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1. 发明申请

US20080246936A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20080246936A1
公开(公告)日：2008-10-09
申请号：US11783115
申请日：2007-04-05
申请人： Erik Roelof Loopstra , Henrikus Herman Marie Cox , Jeroen Johannes Sophia Maria Mertens , Wilhelmus Franciscus Johannes Simons , Paul Petrus Joannes Berkvens
发明人： Erik Roelof Loopstra , Henrikus Herman Marie Cox , Jeroen Johannes Sophia Maria Mertens , Wilhelmus Franciscus Johannes Simons , Paul Petrus Joannes Berkvens
IPC分类号： G03B27/42
CPC分类号： G05B19/404 , G03F7/70725 , G03F7/709 , G05B2219/45031 , G05B2219/49189
摘要： A position control system for a substrate support of a lithographic apparatus includes a position measurement system configured to determine a position of a sensor or sensor target on the substrate support, a controller configured to provide a control signal based on a desired position of a target portion of the substrate and the determined position, and one or more actuators configured to act on the substrate support. The position control system includes a stiffness compensation model of the substrate support, the stiffness compensation model including a relation between a difference in a change in position of the target portion and a change in position of the sensor or sensor target as a result of a force exerted on the substrate support. The position control system is configured to substantially correct at least during projection of a patterned radiation beam on the target portion, the position of the target portion using the stiffness compensation model.
摘要翻译：用于光刻设备的基板支撑件的位置控制系统包括：位置测量系统，被配置为确定传感器或传感器目标在基板支撑件上的位置;控制器，被配置为基于目标部分的期望位置提供控制信号和一个或多个致动器构造成作用在基板支撑件上。所述位置控制系统包括所述基板支撑件的刚度补偿模型，所述刚度补偿模型包括所述目标部分的位置变化的差异与所述传感器或传感器目标的位置变化之间的关系施加在基板支撑件上。位置控制系统被配置为至少在图案化的辐射束在目标部分上的投影期间基本上校正，目标部分的位置使用刚度补偿模型。

2. 发明授权

US07710540B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07710540B2
公开(公告)日：2010-05-04
申请号：US11783115
申请日：2007-04-05
申请人： Erik Roelof Loopstra , Henrikus Herman Marie Cox , Jeroen Johannes Sophia Maria Mertens , Wilhelmus Franciscus Johannes Simons , Paul Petrus Joannes Berkvens
发明人： Erik Roelof Loopstra , Henrikus Herman Marie Cox , Jeroen Johannes Sophia Maria Mertens , Wilhelmus Franciscus Johannes Simons , Paul Petrus Joannes Berkvens
IPC分类号： G03B27/42
CPC分类号： G05B19/404 , G03F7/70725 , G03F7/709 , G05B2219/45031 , G05B2219/49189
摘要： A position control system for a substrate support of a lithographic apparatus includes a position measurement system configured to determine a position of a sensor or sensor target on the substrate support, a controller configured to provide a control signal based on a desired position of a target portion of the substrate and the determined position, and one or more actuators configured to act on the substrate support. The position control system includes a stiffness compensation model of the substrate support, the stiffness compensation model including a relation between a difference in a change in position of the target portion and a change in position of the sensor or sensor target as a result of a force exerted on the substrate support. The position control system is configured to substantially correct at least during projection of a patterned radiation beam on the target portion, the position of the target portion using the stiffness compensation model.
摘要翻译：用于光刻设备的基板支撑件的位置控制系统包括：位置测量系统，被配置为确定传感器或传感器目标在基板支撑件上的位置;控制器，被配置为基于目标部分的期望位置提供控制信号和一个或多个致动器构造成作用在基板支撑件上。所述位置控制系统包括所述基板支撑件的刚度补偿模型，所述刚度补偿模型包括所述目标部分的位置变化的差异与所述传感器或传感器目标的位置变化之间的关系施加在基板支撑件上。位置控制系统被配置为至少在图案化的辐射束在目标部分上的投影期间基本上校正，目标部分的位置使用刚度补偿模型。

3. 发明授权

US08472003B2 Fluid handling structure, lithographic apparatus and device manufacturing method 有权
标题翻译：流体处理结构，光刻设备和器件制造方法
公开(公告)号：US08472003B2
公开(公告)日：2013-06-25
申请号：US12820991
申请日：2010-06-22
申请人： Hrishikesh Patel , Johannes Henricus Wilhelmus Jacobs , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Jozef Maria Direcks , Franciscus Johannes Joseph Janssen , Paul Petrus Joannes Berkvens , Gert-Jan Geradus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Matheus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete , Ruud Hendrikus Martinus Johannes Bloks
发明人： Hrishikesh Patel , Johannes Henricus Wilhelmus Jacobs , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Jozef Maria Direcks , Franciscus Johannes Joseph Janssen , Paul Petrus Joannes Berkvens , Gert-Jan Geradus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Matheus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete , Ruud Hendrikus Martinus Johannes Bloks
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： H01L21/6715 , Y10T137/0318 , Y10T137/8593
摘要： A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.
摘要翻译：公开了一种流体处理结构，其被配置为将浸没液体供应并限制在限定在投影系统和面向流体处理结构的面对表面之间的空间中。流体处理结构包括一个供给通道，用于将流体从流体处理结构外部通过到该空间;以及热隔离器，其至少部分地邻近供给通道定位，以将供给通道中的流体与由流体处理结构。

4. 发明授权

US08681308B2 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08681308B2
公开(公告)日：2014-03-25
申请号：US11898637
申请日：2007-09-13
申请人： Paul Petrus Joannes Berkvens , Roelof Frederik De Graaf , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Jozef Maria Direcks , Franciscus Johannes Joseph Janssen , Paul William Scholtes-Van Eijk , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete
发明人： Paul Petrus Joannes Berkvens , Roelof Frederik De Graaf , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Jozef Maria Direcks , Franciscus Johannes Joseph Janssen , Paul William Scholtes-Van Eijk , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete
IPC分类号： G03B27/52 , G03B27/68 , G03B27/42 , G03B27/32 , G03B27/54 , G03B27/58
CPC分类号： G03F7/70341
摘要： An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port.
摘要翻译：公开了一种浸没式光刻设备，其包括被配置为将流体限制在投影系统和基板之间的空间的流体限制系统。流体限制系统包括用于供应流体的流体入口，流体入口连接到入口端口和出口端口。浸没式光刻设备还包括流体供应系统，其构造成通过改变提供给入口的流体的流量和从出口移除的流体的流速来控制流过流体入口的流体流动。

5. 发明申请

US20110005603A1 FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译：流体处理结构，平面设备和设备制造方法
公开(公告)号：US20110005603A1
公开(公告)日：2011-01-13
申请号：US12820991
申请日：2010-06-22
申请人： Hrishikesh Patel , Johannes Henricus Wilhelmus Jacobs , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Jozef Maria Direcks , Franciscus Johannes Joseph Janssen , Paul Petrus Joannes Berkvens , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Matheus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete , Ruud Hendricus Martinus Johannes Bloks
发明人： Hrishikesh Patel , Johannes Henricus Wilhelmus Jacobs , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Jozef Maria Direcks , Franciscus Johannes Joseph Janssen , Paul Petrus Joannes Berkvens , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Matheus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete , Ruud Hendricus Martinus Johannes Bloks
IPC分类号： F03B11/00
CPC分类号： H01L21/6715 , Y10T137/0318 , Y10T137/8593
摘要： A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.
摘要翻译：公开了一种流体处理结构，其被配置为将浸没液体供应并限制在限定在投影系统和面向流体处理结构的面对表面之间的空间中。流体处理结构包括一个供给通道，用于将流体从流体处理结构外部通过到该空间;以及热隔离器，其至少部分地邻近供给通道定位，以将供给通道中的流体与由流体处理结构。

6. 发明申请

US20080212046A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US20080212046A1
公开(公告)日：2008-09-04
申请号：US11987569
申请日：2007-11-30
申请人： Michel Riepen , Christiaan Alexander Hoogendam , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Josef Maria Direcks , Paul Petrus Joannes Berkvens , Eva Mondt , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete
发明人： Michel Riepen , Christiaan Alexander Hoogendam , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Josef Maria Direcks , Paul Petrus Joannes Berkvens , Eva Mondt , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete
IPC分类号： G03B27/52
CPC分类号： G03F7/70866 , G03F7/70341
摘要： A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.
摘要翻译：公开了一种用于浸没式光刻术的液体限制系统，其中液体限制系统和衬底之间的液体弯液面通过弯液面钉扎特征基本上固定就位。弯液面钉扎特征包括以多边形形式布置的多个分立出口。

7. 发明授权

US08634053B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08634053B2
公开(公告)日：2014-01-21
申请号：US11987569
申请日：2007-11-30
申请人： Michel Riepen , Christiaan Alexander Hoogendam , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Jozef Maria Direcks , Paul Petrus Joannes Berkvens , Eva Mondt , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete
发明人： Michel Riepen , Christiaan Alexander Hoogendam , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Jozef Maria Direcks , Paul Petrus Joannes Berkvens , Eva Mondt , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete
IPC分类号： G03B27/52
CPC分类号： G03F7/70866 , G03F7/70341
摘要： A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.
摘要翻译：公开了一种用于浸没式光刻术的液体限制系统，其中液体限制系统和衬底之间的液体弯液面通过弯液面钉扎特征基本上固定就位。弯液面钉扎特征包括以多边形形式布置的多个分立出口。

8. 发明申请

US20130149649A1 LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20130149649A1
公开(公告)日：2013-06-13
申请号：US13693923
申请日：2012-12-04
申请人： Theodorus Wilhelmus POLET , Henrikus Herman Marie Cox , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Jimmy Matheus Wilhelmus Van De Winkel , Gregory Martin Mason Corcoran , Frank Johannes Jacobus Van Boxtel
发明人： Theodorus Wilhelmus POLET , Henrikus Herman Marie Cox , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Jimmy Matheus Wilhelmus Van De Winkel , Gregory Martin Mason Corcoran , Frank Johannes Jacobus Van Boxtel
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70758 , G03F7/70783
摘要： A lithographic apparatus having: a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a substrate surface actuator including a fluid opening for fluid flow therethrough from/onto a facing surface facing the substrate surface actuator to generate a force between the substrate surface actuator and the facing surface, the facing surface being a top surface of the substrate or a surface substantially co-planar with the substrate; and a position controller to control the position and/or orientation of a part of the facing surface by varying fluid flow through the fluid opening to displace the part of the facing surface relative to the projection system.
摘要翻译：一种光刻设备，具有：用于保持基板的基板台; 投影系统，被配置为将图案化的辐射束投影到所述基板的目标部分上; 衬底表面致动器，其包括流体开口，用于从面向衬底表面致动器的面向表面的流体流过，以在衬底表面致动器和面对表面之间产生力，面对表面是衬底的顶表面或表面基本上与基板共面; 以及位置控制器，其通过改变通过流体开口的流体流动来控制面对表面的一部分的位置和/或取向，以相对于投影系统移位相对表面的一部分。

9. 发明授权

US07205741B2 Planar motor initialization method, planar motor, lithographic apparatus and device manufacturing method 有权
标题翻译：平面电机初始化方法，平面电机，光刻设备及器件制造方法
公开(公告)号：US07205741B2
公开(公告)日：2007-04-17
申请号：US10874691
申请日：2004-06-24
申请人： Wilhelmus Franciscus Johannes Simons , Henrikus Herman Marie Cox , Sven Antoin Johan Hol
发明人： Wilhelmus Franciscus Johannes Simons , Henrikus Herman Marie Cox , Sven Antoin Johan Hol
IPC分类号： G05B11/01
CPC分类号： G03F7/70758 , G03F7/70725 , H02K41/03 , H02K2201/18 , H02P25/06 , Y10S414/135
摘要： A planar motor is controlled by supplying a three-phase alternating current to a coil assembly. Each phase is supplied to one of three coils. The coils are positioned in a magnetic field generated by a magnet plate having alternating magnet poles at its surface for generating an alternating magnetic field. In operation, the phase of each current flowing through each coil determines the direction of a force generated due to the current in the magnetic field. For correct operation, the phase angle of each current is to be adapted to the local direction of the magnetic field by determining a commutation-offset angle. The commutation-offset angle is determined by generating a force in an unknown direction and varying the commutation-angle, and determining when the generated force is directed perpendicular to the magnet plate, while ensuring that the generated force does not exceed a horizontal friction force. By determining a maximum compression of end stops of the coil assembly, or determining a maximum pressure, it may be determined when the generated force is directed perpendicular to the magnet plate.
摘要翻译：通过向线圈组件提供三相交流电来控制平面电动机。每相提供给三个线圈中的一个。线圈位于由其表面上具有交替磁极的磁板产生的磁场中，用于产生交变磁场。在操作中，流过每个线圈的每个电流的相位确定由于磁场中的电流而产生的力的方向。为了正确的操作，通过确定换向偏移角度，每个电流的相位角将适应于磁场的局部方向。通过产生未知方向的力并改变换向角来确定换向偏移角，并且确定所产生的力何时垂直于磁体板定向，同时确保所产生的力不超过水平摩擦力。通过确定线圈组件的端部止动件的最大压缩或确定最大压力，可以确定何时生成的力垂直于磁体板定向。

10. 发明授权

US09274436B2 Lithographic apparatus and a device manufacturing method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US09274436B2
公开(公告)日：2016-03-01
申请号：US13693923
申请日：2012-12-04
申请人： Theodorus Wilhelmus Polet , Henrikus Herman Marie Cox , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Jimmy Matheus Wilhelmus Van De Winkel , Gregory Martin Mason Corcoran , Frank Johannes Jacobus Van Boxtel
发明人： Theodorus Wilhelmus Polet , Henrikus Herman Marie Cox , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Jimmy Matheus Wilhelmus Van De Winkel , Gregory Martin Mason Corcoran , Frank Johannes Jacobus Van Boxtel
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70758 , G03F7/70783
摘要： A lithographic apparatus having: a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a substrate surface actuator including a fluid opening for fluid flow therethrough from/onto a facing surface facing the substrate surface actuator to generate a force between the substrate surface actuator and the facing surface, the facing surface being a top surface of the substrate or a surface substantially co-planar with the substrate; and a position controller to control the position and/or orientation of a part of the facing surface by varying fluid flow through the fluid opening to displace the part of the facing surface relative to the projection system.
摘要翻译：一种光刻设备，具有：用于保持基板的基板台; 投影系统，被配置为将图案化的辐射束投影到所述基板的目标部分上; 衬底表面致动器，其包括流体开口，用于从面向衬底表面致动器的面向表面的流体流过，以在衬底表面致动器和面对表面之间产生力，面对表面是衬底的顶表面或表面基本上与基板共面; 以及位置控制器，其通过改变通过流体开口的流体流动来控制面对表面的一部分的位置和/或取向，以相对于投影系统移位相对表面的一部分。

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