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1. 发明授权

US08289498B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08289498B2
公开(公告)日：2012-10-16
申请号：US12483703
申请日：2009-06-12
申请人： Erik Roelof Loopstra , Petrus Rutgerus Bartray , Leon Martin Levasier , Bernardus Antonius Johannes Luttikhuis , Josephus Jacobus Smits , Anthonie Aantjes , Maurice Willem Jozef Etiënne Wijckmans , Johannes Bernardus Ridder , Andre Schreuder , Dennis Jozef Maria Paulussen , Peter Gerardus Jonkers , Hugues Poincelin , Fransiscus Theresia Noel Heusschen
发明人： Erik Roelof Loopstra , Petrus Rutgerus Bartray , Leon Martin Levasier , Bernardus Antonius Johannes Luttikhuis , Josephus Jacobus Smits , Anthonie Aantjes , Maurice Willem Jozef Etiënne Wijckmans , Johannes Bernardus Ridder , Andre Schreuder , Dennis Jozef Maria Paulussen , Peter Gerardus Jonkers , Hugues Poincelin , Fransiscus Theresia Noel Heusschen
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/709 , G03F7/70808
摘要： A lithographic apparatus includes a projection system configured to project an image onto a substrate, a substrate table configured to support the substrate, a first chamber that at least partially surrounds the projection system, and a second chamber that at least partially surrounds the substrate table and a first frame. The apparatus includes a base frame configured to support the second chamber, and an intermediate frame coupled to the base frame. The intermediate frame is configured to separate the first chamber and the second chamber. The apparatus includes a support coupled to the first frame. The support is configured to support the first chamber through a coupled opening in the intermediate frame and the second chamber.
摘要翻译：光刻设备包括：投影系统，被配置为将图像投影到基板上;衬底台，其被配置为支撑所述基板;第一室，其至少部分地围绕所述投影系统;以及第二室，其至少部分地围绕所述基板台; 第一帧。该装置包括被配置为支撑第二室的基座框架，以及耦合到该底座框架的中间框架。中间框架构造成分离第一室和第二室。该装置包括耦合到第一框架的支撑件。支撑构造成通过中间框架和第二室中的联接开口支撑第一室。

2. 发明授权

US08300208B2 Lithographic apparatus and a method to compensate for the effect of disturbances on the projection system of a lithographic apparatus 有权
标题翻译：平版印刷设备和补偿光刻设备投影系统上的干扰影响的方法
公开(公告)号：US08300208B2
公开(公告)日：2012-10-30
申请号：US12616312
申请日：2009-11-11
申请人： Erik Roelof Loopstra , Maurice Willem Jozef Etiënne Wijckmans , Robertus Leonardus Tousain , Adrianus Hendrik Koevoets
发明人： Erik Roelof Loopstra , Maurice Willem Jozef Etiënne Wijckmans , Robertus Leonardus Tousain , Adrianus Hendrik Koevoets
IPC分类号： G03B27/42 , G03B27/58 , G03B27/62
CPC分类号： G03F7/709 , G03F7/70525 , G03F7/70758 , G03F7/70766
摘要： Embodiments of the invention provide a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, an active air mount to support the projection system, the active air mount including at least one actuator, and a feed-forward device, the feed-forward device being configured to provide on the basis of a set-point signal of a movable object, a feed-forward signal to the at least one actuator, wherein the feed-forward signal is designed to decrease a disturbance effect on the projection system due to movement of the movable object.
摘要翻译：本发明的实施例提供了一种光刻设备，其包括配置成调节辐射束的照明系统，构造成支撑图案形成装置的图案形成装置支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束，被构造成保持衬底的衬底台，配置成将图案化的辐射束投影到衬底的目标部分上的投影系统，用于支撑投影系统的主动空气支架，主动空气支架包括至少一个致动器和前馈装置，所述前馈装置被配置为基于可移动物体的设定点信号提供到所述至少一个致动器的前馈信号，其中所述前馈信号被设计成由于可移动物体的移动而减小对投影系统的干扰效应。

3. 发明申请

US20110170078A1 Projection System and Lithographic Apparatus 有权
标题翻译：投影系统和平版印刷设备
公开(公告)号：US20110170078A1
公开(公告)日：2011-07-14
申请号：US13061792
申请日：2009-07-17
申请人： Erik Roelof Loopstra , Wilhelmus Petrus De Boeij , Hans Butler , Robertus Johannes Marinus , Jan Bernard Plechelmus Van Schoot , Timotheus Franciscus Sengers , Maurice Willem Jozef Etiënne Wijckmans , Franciscus Johannes Joseph Janssen
发明人： Erik Roelof Loopstra , Wilhelmus Petrus De Boeij , Hans Butler , Robertus Johannes Marinus , Jan Bernard Plechelmus Van Schoot , Timotheus Franciscus Sengers , Maurice Willem Jozef Etiënne Wijckmans , Franciscus Johannes Joseph Janssen
IPC分类号： G03B27/54
CPC分类号： G03F7/70891 , G03F7/70258 , G03F7/70825
摘要： A projection system (PS) is provided which includes, in an embodiment, two frames. The optical elements of the projection system are mounted on a first frame (200). The position of the optical elements is measured relative to a second frame (300) using a first measurement system (910). A second measurement system (920) is used to measure a parameter associated with a deformation of the second frame. The measurement made by the second measurement system can be used to compensate for any errors in the position of the optical elements as measured by the first measurement system resulting from deformations of the second frame. Typically, deformations of the frames are due to resonant oscillation and thermal expansion. Having two frames enables the optical elements of the projection system to be positioned with a high degree of accuracy. Optionally, a temperature control system (780, 790) may be provided to drive the temperature of at least one of the frames back to a desired value after the lithographic apparatus has been taken off line.
摘要翻译：提供了一种投影系统（PS），在一个实施例中包括两个帧。投影系统的光学元件安装在第一框架（200）上。使用第一测量系统（910）相对于第二框架（300）测量光学元件的位置。第二测量系统（920）用于测量与第二帧的变形相关联的参数。由第二测量系统进行的测量可用于补偿由第二框架的变形引起的由第一测量系统测量的光学元件位置的任何误差。通常，框架的变形是由于共振振荡和热膨胀。具有两个框架使得投影系统的光学元件能够以高精确度定位。可选地，可以提供温度控制系统（780,790）以在光刻设备已经离线之后将至少一个框架的温度恢复到期望值。

4. 发明授权

US09164401B2 Projection system and lithographic apparatus 有权
标题翻译：投影系统和光刻设备
公开(公告)号：US09164401B2
公开(公告)日：2015-10-20
申请号：US13061792
申请日：2009-07-17
申请人： Erik Roelof Loopstra , Wilhelmus Petrus De Boeij , Hans Butler , Robertus Johannes Marinus De Jongh , Jan Bernard Plechelmus Van Schoot , Timotheus Franciscus Sengers , Maurice Willem Jozef Etiënne Wijckmans , Franciscus Johannes Joseph Janssen
发明人： Erik Roelof Loopstra , Wilhelmus Petrus De Boeij , Hans Butler , Robertus Johannes Marinus De Jongh , Jan Bernard Plechelmus Van Schoot , Timotheus Franciscus Sengers , Maurice Willem Jozef Etiënne Wijckmans , Franciscus Johannes Joseph Janssen
IPC分类号： G03F7/20
CPC分类号： G03F7/70891 , G03F7/70258 , G03F7/70825
摘要： A projection system (PS) is provided which includes, in an embodiment, two frames. The optical elements of the projection system are mounted on a first frame (200). The position of the optical elements is measured relative to a second frame (300) using a first measurement system (910). A second measurement system (920) is used to measure a parameter associated with a deformation of the second frame. The measurement made by the second measurement system can be used to compensate for any errors in the position of the optical elements as measured by the first measurement system resulting from deformations of the second frame. Typically, deformations of the frames are due to resonant oscillation and thermal expansion. Having two frames enables the optical elements of the projection system to be positioned with a high degree of accuracy. Optionally, a temperature control system (780, 790) may be provided to drive the temperature of at least one of the frames back to a desired value after the lithographic apparatus has been taken off line.
摘要翻译：提供了一种投影系统（PS），在一个实施例中包括两个帧。投影系统的光学元件安装在第一框架（200）上。使用第一测量系统（910）相对于第二框架（300）测量光学元件的位置。第二测量系统（920）用于测量与第二帧的变形相关联的参数。由第二测量系统进行的测量可用于补偿由第二框架的变形引起的由第一测量系统测量的光学元件位置的任何误差。通常，框架的变形是由于共振振荡和热膨胀。具有两个框架使得投影系统的光学元件能够以高精确度定位。可选地，可以提供温度控制系统（780,790）以在光刻设备已经离线之后将至少一个框架的温度恢复到期望值。

5. 发明授权

US07724351B2 Lithographic apparatus, device manufacturing method and exchangeable optical element 有权
标题翻译：光刻设备，器件制造方法和可交换光学元件
公开(公告)号：US07724351B2
公开(公告)日：2010-05-25
申请号：US11341894
申请日：2006-01-30
申请人： Erik Roelof Loopstra , Adrianus Franciscus Petrus Engelen , Bernardus Antonius Johannes Luttikhuis , Maria Johanna Agnes Rubingh , Johannes Martinus Andreas Hazenberg , Laurentius Catrinus Jorritsma , Johannes Wilhelmus De Klerk , Bernhard Geuppert , Aart Adrianus Van Beuzekom , Petrus Franciscus Wilhelmus Maria Mandigers , Franz Sorg , Peter Deufel , Peter Schaap
发明人： Erik Roelof Loopstra , Adrianus Franciscus Petrus Engelen , Bernardus Antonius Johannes Luttikhuis , Maria Johanna Agnes Rubingh , Johannes Martinus Andreas Hazenberg , Laurentius Catrinus Jorritsma , Johannes Wilhelmus De Klerk , Bernhard Geuppert , Aart Adrianus Van Beuzekom , Petrus Franciscus Wilhelmus Maria Mandigers , Franz Sorg , Peter Deufel , Peter Schaap
IPC分类号： G03B27/54 , G03B27/72 , G03B27/52
CPC分类号： G03F7/70308 , G03F7/70825 , G03F7/70933
摘要： A lithographic apparatus has an assembly to exchange optical elements in a pupil plane of its projection system. The optical elements may be pupil filters and may conform to the physical dimensions specified for a reticle standard, e.g. having sides substantially equal to 5, 6 or 9 inches.
摘要翻译：光刻设备具有在其投影系统的光瞳平面中交换光学元件的组件。光学元件可以是光瞳滤光器，并且可以符合对于掩模版标准规定的物理尺寸，例如。侧面基本上等于5,6或9英寸。

6. 发明授权

US07961291B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07961291B2
公开(公告)日：2011-06-14
申请号：US11316359
申请日：2005-12-23
申请人： Erik Roelof Loopstra , Bernardus Antonius Johannes Luttikhuis
发明人： Erik Roelof Loopstra , Bernardus Antonius Johannes Luttikhuis
IPC分类号： G03B27/42 , G03B27/62
CPC分类号： G03F7/70741 , G03F7/70733
摘要： A lithographic apparatus includes an illumination system to condition a radiation beam, a patterning device support to support a patterning device in a projection plane, the patterning device to pattern the radiation beam, a substrate table to hold a substrate, a projection system to project the patterned beam onto the substrate, and an exchange device to exchange an exchangeable object with an exchangeable object support that holds the exchangeable object during projection. The exchange device includes a load unit and an unload unit that each have a holding device to hold an exchangeable object. The holding devices are positioned substantially adjacent to each other and configured to hold an exchangeable object in a plane substantially parallel to the plane in which the exchangeable object is held in the exchangeable object support during projection. The exchangeable object support exchanges an exchangeable object with each of the holding devices.
摘要翻译：光刻设备包括用于调节辐射束的照明系统，图案形成装置支撑件以支撑投影平面中的图案形成装置，图案形成装置对辐射束进行图案化，衬底台以保持衬底，投影系统将投影系统投影图案化的光束到基板上，以及交换装置，用于在可投影对象期间交换可交换对象与可更换物体的支撑。交换装置包括负载单元和卸载单元，每个都具有用于保持可更换对象的保持装置。保持装置基本上彼此相邻地定位，并且构造成将可交换物体保持在基本上平行于平面的平面中，在该平面中可交换物体在投影期间保持在可更换物体支撑件中。可交换对象支持与每个保持装置交换可交换对象。

7. 发明授权

US08264670B2 Lithographic apparatus and device manufacturing method for clamping a patterning device 失效
标题翻译：用于夹持图案形成装置的平版印刷装置和装置制造方法
公开(公告)号：US08264670B2
公开(公告)日：2012-09-11
申请号：US11343219
申请日：2006-01-31
申请人： Erik Roelof Loopstra , Bernardus Antonius Johannes Luttikhuis , Harmen Klaas Van Der Schoot , Fransicus Mathijs Jacobs
发明人： Erik Roelof Loopstra , Bernardus Antonius Johannes Luttikhuis , Harmen Klaas Van Der Schoot , Fransicus Mathijs Jacobs
IPC分类号： G03B27/62
CPC分类号： G03F7/707
摘要： The invention provides a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a transmissive patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the patterning device support is configured to hold a patterning device and wherein the lithographic apparatus includes a clamping device, the clamping device being configured to clamp the patterning device at the top side.
摘要翻译：本发明提供一种光刻设备，其包括配置成调节辐射束的照明系统，构造成支撑透射式图案形成装置的图案形成装置支撑件，所述图案形成装置能够在其横截面上赋予辐射束图案以形成图案化的辐射束，构造成保持衬底的衬底台，以及被配置为将图案化的辐射束投影到衬底的目标部分上的投影系统，其中，图案形成装置支撑件构造成保持图案形成装置，并且其中光刻装置包括夹持装置，夹持装置构造成将图案形成装置夹在顶侧。

8. 发明授权

US07483120B2 Displacement measurement system, lithographic apparatus, displacement measurement method and device manufacturing method 有权
标题翻译：位移测量系统，光刻设备，位移测量方法和设备制造方法
公开(公告)号：US07483120B2
公开(公告)日：2009-01-27
申请号：US11430196
申请日：2006-05-09
申请人： Bernardus Antonius Johannes Luttikhuis , Henrikus Herman Marie Cox , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch , Harmen Klaas Van Der Schoot
发明人： Bernardus Antonius Johannes Luttikhuis , Henrikus Herman Marie Cox , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch , Harmen Klaas Van Der Schoot
IPC分类号： G03B27/42 , G03B27/58 , G01B11/14
CPC分类号： G03B27/53 , G03F7/70733 , G03F7/70775
摘要： A displacement measurement system, in particular for measuring the displacement of a substrate table in a lithographic apparatus relative to a reference frame is presented. The displacement measure system includes a plurality of displacement sensors mounted to the substrate table and a target associated with each displacement sensor mounted to the reference frame.
摘要翻译：提出了一种位移测量系统，特别是用于测量光刻设备中的衬底台相对于参考系的位移。位移测量系统包括安装到衬底台的多个位移传感器和与安装到参考框架的每个位移传感器相关联的目标。

9. 发明授权

US07253880B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07253880B2
公开(公告)日：2007-08-07
申请号：US10995536
申请日：2004-11-24
申请人： Erik Roelof Loopstra , Petrus Rutgerus Bartray , Antonius Johannes Josephus Van Dijsseldonk , Paulus Martinus Maria Liebregts
发明人： Erik Roelof Loopstra , Petrus Rutgerus Bartray , Antonius Johannes Josephus Van Dijsseldonk , Paulus Martinus Maria Liebregts
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70141 , G03F7/70091
摘要： A lithographic apparatus includes an illumination system configured to provide a beam of radiation and projection system configured to project the radiation beam onto a target portion of a substrate. At least one of the illumination system and the projection system includes a focusing element for reflecting or refracting the beam. A plurality of stop discs is provided, each having an aperture therethrough, together with a disc positioner configured to place one of the stop discs adjacent the focusing element to control the numerical aperture (NA) of the projection system or illumination system. The apparatus further includes a disc changer configured to select one of the stop discs and provide the selected stop disc to the disc positioner, the disc changer being external to the projection system or illumination system.
摘要翻译：光刻设备包括被配置为提供辐射束和投影系统的照明系统，其配置成将辐射束投影到基板的目标部分上。照明系统和投影系统中的至少一个包括用于反射或折射光束的聚焦元件。提供了多个止动盘，每个具有穿过其中的孔，以及配置成将止动盘中的一个邻近聚焦元件放置以控制投影系统或照明系统的数值孔径（NA）的盘定位器。该装置还包括一个换盘器，其被配置为选择一个停止盘并将所选择的停止盘提供给盘定位器，换盘器位于投影系统或照明系统的外部。

10. 发明授权

US06750949B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US06750949B2
公开(公告)日：2004-06-15
申请号：US10193688
申请日：2002-07-12
申请人： Erik Roelof Loopstra , Dominicus Jacobus Petrus Adrianus Franken , Josephus Jacobus Smits , Antonius Johannes Josephus Van Dijsseldonk , Johannes Hubertus Josephina Moors , Albrecht Hof , Günter Maul , Michael Mühlbeyer , Klaus Mehlkopp
发明人： Erik Roelof Loopstra , Dominicus Jacobus Petrus Adrianus Franken , Josephus Jacobus Smits , Antonius Johannes Josephus Van Dijsseldonk , Johannes Hubertus Josephina Moors , Albrecht Hof , Günter Maul , Michael Mühlbeyer , Klaus Mehlkopp
IPC分类号： G03B2742
CPC分类号： G03F7/70258 , G02B7/008 , G02B7/02 , G03F7/70833
摘要： A lithographic projection apparatus according to one embodiment of the invention includes a projection system having a plurality of optical elements or sensors mounted on a frame. The frame includes support portions made of a material (e.g. a glass ceramic) having a coefficient of thermal expansion of less than or approximately equal to 0.1×10−6 K−1.
摘要翻译：根据本发明的一个实施例的光刻投影设备包括具有安装在框架上的多个光学元件或传感器的投影系统。框架包括由热膨胀系数小于或大约等于0.1×10 -6 K -1的材料（例如玻璃陶瓷）制成的支撑部分。

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