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    • 1. 发明申请
    • LAYER CONFIGURATION WITH IMPROVED STABILITY TO SUNLIGHT EXPOSURE
    • 具有改进的阳光照射稳定性的层配置
    • US20080290324A1
    • 2008-11-27
    • US11934385
    • 2007-11-02
    • FRANK LOUWETLouis Bollens
    • FRANK LOUWETLouis Bollens
    • H01B1/12
    • C08K5/13H01G9/028H01G11/48Y02E60/13C08L45/00
    • A composition exclusive of hydroquinone comprising at least one polymer comprising (3,4-dialkoxythiophene) monomer units, in which the two alkoxy groups may be the same or different or together represent an optionally substituted oxy-alkylene-oxy bridge, a polyanion, at least one aromatic compound exclusive of sulfo groups and containing at least two hydroxy groups and at least one polyhydroxy- and/or carboxy group or amide or lactam group containing aliphatic compound and/or at least one aprotic compound with a dielectric constant ≧15; and a layer configuration on a support, said layer configuration comprising a layer exclusive of hydroquinone comprising at least one polymer comprising optionally substituted (3,4-dialkoxythiophene) monomer units, in which the two alkoxy groups may be the same or different or together represent an optionally substituted oxy-alkylene-oxy bridge, a polyanion, at least one aromatic compound exclusive of sulfo groups and containing at least two hydroxy groups and at least one polyhydroxy- and/or carboxy group or amide or lactam group containing aliphatic compound and/or at least one aprotic compound with a dielectric constant ≧15.
    • 不含氢醌的组合物,其包含至少一种包含(3,4-二烷氧基噻吩)单体单元的聚合物,其中两个烷氧基可以相同或不同,或一起代表任选取代的氧 - 亚烷基 - 氧桥,聚阴离子, 至少一种不含磺基并且含有至少两个羟基和至少一个含羟基和/或羧基或酰胺或含内酰胺基团的脂族化合物和/或至少一种介电常数> 15的非质子化合物的芳族化合物; 所述层结构包括不含氢醌的层,所述层包含至少一种包含任选取代的(3,4-二烷氧基噻吩)单体单元的聚合物,其中两个烷氧基可以相同或不同或一起代表 任选取代的氧基 - 亚烷基 - 氧基桥,聚阴离子,至少一种不包括磺基并且含有至少两个羟基的芳族化合物和至少一个含有多羟基和/或羧基或酰胺或含内酰胺基团的脂族化合物和/ 或至少一种介电常数> = 15的非质子化合物。