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1. 发明授权

US10898935B2 Stain removal device and stain removal method 有权
公开(公告)号：US10898935B2
公开(公告)日：2021-01-26
申请号：US14911208
申请日：2013-08-26
申请人： FUJI SHOJI CO., LTD.
发明人： Katsuhiro Goto , Nobuhiro Kanazawa , Tatsuya Banno
IPC分类号： B21C43/04 , B08B5/02 , B08B1/02
摘要： A stain removal device and a stain removal method for removing stain, such as scale residue or smut from the surface of a wire material by a cord-shaped member, includes a wire material winding device for winding a wire material on the surface of which the stain is deposited, a cord-shaped member which is wound on the wire material and wipes off stain attached on the surface of a wire material by a sliding movement relative to the wire material, and a cord-shaped member feed device for feeding the cord-shaped member relative to the wire material. The stain removal method includes linear feeding of a wire material, winding a cord-shaped member on the wire material, wiping off the stain attached on the surface of the wire material by rolling up the cord shaped member, and blowing air onto the surface of the wire material to blow away stain remaining thereon.

2. 发明授权

US09702044B2 Method for regenerating plating liquid, plating method, and plating apparatus 有权
公开(公告)号：US09702044B2
公开(公告)日：2017-07-11
申请号：US14349194
申请日：2012-11-27
申请人： Fuji Shoji Co., Ltd.
发明人： Tatsuya Banno , Katsuhiro Goto , Nobuhiro Kanazawa
IPC分类号： C23C18/16 , C23C18/38 , C25D21/14 , C25D5/36 , C25D7/06 , C25D21/22 , C23C18/18 , C25C1/06 , C25C1/12 , C25D3/38 , C25D3/58 , C25D17/10
CPC分类号： C23C18/1617 , C23C18/1632 , C23C18/1633 , C23C18/1637 , C23C18/1848 , C23C18/38 , C25C1/06 , C25C1/12 , C25D3/38 , C25D3/58 , C25D5/36 , C25D7/0607 , C25D17/10 , C25D21/14 , C25D21/22
摘要： A problem to be solved is to provide a method for regenerating plating liquid from plating waste liquid in a simple and easy way and a plating method utilizing the regenerating method.A method for regenerating plating liquid from plating waste liquid that is produced as a result of performing a copper plating on steel and that contains respective ions of Fe, Cu and Sn comprises repetitively performing processing steps of applying electric current with the plating waste liquid 11 side taken as a cathode 15 and electrolytic solution 12 side taken as an anode 16 in the state that the plating waste liquid 11 and the electrolytic solution 12 are connected through an anion exchange membrane 13; separating copper by making a copper deposition electrode as a result of depositing copper on the cathode 15 being in contact with the plating waste liquid 11, to turn the plating waste liquid to processed remaining liquid; and using as the anode 16 a copper deposition electrode formed previously and dissolving copper in the electrolytic solution 12 to generate copper ion-containing solution.

3. 发明授权

US09249511B2 Method for regenerating plating solution 有权
标题翻译：电镀液再生方法
公开(公告)号：US09249511B2
公开(公告)日：2016-02-02
申请号：US14759699
申请日：2013-02-05
申请人： FUJI SHOJI CO., LTD.
发明人： Nobuhiro Kanazawa , Katsuhiro Goto , Tatsuya Banno
IPC分类号： C23C18/31 , C23C18/32 , C23C18/38 , C23C18/54 , C25D21/16 , C25D21/18 , C02F1/54 , C02F1/64 , C02F1/72 , C02F1/78 , C23C18/16 , C02F1/52 , C02F101/20 , C02F103/16
CPC分类号： C23C18/1617 , C02F1/5272 , C02F1/542 , C02F1/64 , C02F1/722 , C02F1/78 , C02F2101/203 , C02F2103/16 , C23C18/31 , C23C18/38 , C23C18/48 , C23C18/54 , C25D21/18
摘要： The problem addressed by the present invention is to provide a method for facilitating the regenerating a waste plating solution as a plating solution. This method for regenerating an acidic waste plating solution containing, as ions, Fe and at least one plating metal element selected from the group consisting of Cu, Ni, Zn, Co, and Mn by removing Fe therefrom is characterized in having an addition step in which phytic acid is added to the waste plating solution to yield a phytic-acid-containing solution in which Fe ions are precipitated, and a removal step in which the precipitate is removed from the phytic-acid-containing solution to yield a regenerated plating solution.
摘要翻译：本发明的问题在于提供一种促进再生废电镀溶液作为电镀液的方法。用于再生酸性废电镀溶液的方法，其特征在于，通过从其中除去Fe，所述酸性废电镀溶液含有作为离子的Fe和从Cu，Ni，Zn，Co和Mn中选择的至少一种电镀金属元素，其特征在于，将该植酸加入到废电镀溶液中，得到Fe离子析出的含植酸的溶液，除去含有植酸的溶液中的析出物，得到再生电镀溶液。

4. 发明申请

US20150037512A1 METHOD FOR REGENERATING PLATING LIQUID, PLATING METHOD, AND PLATING APPARATUS 有权
标题翻译：再生液体，镀层方法和镀膜装置的方法
公开(公告)号：US20150037512A1
公开(公告)日：2015-02-05
申请号：US14349194
申请日：2012-11-27
申请人： Fuji Shoji Co., Ltd.
发明人： Tatsuya Banno , Katsuhiro Goto , Nobuhiro Kanazawa
IPC分类号： C23C18/16 , C23C18/18 , C23C18/38 , C25C1/12 , C25C1/06
CPC分类号： C23C18/1617 , C23C18/1632 , C23C18/1633 , C23C18/1637 , C23C18/1848 , C23C18/38 , C25C1/06 , C25C1/12 , C25D3/38 , C25D3/58 , C25D5/36 , C25D7/0607 , C25D17/10 , C25D21/14 , C25D21/22
摘要： A problem to be solved is to provide a method for regenerating plating liquid from plating waste liquid in a simple and easy way and a plating method utilizing the regenerating method.A method for regenerating plating liquid from plating waste liquid that is produced as a result of performing a copper plating on steel and that contains respective ions of Fe, Cu and Sn comprises repetitively performing processing steps of applying electric current with the plating waste liquid 11 side taken as a cathode 15 and electrolytic solution 12 side taken as an anode 16 in the state that the plating waste liquid 11 and the electrolytic solution 12 are connected through an anion exchange membrane 13; separating copper by making a copper deposition electrode as a result of depositing copper on the cathode 15 being in contact with the plating waste liquid 11, to turn the plating waste liquid to processed remaining liquid; and using as the anode 16 a copper deposition electrode formed previously and dissolving copper in the electrolytic solution 12 to generate copper ion-containing solution.
摘要翻译：要解决的问题是提供一种以简单易用的方式从电镀废液中再生电镀液的方法和利用再生方法的电镀方法。通过在钢上进行镀铜而含有Fe，Cu，Sn的各种离子而生成的镀敷废液的电镀液的再生方法包括重复进行与电镀废液11侧的电流的加工工序在电镀废液11和电解液12通过阴离子交换膜13连接的状态下作为阴极15和电解液12一侧作为阳极16; 通过在与镀液废液11接触的阴极15上沉积铜而制作铜沉积电极来分离铜，将镀液废液转化为处理的剩余液体; 并且使用先前形成的铜沉积电极作为阳极16并将铜溶解在电解液12中以产生含铜离子的溶液。

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