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1. 发明申请

US20190168444A1 METHOD FOR PRODUCING GELATIN FORMED BODY AND GELATIN FORMED BODY 审中-公开
公开(公告)号：US20190168444A1
公开(公告)日：2019-06-06
申请号：US16213648
申请日：2018-12-07
申请人： FUJIFILM Corporation
发明人： Manabu KATSUMURA , Takahiro HIRATSUKA , Hideo FUSHIMI , Yoshio ISHII , Ai OKAMURA , Hiroshi OTA , Jun ARAKAWA
IPC分类号： B29C64/112 , B29C64/209 , A61L27/22 , A61L27/50 , B29C64/188
摘要： An object of the present invention is to provide a method for producing a gelatin formed body having a minimized content of a component harmful to a living body and high biocompatibility with high shaping accuracy, and a gelatin formed body produced by the method. According to the present invention, provided is a method for producing a gelatin formed body, the method including: a step a of forming, on a substrate, a layer containing a powder which is obtained by air-drying an aqueous gelatin solution and has an average particle diameter of 25 to 200 μm; and a step b of jetting liquid droplets of an aqueous solution containing alcohols having a boiling point of 120° C. or lower toward the layer formed in the step a from a nozzle and flying the jetted liquid droplets so that the liquid droplets are landed on the layer formed in the step a, thereby forming a gelatin formed body.

2. 发明申请

US20150352252A1 CELL CONSTRUCT FOR CELL TRANSPLANTATION, BIOCOMPATIBLE POLYMER BLOCK, AND METHOD FOR PRODUCING THE SAME 审中-公开
标题翻译：用于细胞移植的细胞结构，生物成分聚合物块及其生产方法
公开(公告)号：US20150352252A1
公开(公告)日：2015-12-10
申请号：US14836504
申请日：2015-08-26
申请人： FUJIFILM CORPORATION
发明人： Kentaro NAKAMURA , Reiko IWAZAWA , Hayato MIYOSHI , Kazuhiro YAMAGUCHI , Hideo FUSHIMI
IPC分类号： A61L27/22 , A61L27/38 , A61L27/36
CPC分类号： A61L27/222 , A61L27/3604 , A61L27/3608 , A61L27/38 , A61L27/3834 , A61L27/3886 , A61L27/56 , A61L27/58 , A61L2300/64 , A61L2430/22 , C12N5/0068 , Y10T428/2982
摘要： It is an object of the present invention to provide a cell construct for cell transplantation that does not contain a substance having cytotoxicity, such as glutaraldehyde, and suppresses the necrosis of the transplanted cells in the construct (namely, having a high cell survival rate). The present invention provides a cell construct for cell transplantation comprising biocompatible polymer blocks that do not contain glutaraldehyde and at least one type of cells, wherein a plurality of biocompatible polymer blocks are disposed in gaps among a plurality of cells, and wherein the biocompatible polymer blocks have a tap density of 10 mg/cm3 or more and 500 mg/cm3 or less, or the value of the square root of the cross-sectional area/boundary length in the two-dimensional sectional image of the polymer block is 0.01 or more and 0.13 or less.
摘要翻译：本发明的目的是提供一种不含有细胞毒性的物质的细胞移植用细胞构建体，例如戊二醛，抑制构建体中移植细胞的坏死（即具有高细胞存活率）。本发明提供了一种用于细胞移植的细胞构建体，其包含不含戊二醛和至少一种类型细胞的生物相容性聚合物嵌段，其中多个生物相容性聚合物嵌段设置在多个细胞之间的间隙中，并且其中生物相容性聚合物嵌段具有10毫克/厘米3以上至500毫克/厘米3以下的振实密度，或聚合物嵌段的二维截面图中的截面积/边界长度的平方根的值为0.01以上和0.13以下。

3. 发明申请

US20140378662A1 METHOD FOR PRODUCING TISSUE REPAIR MATERIAL 审中-公开
标题翻译：生产组织修复材料的方法
公开(公告)号：US20140378662A1
公开(公告)日：2014-12-25
申请号：US14484838
申请日：2014-09-12
申请人： FUJIFILM CORPORATION
发明人： Shoji OYA , Hidekazu SAKAI , Ai KAWAKAMI , Takahiro HIRATSUKA , Hideo FUSHIMI , Kazuhiro YAMAGUCHI , Ichiro NISHIMURA , Yoshitaka OONO , Izumi OGURA
IPC分类号： A61L27/22 , A61L27/54
CPC分类号： A61L27/222 , A61L27/52 , A61L27/54 , A61L2430/02 , A61L2430/34 , A61L2430/40
摘要： A method of producing a tissue repair material, the method including: (a) obtaining a gelatin-containing intermediate that contains a gelatin and has a mesh structure, using a gelatin solution in which the gelatin is dissolved in an aqueous medium; (b) drying the gelatin-containing intermediate; and (c) cross-linking the gelatin before or after the drying of the gelatin-containing intermediate.
摘要翻译：一种生产组织修复材料的方法，所述方法包括：（a）使用其中明胶溶于水性介质中的明胶溶液获得含有明胶并具有网状结构的含明胶的中间体; （b）干燥含明胶的中间体; 和（c）在含明胶的中间体的干燥之前或之后交联明胶。

4. 发明申请

US20190167841A1 METHOD FOR PRODUCING CALCIUM PHOSPHATE MOLDED ARTICLE, CALCIUM PHOSPHATE MOLDED ARTICLE, AND MATERIAL FOR TRANSPLANTATION 审中-公开
公开(公告)号：US20190167841A1
公开(公告)日：2019-06-06
申请号：US16204987
申请日：2018-11-29
申请人： FUJIFILM Corporation
发明人： Hiroshi OTA , Manabu KATSUMURA , Kazuya KAWASAKI , Yoshio ISHII , Hideo FUSHIMI , Takahiro HIRATSUKA , Ai OKAMURA , Mamoru NISHITANI , Masayuki EZUMI
IPC分类号： A61L27/12 , A61L27/22 , B28B1/30 , B28B1/00
摘要： Provided are a method for rapidly producing a calcium phosphate molded article having high strength with high shaping precision, a calcium phosphate molded article produced by the method, and a material for transplantation. Disclosed is a method for producing a calcium phosphate molded article, the method including: step (a) of forming a layer containing a calcium phosphate powder having a ratio of the numbers of atoms of Ca/P of 1.4 to 1.8 on a substrate; and step (b) of producing a calcium phosphate molded article by jetting an organic acid solution having a pH of 3.5 or lower and including an organic acid whose calcium salt has a solubility in water of 1 g/100 mL or less, through a nozzle unit into a liquid droplet state, thereby dropping the organic acid solution onto the layer containing a calcium phosphate powder formed in step (a).

5. 发明申请

US20160008508A1 TISSUE REPAIR MATERIAL 审中-公开
标题翻译：组织修复材料
公开(公告)号：US20160008508A1
公开(公告)日：2016-01-14
申请号：US14838545
申请日：2015-08-28
申请人： FUJIFILM CORPORATION
发明人： Izumi NAKAHARA , Hideo FUSHIMI , Takahiro HIRATSUKA , Ai OKAMURA , Shoji OYA , Hidekazu SAKAI , Yoshitaka OONO
IPC分类号： A61L27/22 , A61L27/54 , A61L27/56 , C07K14/78
CPC分类号： A61L27/222 , A61L27/52 , A61L27/54 , A61L27/56 , A61L2300/412 , A61L2430/02 , C07K14/78
摘要： A tissue repair material includes gelatin granules, and the tissue repair material exhibits a water absorptivity of 800% by mass or more, and a residual ratio of 60% by mass or less after three hours of decomposition treatment using 1 mol/L hydrochloric acid. A block-shaped tissue repair material includes gelatin, and the block-shaped tissue repair material exhibits a water absorptivity of 800% by mass or more, and a residual ratio of 60% by mass or less after three hours of decomposition treatment using 1 mol/L hydrochloric acid.
摘要翻译：组织修复材料包括明胶颗粒，组织修复材料在使用1mol / L盐酸分解处理3小时后，其吸水率为800质量％以上，残留率为60质量％以下。块形组织修复材料包括明胶，并且块状组织修复材料在3小时的分解处理后，使用1摩尔，表现出800质量％以上的吸水率和60质量％以下的残留率 / L盐酸。

6. 发明申请

US20150252311A1 CLEANING COMPOSITION, CLEANING PROCESS, AND PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE 有权
标题翻译：清洁组合物，清洁工艺和生产半导体器件的方法
公开(公告)号：US20150252311A1
公开(公告)日：2015-09-10
申请号：US14717437
申请日：2015-05-20
申请人： FUJIFILM Corporation
发明人： Tomonori TAKAHASHI , Kazutaka TAKAHASHI , Atsushi MIZUTANI , Hiroyuki SEKI , Hideo FUSHIMI , Tomoo KATO
IPC分类号： C11D11/00 , H01L21/02 , C11D7/26 , H01L21/3213 , C11D7/34 , C11D7/32
CPC分类号： G03F7/425 , C09K13/00 , C09K13/06 , C11D7/08 , C11D7/265 , C11D7/3209 , C11D7/3245 , C11D7/34 , C11D7/5013 , C11D11/0047 , G03F7/422 , G03F7/423 , H01L21/02052 , H01L21/02057 , H01L21/02063 , H01L21/02068 , H01L21/02071 , H01L21/31133 , H01L21/32134 , H01L21/32136 , H01L21/32138 , H01L21/32139
摘要： A cleaning composition for removing plasma etching residue and/or ashing residue formed above a semiconductor substrate is provided that includes (component a) water, (component b) a hydroxylamine and/or a salt thereof, (component c) a basic organic compound, and (component d) an organic acid and has a pH of 7 to 9. There are also provided a cleaning process and a process for producing semiconductor device employing the cleaning composition.
摘要翻译：提供了用于去除形成在半导体衬底上的等离子体蚀刻残渣和/或灰化残留物的清洁组合物，其包括（组分a）水，（组分b）羟胺和/或其盐，（组分c）碱性有机化合物，和（组分d）有机酸，并且具有7至9的pH。还提供了一种清洁方法和使用该清洁组合物的半导体器件的制造方法。

7. 发明申请

US20140135246A1 CLEANING COMPOSITION, CLEANING PROCESS, AND PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE 审中-公开
标题翻译：清洁组合物，清洁工艺和生产半导体器件的方法
公开(公告)号：US20140135246A1
公开(公告)日：2014-05-15
申请号：US14158454
申请日：2014-01-17
申请人： FUJIFILM Corporation
发明人： Atsushi MIZUTANI , Hideo FUSHIMI , Tomonori TAKAHASHI , Kazutaka TAKAHASHI
IPC分类号： H01L21/02
CPC分类号： H01L21/02076 , C11D7/261 , C11D7/265 , C11D7/3209 , C11D11/0047 , H01L21/02063 , H01L21/02071
摘要： A cleaning method is provided that includes a step of preparing a cleaning composition containing 57 to 95 wt % of (component a) water, 1 to 40 wt % of (component b) a secondary hydroxy group- and/or tertiary hydroxy group-containing hydroxy compound, (component c) an organic acid, and (component d) a quaternary ammonium compound, the composition having a pH of 5 to 10, and a step of removing plasma etching residue formed above a semiconductor substrate by means of the cleaning composition. There are also provided a process for producing a semiconductor device that includes a step of cleaning plasma etching residue formed above a semiconductor substrate using the cleaning method, and a cleaning composition for removing plasma etching residue formed above a semiconductor substrate that contains 57 to 95 wt % of (component a) water, 1 to 40 wt % of (component b) a secondary hydroxy group- and/or tertiary hydroxy group-containing hydroxy compound, (component c) an organic acid, and (component d) a quaternary ammonium compound, the composition having a pH of 5 to 10.
摘要翻译：提供一种清洗方法，其包括制备含有57〜95重量％的（a成分）水，1〜40重量％的（成分b）含羟基和/或叔羟基的羟基化合物，（组分c）有机酸和（组分d）季铵化合物，该组合物的pH为5〜10，以及通过清洗组合物除去在半导体衬底上形成的等离子体蚀刻残渣的步骤。还提供了一种半导体器件的制造方法，该半导体器件包括使用该清洁方法清洗形成在半导体衬底上的等离子体蚀刻残渣的步骤，以及用于除去形成在半导体衬底上的等离子体蚀刻残渣的清洗组合物，（成分a）的水，1〜40重量％的（成分b）含羟基和/或叔羟基的羟基化合物，（成分c）有机酸和（成分d）季铵化合物，该组合物的pH为5〜10。

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