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1. 发明授权

US5279706A Method and apparatus for fabricating a metal interconnection pattern for an integrated circuit module 失效
标题翻译：用于制造用于集成电路模块的金属互连图案的方法和装置
公开(公告)号：US5279706A
公开(公告)日：1994-01-18
申请号：US959883
申请日：1992-10-13
申请人： Ernest W. Balch , Stanton E. Weaver, Jr. , William H. King , Bernard Gorowitz
发明人： Ernest W. Balch , Stanton E. Weaver, Jr. , William H. King , Bernard Gorowitz
IPC分类号： H01L21/60 , H01L21/48 , H01L23/12 , H01L23/498 , H05K3/00 , H05K3/06 , H05K3/34 , H05K3/40 , B44C1/22 , C23F1/00
CPC分类号： H05K3/403 , H01L21/4846 , H01L23/49805 , H01L24/82 , H01L2224/48225 , H01L2224/48227 , H01L24/48 , H01L2924/00014 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01024 , H01L2924/01029 , H01L2924/01033 , H01L2924/01039 , H01L2924/01075 , H01L2924/01078 , H01L2924/01079 , H01L2924/014 , H01L2924/12042 , H01L2924/14 , H05K2203/135 , H05K3/0082 , H05K3/064 , H05K3/3442
摘要： A method for fabricating a metal interconnection pattern for an integrated circuit module is provided comprising the steps of: aligning only one face of the module, forming a metal layer on at least one other face of the module, applying a coating of photoresist to the metal layer, exposing predetermined portions of the photoresist to reflected radiation, and shaping the metal layer in accordance with the exposed photoresist portions.
摘要翻译：提供了一种用于制造用于集成电路模块的金属互连图案的方法，包括以下步骤：仅对准模块的一个面，在模块的至少另一个表面上形成金属层，向金属施加光致抗蚀剂涂层将光致抗蚀剂的预定部分暴露于反射辐射，以及根据曝光的光致抗蚀剂部分对金属层成形。

2. 发明授权

US5302547A Systems for patterning dielectrics by laser ablation 失效
标题翻译：通过激光烧蚀法构图电介质的系统
公开(公告)号：US5302547A
公开(公告)日：1994-04-12
申请号：US14609
申请日：1993-02-08
申请人： Robert J. Wojnarowski , Herbert S. Cole , Richard J. Saia , Thomas B. Gorczyca , Ernest W. Balch
发明人： Robert J. Wojnarowski , Herbert S. Cole , Richard J. Saia , Thomas B. Gorczyca , Ernest W. Balch
IPC分类号： H01L23/12 , H01L21/268 , H01L21/302 , H01L21/311 , H01L21/48 , H01L21/768 , H01L23/538 , H05K1/03 , H05K3/00 , H01L21/283 , H01L21/306
CPC分类号： H05K3/0041 , H01L21/31138 , H01L21/486 , H01L21/76802 , H01L23/5389 , H01L24/24 , H01L24/82 , H01L2224/0401 , H01L2224/04105 , H01L2224/1147 , H01L2224/2402 , H01L2224/24227 , H01L2224/32225 , H01L2224/73267 , H01L2224/92244 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01014 , H01L2924/01018 , H01L2924/01027 , H01L2924/01029 , H01L2924/01033 , H01L2924/01042 , H01L2924/01074 , H01L2924/01075 , H01L2924/12042 , H01L2924/14 , H01L2924/15153 , H01L2924/15165 , H01L2924/30105 , H01L2924/3011 , H05K1/036 , H05K2201/0166 , H05K2201/0195 , H05K3/0032 , Y10S438/94 , Y10S438/945
摘要： A differentiable ablation approach to patterning dielectrics which are not of the same absorbance uses an absorbant dielectric at a specified laser wavelength over a non-absorbant dielectric at that wavelength. The absorbant dielectric may be laser-patterned and become an integral mask enabling plasma etching of the underlying non-absorbant dielectric. If the patterning of the absorbant dielectric involves vias, polymer ridges formed around via surfaces during laser patterning may be removed at the same time the underlying non-absorbant dielectric is etched using a transparent, oxygen plasma resistant mask. Alternatively, an inert mask may be used instead of the absorbant dielectric to allow plasma etching of the non-absorbant dielectric.
摘要翻译：对于不相同吸光度的电介质图案的可微分消融方法，在该波长处的非吸收性电介质上使用指定的激光波长的吸收介质。吸收介质可以是激光图案化的，并且成为能够对下面的非吸收性电介质进行等离子体蚀刻的整体掩模。如果吸收介质的图案化涉及通孔，则可以在激光图案化期间在通孔表面周围形成的聚合物脊在同时使用透明的耐氧等离子体掩模蚀刻下面的非吸收性电介质。或者，可以使用惰性掩模来代替吸收介质，以允许对非吸收性介质的等离子体蚀刻。

3. 发明授权

US06935608B2 Method for protecting the diaphragm and extending the life of SiC and/or Si MEMS microvalves 有权
标题翻译：用于保护隔膜并延长SiC和/或Si MEMS微型阀的寿命的方法
公开(公告)号：US06935608B2
公开(公告)日：2005-08-30
申请号：US10876072
申请日：2004-06-24
申请人： Glenn S. Claydon , Ernest W. Balch
发明人： Glenn S. Claydon , Ernest W. Balch
IPC分类号： B81C1/00 , F15C5/00 , F16K99/00 , F16K31/00
CPC分类号： B81C1/00492 , F15C5/00 , F16K99/0001 , F16K99/0015 , F16K99/0046 , F16K99/0048 , F16K2099/0074 , F16K2099/008
摘要： A microvalve and a method of forming a diaphragm stop for a microvalve. The microvalve includes a first layer and a diaphragm member to control the flow of fluid through the microvalve. The method comprises the step of forming a contoured shaped recess extending inward from a surface of the layer by using a laser to remove material in a series of areas, at successively greater depths extending inward from said surface. Preferably, the recess has a dome shape, and may be formed by a direct-write laser operated via a computer aided drawing program running on a computer. For example, CAD artwork files, comprising a set of concentric polygons approximating circles, may be generated to create the dome structure. The laser ablation depth can be controlled by modifying the offset step distance of the polygons and equating certain line widths to an equivalent laser tool definition. Preferably, the laser tool definition is combined with the CAD artwork, which defines a laser path such that the resulting geometry has no sharp edges that could cause the diaphragm of the valve to tear or rupture.
摘要翻译：微型阀和形成用于微型阀的隔膜止动件的方法。微型阀包括第一层和隔膜构件，以控制通过微型阀的流体流动。该方法包括以下步骤：在从所述表面向内延伸的连续更大的深度处，通过使用激光来形成从层的表面向内延伸的轮廓形状的凹槽，以移除一系列区域中的材料。优选地，凹部具有圆顶形状，并且可以通过在计算机上运行的计算机辅助绘图程序来操作的直写激光器形成。例如，可以生成包括近似圆的一组同心多边形的CAD图形文件，以创建圆顶结构。可以通过修改多边形的偏移步距并将某些线宽等同于等效的激光工具定义来控制激光烧蚀深度。优选地，激光工具定义与CAD图形组合，CAD图形限定了激光路径，使得所得到的几何形状不具有可能导致阀的隔膜撕裂或破裂的尖锐边缘。

4. 发明授权

US06774337B2 Method for protecting the diaphragm and extending the life of SiC and/or Si MEMS microvalves 失效
公开(公告)号：US06774337B2
公开(公告)日：2004-08-10
申请号：US10277065
申请日：2002-10-21
申请人： Glenn S. Claydon , Ernest W. Balch
发明人： Glenn S. Claydon , Ernest W. Balch
IPC分类号： B23K2600
CPC分类号： B81C1/00492 , F15C5/00 , F16K99/0001 , F16K99/0015 , F16K99/0046 , F16K99/0048 , F16K2099/0074 , F16K2099/008
摘要： A microvalve and a method of forming a diaphragm stop for a microvalve. The microvalve includes a first layer and a diaphragm member to control the flow of fluid through the microvalve. The method comprises the step of forming a contoured shaped recess extending inward from a surface of the layer by using a laser to remove material in a series of areas, at successively greater depths extending inward from said surface. Preferably, the recess has a dome shape, and may be formed by a direct-write laser operated via a computer aided drawing program running on a computer. For example, CAD artwork files, comprising a set of concentric polygons approximating circles, may be generated to create the dome structure. The laser ablation depth can be controlled by modifying the offset step distance of the polygons and equating certain line widths to an equivalent laser tool definition. Preferably, the laser tool definition is combined with the CAD artwork, which defines a laser path such that the resulting geometry has no sharp edges that could cause the diaphragm of the valve to tear or rupture.

5. 发明申请

US20080106177A1 Fluorescent lamp utilizing a partial barrier coating resulting in assymetric or oriented light output and process for same 审中-公开
标题翻译：使用部分屏障涂层的荧光灯导致不均匀或取向的光输出及其过程
公开(公告)号：US20080106177A1
公开(公告)日：2008-05-08
申请号：US11593726
申请日：2006-11-07
申请人： Jon B. Jansma , Ernest W. Balch , Donald F. Foust , Jason M. Benyeda
发明人： Jon B. Jansma , Ernest W. Balch , Donald F. Foust , Jason M. Benyeda
IPC分类号： H01J5/00 , B05D5/12
CPC分类号： H01J61/35 , H01J9/20 , H01J61/025
摘要： A lamp comprising a light-transmissive envelope, the inner surface of which is only partially coated by a reflective barrier coating layer such that an aperture is created in the coating for light emission, the lamp exhibiting asymmetric light output through the aperture and lumens substantially equivalent to a lamp wherein the envelope inner surface is completely coated with a reflective barrier coating layer having no aperture, and a laser ablation process for creating the reflective barrier coating layer aperture.
摘要翻译：一种灯，包括透光外壳，其内表面仅被反射阻挡涂层部分地涂覆，使得在用于发光的涂层中产生孔，所述灯具有通过孔径输出的不对称光，并且流明基本相当于涉及一种其中封套内表面完全涂覆有没有孔的反射阻挡涂层的灯，以及用于产生反射阻挡涂层孔的激光烧蚀工艺。

6. 发明授权

US4895780A Adjustable windage method and mask for correction of proximity effect in submicron photolithography 失效
标题翻译：用于校正亚微米光刻中邻近效应的可调节风挡法和掩模
公开(公告)号：US4895780A
公开(公告)日：1990-01-23
申请号：US265285
申请日：1988-10-25
申请人： Yoav Nissan-Cohen , Paul A. Frank , Joseph M. Pimbley , Dale M. Brown , Ernest W. Balch , Kenneth J. Polasko
发明人： Yoav Nissan-Cohen , Paul A. Frank , Joseph M. Pimbley , Dale M. Brown , Ernest W. Balch , Kenneth J. Polasko
IPC分类号： G03F1/00 , G03F1/36 , G03F7/20
CPC分类号： G03F7/70441 , G03F1/36
摘要： In order to solve the problem of the proximity effects which occurs in the fabrication of integrated circuit devices, a facile method is provided for automatically creating a new pattern in which variably spaced windage correction is applied over the mask. This permits the utilization of conventional design fabrication rules and systems without the concomitant problem of producing small feature sizes in isolated structures. The method produces highly desirable chip masks and is readily implemented on commercially available CAD systems presently being employed for the production of circuit masks. The method is automatic and extremely easily implemented.
摘要翻译：为了解决在集成电路器件的制造中发生的邻近效应的问题，提供了一种简单的方法，用于自动创建其中在掩模上施加可变地间隔的风向校正的新图案。这允许利用传统的设计制造规则和系统，而没有在隔离结构中产生小特征尺寸的伴随问题。该方法产生高度期望的芯片掩模，并且容易地在目前用于生产电路掩模的市售CAD系统上实现。该方法是自动的，非常容易实现。

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