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1. 发明授权

US5302356A Ultrapure water treatment system 失效
标题翻译：超纯水处理系统
公开(公告)号：US5302356A
公开(公告)日：1994-04-12
申请号：US845988
申请日：1992-03-04
申请人： Farhang F. Shadman , Robert A. Governal
发明人： Farhang F. Shadman , Robert A. Governal
IPC分类号： B01J19/12 , C02F1/32 , C02F1/72
CPC分类号： C02F1/325 , B01J19/123 , C02F1/725 , C02F2103/04 , Y10S210/90 , Y10S422/905
摘要： An ultrapure water treatment system is provided by the present invention. e system comprises a housing, a water supply means including a water inlet and a water outlet communicating with the housing and defining a path of travel of the water from said inlet to said outlet, irradiation means for irradiating water with 185 nm UV light positioned within the housing, and a catalytic filter positioned in the path of travel of the water. The catalytic filter comprises a non-polymeric porous material having a photoactive catalyst thereon. Exemplary photoactive catalysts include TiO.sub.2, ZnO, WO.sub.3, SnO.sub.2, CU.sub.2 O, and CdSe.
摘要翻译：本发明提供超纯水处理系统。该系统包括壳体，供水装置，其包括进水口和与该壳体连通的出水口，并且限定水从所述入口到所述出口的行进路径，照射装置，用于照射位于壳体和位于水的行进路径中的催化过滤器。催化过滤器包括其上具有光活性催化剂的非聚合多孔材料。示例性的光活性催化剂包括TiO 2，ZnO，WO 3，SnO 2，Cu 2 O和CdSe。

2. 发明授权

US07489141B1 Surface micro sensor and method 失效
标题翻译：表面微传感器及方法
公开(公告)号：US07489141B1
公开(公告)日：2009-02-10
申请号：US11205636
申请日：2005-08-16
申请人： Bert M. Vermeire , Farhang F. Shadman
发明人： Bert M. Vermeire , Farhang F. Shadman
IPC分类号： G01R27/00 , G01R27/04 , G01R27/32 , G01R27/08
CPC分类号： G01D5/24
摘要： The present invention provides a micro sensor for monitoring the cleaning and drying processes of surfaces of dielectric films, micro features in porous dielectric films and biologic or other cells common in microelectronics fabrication, MEMS fabrication or microbiology test system fabrication. By embedding electrodes in the surface of a supporting dielectric, the sensor can probe the surface and pores of a covering dielectric or a cell on the covering dielectric. The addition of a guard reduces the effects of any parasitic capacitance, which extends the measurement bandwidth of the sensor and allows it to be manufactured at the scale of a single cell, a feature that is particularly important for applications in microbiology.
摘要翻译：本发明提供了一种微型传感器，用于监测介电膜表面的清洁和干燥过程，多孔介电膜中的微观特征以及微电子制造，MEMS制造或微生物学测试系统制造中常见的生物或其它细胞。通过将电极嵌入支撑电介质的表面，传感器可以探测覆盖电介质或覆盖电介质上的电池的表面和孔。防护器的添加减少了任何寄生电容的影响，这扩大了传感器的测量带宽，并允许其以单个电池的规模制造，这是对微生物学应用特别重要的特征。

3. 发明授权

US08253422B2 Method of manufacture of wafers using an electro-chemical residue sensor (ECRS) 失效
标题翻译：使用电化学残留物传感器（ECRS）制造晶片的方法
公开(公告)号：US08253422B2
公开(公告)日：2012-08-28
申请号：US13048703
申请日：2011-03-15
申请人： Bert M. Vermeire , Farhang F. Shadman
发明人： Bert M. Vermeire , Farhang F. Shadman
IPC分类号： G01R31/08
CPC分类号： H01L21/67288 , G01N27/02 , H01L21/67028 , H01L21/67057
摘要： A method of improving the clean, rinse and dry processes during the manufacture of ICs, MEMS and other micro-devices to conserve solution and energy while completing the process within a specified time. An electro-chemical residue sensor (ECRS) provides in-situ and real-time measurement of residual contamination on a surface or inside void micro features within the sensor representative of conditions on production wafers. The in-situ measurements are used to design and optimize a production process. The wafers are manufactured in accordance with the production process without the ECRS.
摘要翻译：一种在制造IC，MEMS和其他微型装置的过程中改进清洁，冲洗和干燥工艺的方法，以在规定时间内完成工艺过程中节省溶液和能量。电化学残留物传感器（ECRS）提供了现场和实时测量表面上的残留污染物或传感器内的空隙微特征，代表生产晶片上的条件。原位测量用于设计和优化生产过程。晶圆根据不含ECRS的生产工艺制造。

4. 发明授权

US08120368B2 Method of monitoring the clean/rinse/dry processes of patterned wafers using an electro-chemical residue sensor (ECRS) 失效
标题翻译：使用电化学残留物传感器（ECRS）监测图案化晶片的清洁/漂洗/干燥过程的方法
公开(公告)号：US08120368B2
公开(公告)日：2012-02-21
申请号：US13047509
申请日：2011-03-14
申请人： Bert M. Vermeire , Farhang F. Shadman
发明人： Bert M. Vermeire , Farhang F. Shadman
IPC分类号： G01R31/08 , G01R27/08
CPC分类号： H01L21/67288 , G01N27/02 , H01L21/67028 , H01L21/67057
摘要： A method of improving the clean, rinse and dry processes during the manufacture of ICs, MEMS and other micro-devices to conserve solution and energy while completing the process within a specified time. An electro-chemical residue sensor (ECRS) provides in-situ and real-time measurement of residual contamination on a surface or inside void micro features within the sensor representative of conditions on production wafers. The measured impedance can be used to determine what process variables and specifically how process conditions affect the rate of change of the measured impedance. The in-situ measurements are used to design and optimize a production process and/or to monitor the production run in real-time to control the process conditions and transfer of a patterned wafer through the processes.
摘要翻译：一种在制造IC，MEMS和其他微型装置的过程中改进清洁，冲洗和干燥工艺的方法，以在规定时间内完成工艺过程中节省溶液和能量。电化学残留物传感器（ECRS）提供了现场和实时测量表面上的残留污染物或传感器内的空隙微特征，代表生产晶片上的条件。测量的阻抗可用于确定哪些过程变量，具体如何影响测量阻抗的变化率。原位测量用于设计和优化生产过程和/或实时监控生产运行，以通过该过程控制图案化晶片的工艺条件和转移。

5. 发明授权

US07932726B1 Method of design optimization and monitoring the clean/rinse/dry processes of patterned wafers using an electro-chemical residue sensor (ECRS) 失效
标题翻译：使用电化学残留物传感器（ECRS）设计优化和监测图案化晶片的清洁/漂洗/干燥工艺的方法
公开(公告)号：US07932726B1
公开(公告)日：2011-04-26
申请号：US11968726
申请日：2008-01-03
申请人： Bert M. Vermeire , Farhang F. Shadman
发明人： Bert M. Vermeire , Farhang F. Shadman
IPC分类号： G01R31/08 , G01N27/00
CPC分类号： H01L21/67288 , G01N27/02 , H01L21/67028 , H01L21/67057
摘要： A method of improving the clean, rinse and dry processes during the manufacture of ICs, MEMS and other micro-devices to conserve solution and energy while completing the process within a specified time. An electro-chemical residue sensor (ECRS) provides in-situ and real-time measurement of residual contamination on a surface or inside void micro features within the sensor representative of conditions on production wafers. The measured impedance can be used to determine what process variables and specifically how process conditions affect the rate of change of the measured impedance. The in-situ measurements are used to design and optimize a production process and/or to monitor the production run in real-time to control the process conditions and transfer of a patterned wafer through the processes.
摘要翻译：一种在制造IC，MEMS和其他微型装置的过程中改进清洁，冲洗和干燥工艺的方法，以在规定时间内完成工艺过程中节省溶液和能量。电化学残留物传感器（ECRS）提供了现场和实时测量表面上的残留污染物或传感器内的空隙微特征，代表生产晶片上的条件。测量的阻抗可用于确定哪些过程变量，具体如何影响测量阻抗的变化率。原位测量用于设计和优化生产过程和/或实时监控生产运行，以通过该过程控制图案化晶片的工艺条件和转移。

6. 发明授权

US07332902B1 Micro sensor for electrochemically monitoring residue in micro channels 失效
标题翻译：用于电化学监测微通道残留的微型传感器
公开(公告)号：US07332902B1
公开(公告)日：2008-02-19
申请号：US11205582
申请日：2005-08-16
申请人： Bert M. Vermeire , Farhang F. Shadman
发明人： Bert M. Vermeire , Farhang F. Shadman
IPC分类号： G01N27/00 , G01N27/26 , G01R27/28
CPC分类号： G01N27/07 , B01L3/5027 , B01L3/502707 , B01L2300/0645 , B01L2300/0816 , B01L2300/0887
摘要： The present invention provides a micro sensor for monitoring the cleaning and drying processes for very high aspect ratio micro channels in dielectric films oriented parallel to the fluid-solid interface during the manufacture of ICs, MEMS and other micro-devices. The micro sensor can be used to monitor “vertical” micro features common in microelectronics fabrication or “horizontal” micro features found in MEMS or microfluidic fabrication. By forming the micro channels parallel to the interface, the channels can be made with much higher and well controlled aspect ratios. In addition, multiple sensors can sense the impedance at various points along the micro features. The addition of a guard reduces the effects of any parasitic capacitance, which extends the measurement bandwidth of the sensor.
摘要翻译：本发明提供了一种微型传感器，用于在制造IC，MEMS和其它微器件期间，监测在平行于流体 - 固体界面定向的介电膜中的非常高的纵横比微通道的清洁和干燥过程。微型传感器可用于监测微电子制造中常见的“垂直”微特征或在MEMS或微流体制造中发现的“水平”微特征。通过与界面平行地形成微通道，可以制造具有更高和更好控制的纵横比的通道。此外，多个传感器可以感测沿着微特征的各个点处的阻抗。防护装置的增加可以减少任何寄生电容的影响，从而延长了传感器的测量带宽。

7. 发明授权

US5635148A Reactive membrane for filtration and purification of gases of impurities and method utilizing the same 失效
标题翻译：用于过滤和净化杂质气体的反应膜和利用其的方法
公开(公告)号：US5635148A
公开(公告)日：1997-06-03
申请号：US487148
申请日：1995-06-07
申请人： Farhang F. Shadman
发明人： Farhang F. Shadman
IPC分类号： B01D53/22 , B01D53/26 , B01D53/28 , B01D69/14 , B01D71/02 , B01J12/00 , B01J20/28 , C01B13/00 , C01B31/18 , C01B31/20
CPC分类号： B01J20/324 , B01D53/22 , B01D53/228 , B01D53/268 , B01D53/28 , B01D67/0072 , B01D69/12 , B01D69/141 , B01D71/02 , B01D71/021 , B01J12/007 , B01J20/28023 , B01J20/28033 , B01J20/28085 , B01J20/3236 , B01D2323/36 , B01D2325/12
摘要： A reactive membrane for removing impurities, such as water, oxygen and organic compounds, from a gas is provided. The reactive membrane includes a porous inorganic substrate having exposed surfaces and at least one carbon layer, which is modified to present active sites, deposited on the exposed surfaces. The active sites include metal species which are at least partially deoxygenated and are chemically bonded to the carbon layer. Methods of forming the reactive membrane and of removing impurities from a gas with the membrane are also provided.
摘要翻译：提供了用于从气体中除去诸如水，氧和有机化合物的杂质的反应膜。反应性膜包括具有暴露表面的多孔无机基材和沉积在暴露表面上的至少一个被修饰以呈现活性部位的碳层。活性位点包括至少部分脱氧并与碳层化学键合的金属物质。还提供了形成反应膜并从膜中除去气体中的杂质的方法。

8. 发明申请

US20110180106A1 METHOD OF MANUFACTURE OF WAFERS USING AN ELECTRO-CHEMICAL RESIDUE SENSOR (ECRS) 失效
标题翻译：使用电化学残留传感器（ECRS）制造波形的方法
公开(公告)号：US20110180106A1
公开(公告)日：2011-07-28
申请号：US13048703
申请日：2011-03-15
申请人： Bert M. Vermeire , Farhang F. Shadman
发明人： Bert M. Vermeire , Farhang F. Shadman
IPC分类号： B08B3/08 , B08B7/00
CPC分类号： H01L21/67288 , G01N27/02 , H01L21/67028 , H01L21/67057
摘要： A method of improving the clean, rinse and dry processes during the manufacture of ICs, MEMS and other micro-devices to conserve solution and energy while completing the process within a specified time. An electro-chemical residue sensor (ECRS) provides in-situ and real-time measurement of residual contamination on a surface or inside void micro features within the sensor representative of conditions on production wafers. The measured impedance can be used to determine what process variables and specifically how process conditions affect the rate of change of the measured impedance. The in-situ measurements are used to design and optimize a production process and/or to monitor the production run in real-time to control the process conditions and transfer of a patterned wafer through the processes.
摘要翻译：一种在制造IC，MEMS和其他微型装置的过程中改进清洁，冲洗和干燥工艺的方法，以在规定时间内完成工艺过程中节省溶液和能量。电化学残留物传感器（ECRS）提供了现场和实时测量表面上的残留污染物或传感器内的空隙微特征，代表生产晶片上的条件。测量的阻抗可用于确定哪些过程变量，具体如何影响测量阻抗的变化率。原位测量用于设计和优化生产过程和/或实时监控生产运行，以通过该过程控制图案化晶片的工艺条件和转移。

9. 发明申请

US20110166691A1 METHOD OF MONITORING THE CLEAN/RINSE/DRY PROCESSES OF PATTERNED WAFERS USING AN ELECTRO-CHEMICAL RESIDUE SENSOR (ECRS) 失效
标题翻译：使用电化学残留传感器（ECRS）监测图形波形的清洗/干燥处理方法
公开(公告)号：US20110166691A1
公开(公告)日：2011-07-07
申请号：US13047509
申请日：2011-03-14
申请人： Bert M. Vermeire , Farhang F. Shadman
发明人： Bert M. Vermeire , Farhang F. Shadman
IPC分类号： G06F19/00 , G01R27/28
CPC分类号： H01L21/67288 , G01N27/02 , H01L21/67028 , H01L21/67057
摘要： A method of improving the clean, rinse and dry processes during the manufacture of ICs, MEMS and other micro-devices to conserve solution and energy while completing the process within a specified time. An electro-chemical residue sensor (ECRS) provides in-situ and real-time measurement of residual contamination on a surface or inside void micro features within the sensor representative of conditions on production wafers. The measured impedance can be used to determine what process variables and specifically how process conditions affect the rate of change of the measured impedance. The in-situ measurements are used to design and optimize a production process and/or to monitor the production run in real-time to control the process conditions and transfer of a patterned wafer through the processes.
摘要翻译：一种在制造IC，MEMS和其他微型装置的过程中改进清洁，冲洗和干燥工艺的方法，以在规定时间内完成工艺过程中节省溶液和能量。电化学残留物传感器（ECRS）提供了现场和实时测量表面上的残留污染物或传感器内的空隙微特征，代表生产晶片上的条件。测量的阻抗可用于确定哪些过程变量，具体如何影响测量阻抗的变化率。原位测量用于设计和优化生产过程和/或实时监控生产运行，以通过该过程控制图案化晶片的工艺条件和转移。

10. 发明授权

US07317317B1 Shielded micro sensor and method for electrochemically monitoring residue in micro features 失效
标题翻译：用于电化学监测微特征残留物的屏蔽微传感器和方法
公开(公告)号：US07317317B1
公开(公告)日：2008-01-08
申请号：US11205635
申请日：2005-08-16
申请人： Bert M. Vermeire , Farhang F. Shadman
发明人： Bert M. Vermeire , Farhang F. Shadman
IPC分类号： G01R27/28 , G01R27/04
CPC分类号： G01N27/02 , G01D5/24 , G01D5/2405
摘要： The micro sensor is fabricated with a guard that shields the electrodes from the surrounding environment, thereby reducing loss of measurement signal through the parasitic capacitances to the substrate and fluid. The guards are low impedance points in the circuit that are biased to track as closely as possible the ac voltages of the respective electrodes. Each guard is suitably connected to the output of a guard buffer that supplies the current required to ensure that the guard is at all times at nearly the same voltage as the electrode it is guarding. The micro sensor has an improved signal to noise ratio (SNR) over an extended measurement frequency range (bandwidth) for monitoring in-situ the cleaning and drying processes for high aspect ratio micro features in dielectric films oriented perpendicular to the fluid-solid interface during the manufacture of ICs, MEMS and other micro-devices.
摘要翻译：微型传感器制造有一个保护屏蔽电极与周围的环境，从而减少测量信号通过寄生电容到基板和流体的损失。保护器是电路中的低阻抗点，其被偏置以尽可能接近地跟踪各个电极的交流电压。每个保护器适当地连接到保护缓冲器的输出端，保护缓冲器的输出提供所需的电流，以确保防护装置始终处于与其保护的电极几乎相同的电压。微传感器在扩展的测量频率范围（带宽）上具有改进的信噪比（SNR），用于在原位监测用于垂直于流体 - 固体界面定向的介电膜中的高纵横比微观特征的清洁和干燥过程制造IC，MEMS等微器件。

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