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1. 发明申请

US20090208878A1 Lithographic System, Lithographic Apparatus and Device Manufacturing Method 审中-公开
标题翻译：光刻系统，平版印刷设备和器件制造方法
公开(公告)号：US20090208878A1
公开(公告)日：2009-08-20
申请号：US12212163
申请日：2008-09-17
申请人： Erik Roelof LOOPSTRA , Donis George Flagello
发明人： Erik Roelof LOOPSTRA , Donis George Flagello
IPC分类号： G03B27/54 , G03F7/20
CPC分类号： G03F7/70408
摘要： A lithographic system includes two lithographic apparatus. A first lithographic apparatus is configured to project a patterned radiation beam onto a first target portion of a substrate. The second lithographic apparatus includes an interferometric arrangement configured to split the radiation beam and to recombine the split beams so as to produce an interference pattern. A masking arrangement is configured to selectively transmit a portion of the interference pattern and a projection system is configured to project the selectively transmitted portion of the interference pattern onto a second target portion of the substrate.
摘要翻译：光刻系统包括两个光刻设备。第一光刻设备被配置为将图案化的辐射束投影到衬底的第一目标部分上。第二光刻设备包括被配置为分离辐射束并且将分束束复合以产生干涉图案的干涉布置。掩模布置被配置为选择性地传送干涉图案的一部分，并且投影系统被配置为将干涉图案的选择性地发送的部分投影到基板的第二目标部分上。

2. 发明授权

US08252487B2 Device manufacturing method and mask for use therein 有权
标题翻译：装置制造方法及其使用面罩
公开(公告)号：US08252487B2
公开(公告)日：2012-08-28
申请号：US10736779
申请日：2003-12-17
申请人： Marcel Mathijs Theodore Marie Dierichs , Markus Franciscus Antonius Eurlings , Donis George Flagello
发明人： Marcel Mathijs Theodore Marie Dierichs , Markus Franciscus Antonius Eurlings , Donis George Flagello
IPC分类号： G03F1/14
CPC分类号： G03F1/54
摘要： A device manufacturing method, is presented herein. In one embodiment, the device manufacturing method includes a mask for use with DUV having a quartz substrate and chrome absorber. The chrome absorber has a thickness of about 700 nm which causes increased TE polarization in the transmitted light and improves contrast at the substrate level.
摘要翻译：本文提供了一种器件制造方法。在一个实施例中，器件制造方法包括用于具有石英衬底和铬吸收体的DUV的掩模。铬吸收体具有约700nm的厚度，这导致透射光中的TE偏振增加并且改善了衬底水平的对比度。

3. 发明授权

US07206059B2 Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems 有权
标题翻译：用于高数值孔径系统的静态和动态径向横向电偏振器
公开(公告)号：US07206059B2
公开(公告)日：2007-04-17
申请号：US10786473
申请日：2004-02-26
申请人： Donis George Flagello , Kevin Cummings , Alexander Straaijer , Marcel Mathijs Theodore Marie Dierichs
发明人： Donis George Flagello , Kevin Cummings , Alexander Straaijer , Marcel Mathijs Theodore Marie Dierichs
IPC分类号： G03B27/72 , G02B5/30
CPC分类号： G02B5/3058 , G03F7/70566
摘要： A radial transverse electric polarizer device includes a substrate material having a first refractive index and a plurality of elongated azimuthally oriented elements coupled to the substrate material, the plurality of elongated elements having a second refractive index. The plurality of elements are periodically spaced apart to form a plurality of gaps such that the radial transverse electric polarizer device interacts with an electromagnetic radiation including first and second polarizations to reflect substantially all of the radiation of the first polarization and transmit substantially all of the radiation of the second polarization. The plurality of elongated elements are coated with this thin layer of absorbing material which absorbs radiation at a wavelength of the electromagnetic radiation. The polarizer device may be used, for example, in a lithographic projection apparatus to increase imaging resolution.
摘要翻译：径向横向电偏振器装置包括具有第一折射率的基底材料和耦合到基底材料的多个细长的方位取向元件，所述多个细长元件具有第二折射率。多个元件被周期性间隔开以形成多个间隙，使得该径向横向电偏振器装置与包括第一和第二偏振的电磁辐射相互作用以基本上反射第一极化的所有辐射，并且基本上透射所有辐射的第二极化。多个细长元件涂覆有这种吸收材料的薄层，其吸收在电磁辐射的波长处的辐射。偏振器装置可以用于例如光刻投影装置中以增加成像分辨率。

4. 发明授权

US09086633B2 Lithographic method 有权
标题翻译：平版印刷法
公开(公告)号：US09086633B2
公开(公告)日：2015-07-21
申请号：US12463679
申请日：2009-05-11
申请人： Donis George Flagello
发明人： Donis George Flagello
IPC分类号： H01L21/3105 , H01L21/312 , G03F7/40 , G03F7/095 , G03F7/12 , G03F7/20
CPC分类号： G03F1/42 , G03F7/095 , G03F7/12 , G03F7/20 , G03F7/26 , G03F7/405 , G03F7/70325 , Y10T428/24479 , Y10T428/24802
摘要： A lithographic method is disclosed that includes, on a substrate provided with a layer of a resist and a further layer of a material provided on the layer of resist, providing a pattern in the further layer, the pattern defining a space via which an area of the layer of resist may be exposed to radiation, a distance between features of the pattern defining the space, and exposing the layer of resist to radiation having a wavelength greater than the distance between features of the pattern defining the space, such that near-field radiation is generated which propagates into and exposes an area of the resist.
摘要翻译：公开了一种光刻方法，其包括在设置有抗蚀剂层的基板和设置在抗蚀剂层上的另一层材料，在另一层中提供图案，该图案限定空间，通过该空间，抗蚀剂层可以暴露于辐射，限定空间的图案的特征之间的距离，以及将抗蚀剂层暴露于波长大于限定空间的图案的特征之间的距离的辐射，使得近场产生辐射，其传播并暴露抗蚀剂的区域。

5. 发明授权

US07952803B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US07952803B2
公开(公告)日：2011-05-31
申请号：US11433768
申请日：2006-05-15
申请人： Donis George Flagello
发明人： Donis George Flagello
IPC分类号： G02B27/46 , H01L21/30
CPC分类号： G03F7/70408 , G03F7/70158 , G03F7/70258 , G03F7/70308 , G03F7/70341
摘要： A lithographic apparatus includes a first diffraction grating configured to create a first plurality of spatially coherent radiation beams and a second diffraction grating configured to receive at least a portion of the first plurality of spatially coherent radiation beams and to create, based on the first plurality of spatially coherent radiation beams, a second plurality of spatially coherent radiation beams. The apparatus also includes a beam combiner adapted to redirect and combine at least a portion of the second plurality of spatially coherent radiation beams onto a surface of a substrate to form an interference pattern.
摘要翻译：光刻设备包括被配置为产生第一多个空间相干辐射束的第一衍射光栅和被配置为接收第一多个空间相干辐射束的至少一部分的第二衍射光栅，并且基于第一多个空间相干辐射束，第二多个空间相干辐射束。该装置还包括光束组合器，其适于将第二多个空间相干辐射束的至少一部分重定向并组合到衬底的表面上以形成干涉图案。

6. 发明授权

US07684013B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07684013B2
公开(公告)日：2010-03-23
申请号：US11436058
申请日：2006-05-18
申请人： Steven George Hansen , Donis George Flagello , Wolfgang Singer , Bernd Peter Geh , Vladan Blahnik
发明人： Steven George Hansen , Donis George Flagello , Wolfgang Singer , Bernd Peter Geh , Vladan Blahnik
IPC分类号： G03B27/54 , G03B27/72
CPC分类号： G03F7/70325 , G03F7/70091 , G03F7/70108 , G03F7/7025
摘要： A lithographic apparatus includes an illumination unit including a radiation source configured to generate a radiation bundle, an illumination optics with a numerical aperture NA0 and an aperture system; a projection lens having a first numerical aperture NAOB1; a support arranged between the illumination unit and the projection lens and configured to support a patterning device; a substrate support configured to support a substrate on which structures on the patterning device are imaged, wherein the first numerical aperture NAOB1 of the projection lens is smaller than the numerical aperture NA0 of the illumination unit.
摘要翻译：光刻设备包括照明单元，其包括被配置为产生辐射束的辐射源，具有数值孔径NA0的光学器件和孔径系统; 具有第一数值孔径NAOB1的投影透镜; 布置在照明单元和投影透镜之间并被配置为支撑图案形成装置的支撑件; 衬底支撑件，被配置为支撑在其上成像图案形成装置上的结构的衬底，其中投影透镜的第一数值孔径NAOB1小于照明单元的数值孔径NA0。

7. 发明授权

US07317506B2 Variable illumination source 有权
标题翻译：可变照明光源
公开(公告)号：US07317506B2
公开(公告)日：2008-01-08
申请号：US11091927
申请日：2005-03-29
申请人： Donis George Flagello , Robert John Socha , James Sherwood Greeneich
发明人： Donis George Flagello , Robert John Socha , James Sherwood Greeneich
IPC分类号： G03B27/42
CPC分类号： G03B27/54 , G03F7/70091
摘要： An apparatus and method for providing a variable illumination field for use in lithographic imaging for semiconductor manufacturing includes providing a an illumination system including a variable optical element having an array of addressable elements, each addressable element constructed and arranged to have a variable transmittance.
摘要翻译：一种用于提供用于半导体制造的光刻成像的可变照明场的装置和方法，包括提供包括具有可寻址元件阵列的可变光学元件的照明系统，每个可寻址元件被构造和布置成具有可变透射率。

8. 发明授权

US07548302B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07548302B2
公开(公告)日：2009-06-16
申请号：US11655999
申请日：2007-01-22
申请人： Arno Jan Bleeker , Donis George Flagello , Robert John Socha , James Sherwood Greeneich , Kars Zeger Troost
发明人： Arno Jan Bleeker , Donis George Flagello , Robert John Socha , James Sherwood Greeneich , Kars Zeger Troost
IPC分类号： G03B27/42 , G03B27/72
CPC分类号： G03B27/54 , G03F7/70116 , G03F7/705
摘要： A method of transferring an image of a pattern layout onto a surface of a substrate including selecting a first illumination profile for a first area of the pattern layout and a second illumination profile for a second area of the pattern layout; switching illumination profile during transfer of the image of the pattern layout such that the first area of the pattern layout is illuminated with the first illumination profile and the second area is illuminated with the second illumination profile; and projecting an image of the illuminated first and second areas onto the surface of the substrate.
摘要翻译：将图案布局的图像转印到基板的表面上的方法，包括为图案布局的第一区域选择第一照明轮廓，以及为图案布局的第二区域选择第二照明轮廓; 在图案布局的图像传送期间切换照明轮廓，使得图案布局的第一区域被第一照明轮廓照亮，并且第二区域被第二照明轮廓照亮; 以及将照射的第一和第二区域的图像投影到基板的表面上。

9. 发明授权

US07538875B2 Lithographic apparatus and methods for use thereof 失效
标题翻译：光刻设备及其使用方法
公开(公告)号：US07538875B2
公开(公告)日：2009-05-26
申请号：US11014062
申请日：2004-12-17
申请人： Remco Marcel Van Dijk , Donis George Flagello , Michel Fransois Hubert Klaassen , Tammo Uitterdijk
发明人： Remco Marcel Van Dijk , Donis George Flagello , Michel Fransois Hubert Klaassen , Tammo Uitterdijk
IPC分类号： G01J4/00
CPC分类号： G03F7/70566 , G01J4/04 , G03F1/44 , G03F7/70125 , G03F7/70133 , G03F7/70591
摘要： A method for determining a polarization state of light passed through the projection lens of a lithographic apparatus is described. Polarizing structures are disposed on an object side of the projection lens of the lithographic apparatus. By measuring light that has passed through the polarizing structures information regarding the polarization characteristics of the projection lens can be determined.
摘要翻译：描述了一种用于确定通过光刻设备的投影透镜的光的偏振状态的方法。极化结构设置在光刻设备的投影透镜的物体侧。通过测量已经通过偏振结构的光，可以确定关于投影透镜的偏振特性的信息。

10. 发明授权

US07256873B2 Enhanced lithographic resolution through double exposure 失效
标题翻译：通过双重曝光增强光刻分辨率
公开(公告)号：US07256873B2
公开(公告)日：2007-08-14
申请号：US10765218
申请日：2004-01-28
申请人： Jozef Maria Finders , Donis George Flagello , Steven George Hansen
发明人： Jozef Maria Finders , Donis George Flagello , Steven George Hansen
IPC分类号： G03B27/32 , G03B27/42 , G03B27/54
CPC分类号： G03F7/70433 , G03F7/70466
摘要： A system and method for enhancing the image resolution in a lithographic system, is presented herein. The invention comprises decomposing a reticle pattern into at least two constituent sub-patterns that are capable of being optically resolved by the lithographic system, coating a substrate with a pre-specified photoresist layer, and exposing a first of the at least two constituent sub-patterns by directing a projection beam through the first sub-pattern such that the lithographic system produces a first sub-pattern image onto the pre-specified photoresist layer of the substrate. The invention further comprises processing the exposed substrate, exposing a second of the at least two constituent sub-patterns by directing the projection beam through the second sub-pattern such that the lithographic system produces a second sub-pattern image onto the pre-specified photoresist layer of the substrate, and then combining the first and second sub-pattern images to produce a desired pattern on the substrate.
摘要翻译：本文给出了用于增强光刻系统中的图像分辨率的系统和方法。本发明包括将掩模版图案分解为能够被光刻系统光学分辨的至少两个构成子图案，用预定的光致抗蚀剂层涂覆基底，以及暴露至少两个构成子图案中的第一个，通过将投影光束引导通过第一子图案使得光刻系统在基板的预定光致抗蚀剂层上产生第一子图案图像。本发明还包括处理曝光的基板，通过将投影光束引导通过第二子图案来暴露至少两个构成子图案中的第二个，使得光刻系统在预定的光致抗蚀剂上产生第二子图案图像层，然后组合第一和第二子图案图像以在衬底上产生期望的图案。

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