by curing or creating alignment through polarization. The solid state radiation sources can be disposed in an array pattern. Optical concentrators, arranged in a corresponding array pattern, receive radiation from corresponding solid state radiation sources. The concentrated radiation is received by a plurality of optical waveguides, also arranged in a corresponding array pattern. Each optical waveguide includes a first end to receive the radiation and a second end to output the radiation. The radiation modifying apparatus can be utilized for continuous substrate, sheet, piece part, spot curing, and/or 3D radiation-cure processes.

4. 发明授权

US07202490B2 LED modifying apparatus and method 失效
标题翻译： LED修改装置及方法
公开(公告)号：US07202490B2
公开(公告)日：2007-04-10
申请号：US10869236
申请日：2004-06-16
申请人： Francis M. Aguirre , Peter T. Benson , Michele A. Craton , David L. Hofeldt , Jack W. Lai , David L. Phillips
发明人： Francis M. Aguirre , Peter T. Benson , Michele A. Craton , David L. Hofeldt , Jack W. Lai , David L. Phillips
IPC分类号： G02B6/43 , G01N21/33 , G01N21/00
CPC分类号： G02B6/4249 , A61C19/003 , A61C19/004 , F21K9/69 , F21V29/80 , G02B6/06 , G02B6/4201 , G02B6/4206 , G02B6/423 , G02B6/4231 , G02B6/4269 , G02B6/4298
摘要： A radiation modifying apparatus comprises a plurality of solid state radiation sources to generate radiation that modifies a first material such as by curing or creating alignment through polarization. The solid state radiation sources can be disposed in an array pattern. Optical concentrators, arranged in a corresponding array pattern, receive radiation from corresponding solid state radiation sources. The concentrated radiation is received by a plurality of optical waveguides, also arranged in a corresponding array pattern. Each optical waveguide includes a first end to receive the radiation and a second end to output the radiation. The radiation modifying apparatus can be utilized for continuous substrate, sheet, piece part, spot curing, and/or 3D radiation-cure processes.
摘要翻译：辐射修改装置包括多个固态辐射源，以产生修改第一材料的辐射，例如通过固化或通过极化产生对准。固态辐射源可以以阵列图案布置。以相应的阵列图案布置的光学聚光器接收来自相应固态辐射源的辐射。集中辐射由多个光波导接收，光波导也以相应的阵列图形排列。每个光波导包括用于接收辐射的第一端和用于输出辐射的第二端。辐射修改设备可以用于连续的基片，片，片部分，点固化和/或3D辐射固化过程。

5. 发明申请

US20090029054A1 SYSTEM AND METHOD FOR MAKING A FILM HAVING A MATTE FINISH 有权
标题翻译：制作薄膜的系统和方法
公开(公告)号：US20090029054A1
公开(公告)日：2009-01-29
申请号：US11782772
申请日：2007-07-25
申请人： Robert A. Yapel , Francis M. Aguirre , John P. Baetzold , Olester Benson, JR. , Andrew J. Henderson , Mitchell A. F. Johnson , Leslie A. Kreilich , Steven J. McMan , David L. Phillips , Bruce D. Shalles
发明人： Robert A. Yapel , Francis M. Aguirre , John P. Baetzold , Olester Benson, JR. , Andrew J. Henderson , Mitchell A. F. Johnson , Leslie A. Kreilich , Steven J. McMan , David L. Phillips , Bruce D. Shalles
IPC分类号： B05D3/12 , B05C11/02
CPC分类号： B05D5/02 , B05C9/12 , B05D1/02 , B05D1/18 , B05D1/305 , B05D1/40 , B05D3/0254 , B05D3/0263 , B05D3/065 , B05D3/067 , B05D3/068 , B05D5/061 , B05D2252/02
摘要： A system and a method for providing a film having a matte finish. The system includes means for providing a coated substrate, the coated substrate comprising a first coatable material applied to a substrate, the coatable material forming a first major surface of the coated substrate; means for changing the viscosity of the first coatable material from a first viscosity to a second viscosity; a face-side roller having an outer surface positioned to contact the first major surface of the coated substrate to impart a matte finish thereon; and optionally, means for hardening the first coatable material. The method of the invention includes the steps of (1) providing a coated substrate comprising a coatable material disposed on a substrate, the coatable material providing a first major surface of the coated substrate; (2) changing the viscosity of the coatable material from the initial viscosity to a second viscosity; (3) contacting the first major surface of the coated substrate with at least one face-side roller to impart a matte finish; and (4) optionally, hardening the coatable material to provide the film.
摘要翻译：一种提供具有无光饰面的薄膜的系统和方法。所述系统包括用于提供涂覆的基底的装置，所述涂覆的基底包括施加到基底的第一可涂覆材料，所述可涂覆材料形成所述涂覆的基底的第一主表面; 用于将第一可涂覆材料的粘度从第一粘度改变为第二粘度的装置; 表面侧辊具有外表面，所述外表面定位成与所述涂覆的基底的所述第一主表面接触以在其上赋予磨光面; 以及任选的用于硬化第一可涂覆材料的装置。本发明的方法包括以下步骤：（1）提供涂覆的基材，其包含设置在基材上的可涂覆材料，所述可涂覆材料提供涂覆基材的第一主表面; （2）将可涂覆材料的粘度从初始粘度改变为第二粘度; （3）使涂覆的基材的第一主表面与至少一个表面侧辊接触以赋予无光泽的光洁度; 和（4）任选地，硬化可涂覆材料以提供膜。

6. 发明授权

US08623140B2 System and method for making a film having a matte finish 有权
标题翻译：用于制造具有无光饰面的薄膜的系统和方法
公开(公告)号：US08623140B2
公开(公告)日：2014-01-07
申请号：US11782772
申请日：2007-07-25
申请人： Robert A. Yapel , Francis M. Aguirre , John P. Baetzold , Olester Benson, Jr. , Andrew J. Henderson , Mitchell A. F. Johnson , Leslie A. Kreilich , Steven J. McMan , David L. Phillips , Bruce D. Shalles
发明人： Robert A. Yapel , Francis M. Aguirre , John P. Baetzold , Olester Benson, Jr. , Andrew J. Henderson , Mitchell A. F. Johnson , Leslie A. Kreilich , Steven J. McMan , David L. Phillips , Bruce D. Shalles
IPC分类号： B05C11/00 , B05C3/00
CPC分类号： B05D5/02 , B05C9/12 , B05D1/02 , B05D1/18 , B05D1/305 , B05D1/40 , B05D3/0254 , B05D3/0263 , B05D3/065 , B05D3/067 , B05D3/068 , B05D5/061 , B05D2252/02
摘要： A system and a method for providing a film having a matte finish. The system includes means for providing a coated substrate, the coated substrate comprising a first coatable material applied to a substrate, the coatable material forming a first major surface of the coated substrate; means for changing the viscosity of the first coatable material from a first viscosity to a second viscosity; a face-side roller having an outer surface positioned to contact the first major surface of the coated substrate to impart a matte finish thereon; and optionally, means for hardening the first coatable material. The method of the invention includes the steps of (1) providing a coated substrate comprising a coatable material disposed on a substrate, the coatable material providing a first major surface of the coated substrate; (2) changing the viscosity of the coatable material from the initial viscosity to a second viscosity; (3) contacting the first major surface of the coated substrate with at least one face-side roller to impart a matte finish; and (4) optionally, hardening the coatable material to provide the film.
摘要翻译：一种提供具有无光饰面的薄膜的系统和方法。所述系统包括用于提供涂覆的基底的装置，所述涂覆的基底包括施加到基底的第一可涂覆材料，所述可涂覆材料形成所述涂覆的基底的第一主表面; 用于将第一可涂覆材料的粘度从第一粘度改变为第二粘度的装置; 表面侧辊具有外表面，所述外表面定位成与所述涂覆的基底的所述第一主表面接触以在其上赋予磨光面; 以及任选的用于硬化第一可涂覆材料的装置。本发明的方法包括以下步骤：（1）提供涂覆的基材，其包含设置在基材上的可涂覆材料，所述可涂覆材料提供涂覆基材的第一主表面; （2）将可涂覆材料的粘度从初始粘度改变为第二粘度; （3）使涂覆的基材的第一主表面与至少一个表面侧辊接触以赋予无光泽的光洁度; 和（4）任选地，硬化可涂覆材料以提供膜。

7. 发明申请

US20110168924A1 CHARGE ALTERATION USING ULTRAVIOLET RADIATION 审中-公开
标题翻译：使用超紫外线辐射进行充电改造
公开(公告)号：US20110168924A1
公开(公告)日：2011-07-14
申请号：US12808699
申请日：2008-12-16
申请人： Richard M. Jendrejack , David L. Phillips , Mitchell A.F. Johnson , Peter T. Benson
发明人： Richard M. Jendrejack , David L. Phillips , Mitchell A.F. Johnson , Peter T. Benson
IPC分类号： H05F3/06
CPC分类号： H05F3/06
摘要： A system(109) for altering charge of a dielectric material (90) uses ultraviolet radiation. The system includes a gas source (102) and an ultraviolet radiation source (104). The gas source (102) introduced a gas (103) to a region adjacent the dielectric material (90). The ultraviolet radiation source (104) is arranged to irradiate the region to adjust charge on the dielectric material. A method of altering charge on a dielectric material (90) is also disclosed in which a gas (103) is introduced to a region adjacent the dielectric materia (90)1. The region is then irradiated with the ultraviolet radiation (105) to alter charge on the dielectric material (90).
摘要翻译：用于改变电介质材料（90）的电荷的系统（109）使用紫外线辐射。该系统包括气体源（102）和紫外线辐射源（104）。气体源（102）将气体（103）引入邻近电介质材料（90）的区域。紫外线辐射源（104）布置成照射该区域以调节电介质材料上的电荷。还公开了一种改变介电材料（90）上的电荷的方法，其中将气体（103）引入到与介电材料（90）1相邻的区域。然后用紫外线辐射（105）照射该区域以改变电介质材料（90）上的电荷。

8. 发明授权

US08961146B2 Electronically controlled liquid dispensing system with modular tubing and power design 有权
标题翻译：电子控制液体分配系统，具有模块化管道和电源设计
公开(公告)号：US08961146B2
公开(公告)日：2015-02-24
申请号：US13221253
申请日：2011-08-30
申请人： David L. Phillips , Humberto Valenzuela Meza , Jignesh N. Pandya , Ujjaval D. Joshi
发明人： David L. Phillips , Humberto Valenzuela Meza , Jignesh N. Pandya , Ujjaval D. Joshi
IPC分类号： F04B49/10 , B67D1/00 , B67D1/08 , B67D1/12
CPC分类号： B67D1/0004 , B67D1/0888 , B67D1/10 , B67D1/1247 , B67D2001/1259 , F04B49/065 , F04B2203/0205 , F04B2205/05 , F04D15/0218
摘要： Apparatus is provided featuring a switch-mode power supply (SMPS) having a power circuit component in combination with a SMPS controller. The power circuit component may be configured to provide power to a pump that provides fluid from a container to some other device, including an appliance. The SMPS controller may be configured to receive signaling containing information about at least one control parameter selected from a group including a pressure at an outlet of the pump, a fluid level in the container and the temperature of a motor of the pump, and also may be configured to shut off the power provided to the pump based at least partly on the signaling received so that the power circuit component substantially does not draw power and heat up when the pump is shut off.
摘要翻译：提供了具有开关模式电源（SMPS）的装置，其具有与SMPS控制器组合的电源电路部件。电力电路部件可以被配置为向泵提供电力，所述泵将容器从容器提供到包括器具在内的其它设备。 SMPS控制器可以被配置为接收包含关于从包括泵的出口处的压力，容器中的液位和泵的电动机的温度的组中选择的至少一个控制参数的信息，并且还可以被配置为至少部分地基于所接收的信号来切断提供给泵的功率，使得当泵关闭时，电力电路部件基本上不吸入电力并加热。

9. 发明授权

US08474788B2 Control utilizing non-contact switching for control and current sensing technology for operating a valve 有权
标题翻译：利用非接触开关控制和电流检测技术来控制阀门的控制
公开(公告)号：US08474788B2
公开(公告)日：2013-07-02
申请号：US12578725
申请日：2009-10-14
申请人： David L. Phillips , Rufino Naval, Jr. , Jesus Estrada
发明人： David L. Phillips , Rufino Naval, Jr. , Jesus Estrada
IPC分类号： F16K31/02
CPC分类号： F16K37/0083 , Y10T137/86389
摘要： The present invention provides a control device featuring a control module featuring one or more modules configured to provide a first control signal for controlling a first device in order to open or close a second device; and also configured to respond to a change in a parameter sensed in relation to controlling the first device, and to provide a second control signal for controlling the first device based at least partly on the change in the parameter in relation to time. The first device may be a motor; the second device is a valve; and the parameter may be current. In operation, the first control signal is for turning on the motor in order to open or close the valve, and the second control signal is for turning off the motor in order to open or close the valve.
摘要翻译：本发明提供了一种控制装置，其特征在于控制模块具有一个或多个模块，该模块被配置为提供用于控制第一装置的第一控制信号，以便打开或关闭第二装置; 并且还被配置为响应于关于控制第一设备而感测的参数的变化，并且至少部分地基于参数相对于时间的变化来提供用于控制第一设备的第二控制信号。第一装置可以是电动机; 第二装置是阀; 并且该参数可以是当前的。在操作中，第一控制信号用于打开或关闭电动机，并且第二控制信号用于关闭电动机以便打开或关闭阀门。

10. 发明申请

US20110255992A1 Pump controller 有权
标题翻译：泵控制器
公开(公告)号：US20110255992A1
公开(公告)日：2011-10-20
申请号：US12799294
申请日：2010-04-20
申请人： Derrick Thanh Tran , Thang Quoc Dang , Rufino Naval, JR. , David L. Phillips
发明人： Derrick Thanh Tran , Thang Quoc Dang , Rufino Naval, JR. , David L. Phillips
IPC分类号： F04B49/06
CPC分类号： F04B49/065 , F04B2203/0201 , F04B2205/03
摘要： The present invention provides a technique using current sensing to control the pressure at constant level without the direct sensing of the pressure. This technique will help to reduce dependency solely on switch or sensor and their non linearity and other associated problems such as the non-repetitive behavior, being affected by EMI etc. The technique includes using a pump controller featuring one or more modules configured to respond to one or more input signals containing information about current provided from a pump; and configured to provide one or more output signals containing information to control the pump to operate at a substantially constant pressure without the direct sensing of pump pressure. The one or more modules control the operation of the pump based at least partly on a table of characteristics related to voltage and current that is calibrated for each pump.
摘要翻译：本发明提供了一种使用电流检测来在不直接感测压力的情况下将压力控制在恒定水平的技术。这种技术将有助于减少仅依赖于开关或传感器及其非线性度和其他相关问题，如不重复行为，受EMI等影响。该技术包括使用一个泵控制器，其特征在于一个或多个模块配置为响应包含关于从泵提供的电流的信息的一个或多个输入信号; 并且被配置为提供包含信息的一个或多个输出信号以控制泵以基本恒定的压力操作，而不直接感测泵压力。所述一个或多个模块至少部分地基于与为每个泵校准的电压和电流相关的特性表来控制泵的操作。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式