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1. 发明授权

US5961724A Techniques for reducing particulate contamination on a substrate during processing 失效
标题翻译：在加工过程中减少基材上的颗粒污染的技术
公开(公告)号：US5961724A
公开(公告)日：1999-10-05
申请号：US52522
申请日：1998-03-30
申请人： Farro Kaveh , Brett C. Richardson
发明人： Farro Kaveh , Brett C. Richardson
IPC分类号： H01L21/00 , C23G16/00
CPC分类号： H01L21/67017 , Y10S156/916
摘要： A substrate processing system configured for processing a substrate utilizing source gas released from at least one gas jet into a substrate processing chamber of the substrate processing system. The substrate processing system includes a first gas port configured to introduce the gas jet into the substrate processing chamber and a directional blocking wall protruding above a plane formed by the opening of the first gas port. The directional blocking wall is disposed closer to a first portion of a circumference of the first gas port than a second portion of the circumference. The first portion of the circumference is configured to be disposed toward a given portion of the substrate processing chamber when the gas distribution plate is positioned within the substrate processing chamber such that the directional blocking wall is disposed between the gas jet and the given portion of the substrate processing chamber, thereby preferentially reducing the entrainment of the gas from the given portion of the substrate processing chamber into the gas jet when the gas jet is released into the substrate processing chamber.
摘要翻译：一种衬底处理系统，被配置为使用从至少一个气体射流释放到衬底处理系统的衬底处理室中的源气体来处理衬底。基板处理系统包括：第一气体端口，被配置为将气体射流引入基板处理室;以及方向阻挡壁，其突出在由第一气体端口的开口形成的平面上方。所述方向阻挡壁比所述圆周的第二部分更靠近所述第一气体端口的圆周的第一部分设置。圆周的第一部分构造成当气体分配板位于基板处理室内时朝向基板处理室的给定部分设置，使得方向阻挡壁设置在气体射流和给定部分之间从而当气体射流被释放到衬底处理室中时，优先地将气体从衬底处理室的给定部分夹带到气体射流中。

2. 发明授权

US08744624B1 Substrate alignment system 有权
标题翻译：基板对准系统
公开(公告)号：US08744624B1
公开(公告)日：2014-06-03
申请号：US11382721
申请日：2006-05-11
申请人： Farro Kaveh , Martin P. Aalund
发明人： Farro Kaveh , Martin P. Aalund
IPC分类号： G06F19/00
CPC分类号： H01L21/681
摘要： A substrate loading system, having a vision system adapted to view a substrate and provide position signals indicative of substrate position. A controller receives the position signals from the vision system, determines the substrate position, and sends transport signals to a robot arm. The robot arm engages the substrate in a beginning location and a beginning position and transports the substrate to a desired location and a desired position, based at least in part on the transport signals received from the controller.
摘要翻译：一种基板装载系统，具有适于观察基板并提供指示基板位置的位置信号的视觉系统。控制器接收来自视觉系统的位置信号，确定衬底位置，并将运送信号发送到机器人手臂。至少部分地基于从控制器接收的传送信号，机器人臂在初始位置和起始位置处接合衬底并且将衬底传送到期望位置和期望位置。

3. 发明授权

US06622286B1 Integrated electronic hardware for wafer processing control and diagnostic 有权
标题翻译：用于晶圆处理控制和诊断的集成电子硬件
公开(公告)号：US06622286B1
公开(公告)日：2003-09-16
申请号：US09608599
申请日：2000-06-30
申请人： Tuan Ngo , Farro Kaveh , Connie Lam , Chung-Ho Huang , Tuqiang Ni , Anthony T. Le , Steven Salkow
发明人： Tuan Ngo , Farro Kaveh , Connie Lam , Chung-Ho Huang , Tuqiang Ni , Anthony T. Le , Steven Salkow
IPC分类号： G06F1750
CPC分类号： H01J37/32431 , G05B19/0421 , G05B2219/2208 , G05B2219/25434 , G05B2219/45031 , H01J37/32 , H01J37/32935
摘要： A central controller for use in a semiconductor manufacturing equipment integrates a plurality of controllers with an open architecture allowing real-time communication between the various control loops. The central controller includes at least one central processing unit (CPU) executing high level input output (i/o) and control algorithms and at least one integrated i/o controller providing integrated interface to sensors and control hardware. The integrated i/o controller performs basic i/o and low level control functions and communicates with the CPU through a bus to perform or enable controls of various subsystems of the semiconductor manufacturing equipment.
摘要翻译：用于半导体制造设备的中央控制器将多个控制器与允许各种控制回路之间的实时通信的开放架构集成。中央控制器包括执行高电平输入输出（i / o）和控制算法的至少一个中央处理单元（CPU）以及提供与传感器和控制硬件的集成接口的至少一个集成i / o控制器。集成i / o控制器执行基本的I / O和低级控制功能，并通过总线与CPU进行通信，以执行或启用对半导体制造设备的各种子系统的控制。

4. 发明授权

US06526355B1 Integrated full wavelength spectrometer for wafer processing 有权
标题翻译：集成全波长光谱仪用于晶圆加工
公开(公告)号：US06526355B1
公开(公告)日：2003-02-25
申请号：US09539312
申请日：2000-03-30
申请人： Tuqiang Ni , Tuan Ngo , Chung-Ho Huang , Andrew Lui , Farro Kaveh
发明人： Tuqiang Ni , Tuan Ngo , Chung-Ho Huang , Andrew Lui , Farro Kaveh
IPC分类号： G06F1900
CPC分类号： H01J37/32935 , G01N23/20 , H01J37/32972
摘要： A process chamber with a computer system that controls the process chamber is connected to one or more spectrometers. The spectrometers may be part of an interferometer or may be an optical emission spectrometer. The spectrometers may be CCD or photodiode arrays of 2,048 elements. An input board forms part of the computer system and is directly connected to the spectrometers. The input board provides data from the spectrometers to dual port memory, which is directly accessible to the CPU of the computer system. The use of a state machine and adder on the input board allows computation and placement of the data from the spectrometers on to the dual port memory, so that the CPU is not needed for such placement.
摘要翻译：具有控制处理室的计算机系统的处理室连接到一个或多个光谱仪。光谱仪可以是干涉仪的一部分，也可以是光发射光谱仪。光谱仪可以是2,048个元件的CCD或光电二极管阵列。输入板构成计算机系统的一部分，并直接连接到光谱仪。输入板将数据从光谱仪提供给双端口存储器，可直接访问计算机系统的CPU。在输入板上使用状态机和加法器允许将数据从光谱仪计算和放置到双端口存储器，以便CPU不需要这样的放置。

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