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    • 2. 发明授权
    • Permanent antistatic primer layer
    • 永久抗静电底漆层
    • US06225040B1
    • 2001-05-01
    • US08356573
    • 1994-12-15
    • Bavo MuysDirk QuintensJozef BoeykensEtienne Van ThilloGeert Defieuw
    • Bavo MuysDirk QuintensJozef BoeykensEtienne Van ThilloGeert Defieuw
    • G03C176
    • C09K3/16G03C1/89G03C1/93H01B1/127H01G11/48H01G11/56Y02E60/13Y10S430/136Y10T428/254Y10T428/31797
    • There is provided a method for preparing a biaxially oriented polyester sheet or web, with improved antistatic properties, comprising the steps of (i) stretching said polyester sheet or web first in one direction and second in a direction perpendicular thereto (ii) coating said hydrophobic polyester sheet or web, either before stretching or between said first and second stretching operation, on one or both sides, with a transparent antistatic primer layer, wherein the coating composition of said transparent antistatic primer layer comprises (1) a dispersion of a polythiophene with conjugated polymer backbone and a polymeric polyanion compound and (2) a latex polymer having hydrophilic functionality. The primer layer is coated from an aqueous composition and does not show a substantial change in resistivity depending on relative humidity or wet processing.
    • 提供了一种制备具有改进的抗静电性能的双轴取向聚酯片材或网状物的方法,包括以下步骤:(i)首先在一个方向上拉伸所述聚酯片材或纤维网,并在垂直于其的方向上拉伸所述聚酯片材或织物(ii) 在拉伸前或在所述第一和第二拉伸操作之间,在一侧或两侧上具有透明抗静电底漆层,其中所述透明抗静电底漆层的涂料组合物包含(1)聚噻吩与 共轭聚合物主链和聚合物聚阴离子化合物和(2)具有亲水官能度的胶乳聚合物。 底漆层由水性组合物涂覆,并且根据相对湿度或湿法处理不显示电阻率的实质变化。
    • 6. 发明授权
    • Antihalation dye for photothermographic recording material and a
recording process therefor
    • 用于光热敏记录材料的抗晕染染料及其记录方法
    • US5945263A
    • 1999-08-31
    • US862812
    • 1997-05-30
    • Geert DerooverEtienne Van ThilloIvan HoogmartensHans Strijckers
    • Geert DerooverEtienne Van ThilloIvan HoogmartensHans Strijckers
    • G03C1/498G03C1/825
    • G03C1/49872G03C1/49854Y10S430/145
    • A photothermographic recording material comprising a support; a photo-addressable thermally developable element comprising a substantially light-insensitive organic silver salt, photosensitive silver halide in catalytic association with the substantially light-insensitive organic silver salt spectrally sensitized to the infrared region of the electromagnetic spectrum and a binder; and in a hydrophobic layer an antihalation dye according to the general formula (I): ##STR1## wherein R.sup.1 and R.sup.15 independently represent an alkyl group or an alkyl group substituted with at least one fluorine, chlorine, bromine or an alkoxy-, aryloxy- or ester-group; R.sup.2, R.sup.3, R.sup.16 and R.sup.17 independently represent an alkyl group; R.sup.4, R.sup.5, R.sup.6, R.sup.7, R.sup.18, R.sup.19, R.sup.20 and R.sup.21 independently represent hydrogen, chlorine, bromine, fluorine or a keto-, sulfo-, carboxy-, ester-, sulfonamide-, amide-, dialkylamino-, nitro-, cyano-, alkyl-, alkenyl-, aryl-, alkoxy- or aryloxy-group; or each of R.sup.4 together with R.sup.5, R.sup.5 together with R.sup.6, R.sup.6 together with R.sup.7, R.sup.18 together with R.sup.19, R.sup.19 together with R.sup.20 or R.sup.20 together with R.sup.21 may independently constitute the atoms necessary to complete a benzene ring; R.sup.8, R.sup.9, R.sup.10 and R.sup.11 independently represent hydrogen, an alkyl group or each of R.sup.1 together with R.sup.8, R.sup.8 together with R.sup.9, R.sup.9 together with R.sup.10, R.sup.10 together with R.sup.11 or R.sup.11 together with R.sup.15 may independently constitute the atoms necessary to complete a 5-atom or 6-atom carbocylic or heterocyclic ring; R.sup.12, R.sup.13 and R.sup.14 independently represent hydrogen, chlorine, bromine or fluorine; and A.sup.- is a fluorinated alkyl or aryl anion in which the degree of fluorination is greater than 70%; a production process therefor and a photothermographic recording process therefor.
    • 一种光热记录材料,包括载体; 一种可光寻址的可热显影元件,包括基本上不光敏的有机银盐,感光卤化银与对电磁光谱的红外区域光谱敏化的基本上不光敏的有机银盐和粘合剂催化缔合; 并且在疏水层中具有根据通式(I)的防光晕染料:其中R 1和R 15独立地表示烷基或被至少一个氟,氯,溴或烷氧基 - ,芳氧基或酯 - 取代的烷基, 组; R2,R3,R16和R17独立地表示烷基; R4,R5,R6,R7,R18,R19,R20和R21独立地表示氢,氯,溴,氟或酮基,磺基,羧基,酯 - ,磺酰胺 - ,酰胺 - ,二烷基氨基 - ,硝基 - 氰基,烷基 - ,烯基 - ,芳基 - ,烷氧基 - 或芳氧基 - 或R 4与R 5,R 5,R 6,R 6一起与R 7,R 18一起与R 19,R 19一起与R 20或R 20一起与R 21一起独立地构成完成苯环所必需的原子; R 8,R 9,R 10和R 11独立地表示氢,烷基或R 1与R 8,R 8与R 9,R 9一起与R 10,R 10一起与R 11或R 11一起与R 15一起可以独立地构成完成 5-原子或6-原子碳环或杂环; R 12,R 13和R 14独立地表示氢,氯,溴或氟; A是氟化烷基或芳基阴离子,其中氟化度大于70%; 其生产方法及其光热敏记录方法。