专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20090097008A1 Alignment Method and Apparatus, Lithographic Apparatus, Metrology Apparatus and Device Manufacturing Method 审中-公开
标题翻译：对准方法和装置，平版印刷装置，计量装置和装置制造方法
公开(公告)号：US20090097008A1
公开(公告)日：2009-04-16
申请号：US12247452
申请日：2008-10-08
申请人： Everhardus Cornelis MOS , Arie Jeffrey Den Boef , Maurits Van Der Schaar , Stefan Carolus Jacobus Antonius Keij
发明人： Everhardus Cornelis MOS , Arie Jeffrey Den Boef , Maurits Van Der Schaar , Stefan Carolus Jacobus Antonius Keij
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G03F9/7049 , G03F9/7015 , G03F9/7088
摘要： An alignment sensor includes a spatially coherent radiation source that supplies a radiation beam to an angle-resolved scatterometer. Alignment is performed by detecting beats in the scatter spectrum during scanning of the substrate relative to the scatterometer.
摘要翻译：对准传感器包括将辐射束提供给角度分辨散射仪的空间相干辐射源。通过在扫描衬底相对于散射仪的扫描期间检测散射光谱中的拍击来执行对准。

2. 发明申请

US20110122496A1 Substrate Used in a Method and Apparatus for Angular-Resolved Spectroscopic Lithography Characterization 有权
标题翻译：用于角度分辨光谱光刻表征的方法和装置中的底物
公开(公告)号：US20110122496A1
公开(公告)日：2011-05-26
申请号：US13010424
申请日：2011-01-20
申请人： Maurits VAN DER SCHAAR , Arie Jeffrey DEN BOEF , Everhardus Cornelis MOS , Stefan Carolus Jacobus Antonius KEIJ
发明人： Maurits VAN DER SCHAAR , Arie Jeffrey DEN BOEF , Everhardus Cornelis MOS , Stefan Carolus Jacobus Antonius KEIJ
IPC分类号： G02B5/18
CPC分类号： G03F9/7076 , G03F7/70633
摘要： A substrate includes an overlay target. The overlay target can include two superposed layers. Each of the two superposed layers includes two gratings with a different pitch from each other.
摘要翻译：衬底包括覆盖目标。覆盖目标可以包括两个叠加层。两个叠加层中的每一个包括彼此具有不同间距的两个光栅。

3. 发明申请

US20090244538A1 Lithographic Apparatus and Device Manufacturing Method Using Overlay Measurement 有权
标题翻译：平版印刷设备和使用重叠测量的设备制造方法
公开(公告)号：US20090244538A1
公开(公告)日：2009-10-01
申请号：US12390528
申请日：2009-02-23
申请人： Arie Jeffrey DEN BOEF , Everhardus Cornelis MOS , Maurits VAN DER SCHAAR , Stefan Carolus Jacobus Antonius KEIJ
发明人： Arie Jeffrey DEN BOEF , Everhardus Cornelis MOS , Maurits VAN DER SCHAAR , Stefan Carolus Jacobus Antonius KEIJ
IPC分类号： G03B27/54 , G01B11/00
CPC分类号： G03B27/42 , G03F7/70633
摘要： A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate includes a reference set of gratings provided in the substrate, the reference set including two reference gratings having line elements in a first direction and one reference grating having line elements in a second, perpendicular, direction. A measurement set of gratings is provided on top of the reference set of gratings, the measurement set comprising three measurement gratings similar to the reference gratings. Two of the measurement gratings are oppositely biased in the second direction relative to the respective reference gratings. An overlay measurement device is provided to measure asymmetry of the three gratings in the reference set and the measurement set, and to derive from the measured asymmetry the overlay in both the first and second direction.
摘要翻译：布置成将图案从图案形成装置转印到衬底上的光刻设备包括设置在衬底中的参考光栅组，该参考组包括在第一方向上具有线元件的两个参考光栅和在第二方向上具有线元件的一个参考光栅，垂直，方向。光栅的测量组提供在参考光栅组的顶部，测量组包括与参考光栅相似的三个测量光栅。两个测量光栅相对于各个参考光栅在第二方向上相反地偏置。提供覆盖测量装置以测量参考组和测量组中的三个光栅的不对称性，并且从第一和第二方向上的测量的不对称性导出覆盖。

4. 发明申请

US20100092881A1 Process, Apparatus and Device 有权
标题翻译：过程，设备和设备
公开(公告)号：US20100092881A1
公开(公告)日：2010-04-15
申请号：US12516909
申请日：2007-12-03
申请人： Everhardus Cornelis MOS , Maurits Van Der Schaar , Hubertus Johannes Gertrudus Simon
发明人： Everhardus Cornelis MOS , Maurits Van Der Schaar , Hubertus Johannes Gertrudus Simon
IPC分类号： G03F7/20 , G03B27/42 , G01B11/00
CPC分类号： G03F7/70725 , G03F7/70258 , G03F7/70358 , G03F7/70458 , G03F7/70525 , G03F7/70633 , G03F7/70783
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support for a patterning device, a substrate table for a substrate, a projection system, and a control system. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The projection system is configured to project the patterned radiation beam as an image onto a target portion of the substrate along a scan path. The scan path is defined by a trajectory in a scanning direction of an exposure field of the lithographic apparatus. The control system is coupled to the support, the substrate table and the projection system for controlling an action of the support, the substrate table and the projection system, respectively. The control system is configured to correct a local distortion of the image in a region along the scan path by a temporal adjustment of the image in that region, hereby reducing the intra-field overlay errors.
摘要翻译：光刻设备包括配置成调节辐射束的照明系统，图案形成装置的支撑件，用于衬底的衬底台，投影系统和控制系统。图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。投影系统被配置为沿着扫描路径将图案化的辐射束作为图像投影到基板的目标部分上。扫描路径由光刻设备的曝光场的扫描方向上的轨迹限定。控制系统耦合到支撑件，基板台和投影系统，用于分别控制支撑件，基板台和投影系统的作用。控制系统被配置为通过在该区域中的图像的时间调整来校正沿着扫描路径的区域中的图像的局部失真，从而减少了场内重叠误差。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式