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1. 发明授权

US06820552B2 Cleaning method for recycling a printing substrate by laser ablation 失效
标题翻译：通过激光烧蚀回收印刷基板的清洁方法
公开(公告)号：US06820552B2
公开(公告)日：2004-11-23
申请号：US10068519
申请日：2002-02-06
申请人： Eric Verschueren , Marc Van Damme
发明人： Eric Verschueren , Marc Van Damme
IPC分类号： B41C110
CPC分类号： B41N3/006
摘要： A method is disclosed for removing ink-accepting areas from a printing master by laser ablation, characterized in that the printing master comprises a substrate which comprises a support and a base layer, wherein the base layer contains a crosslinked hydrophilic binder and a metal oxide. The base layer prevents deterioration of the quality of the substrate due to the laser ablation. In a preferred embodiment, the same substrate is used in a number of consecutive printing cycles of on-press coating, on-press exposure, printing and cleaning.
摘要翻译：公开了一种用于通过激光烧蚀从打印母版去除油墨接受区域的方法，其特征在于，所述打印母版包括包含支撑体和基底层的基底，其中所述基底层包含交联的亲水性粘合剂和金属氧化物。基层防止由于激光烧蚀引起的基板质量的劣化。在优选的实施方案中，在印刷涂布，印刷机曝光，印刷和清洁的多个连续印刷循环中使用相同的基材。

2. 发明授权

US06153353A Method for making positive working printing plates from a heat mode sensitive imaging element 有权
标题翻译：从热模式敏感成像元件制造正性印刷版的方法
公开(公告)号：US06153353A
公开(公告)日：2000-11-28
申请号：US265599
申请日：1999-03-10
申请人： Marc Van Damme , Joan Vermeersch , Eric Verschueren , Jorg Jung , Helmuth Haberhauer
发明人： Marc Van Damme , Joan Vermeersch , Eric Verschueren , Jorg Jung , Helmuth Haberhauer
IPC分类号： B41C1/10 , B41M5/36 , G03F7/095
CPC分类号： B41M5/368 , B41C1/1008 , B41C2210/02 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262
摘要： According to the present invention there is provided a heat mode imaging element for making a lithographic printing plate having on a lithographic base with a hydrophilic surface a first layer including a polymer, soluble in an aqueous alkaline solution and a top layer on the same side of the lithographic base as the first layer which top layer is unpenetrable for or insoluble in an alkaline developer containing SiO.sub.2 in the form of silicates; characterized in that said first layer and said top layer comprise a compound capable of converting IR-light into heat.
摘要翻译：根据本发明，提供一种热模式成像元件，用于使平版印刷版在具有亲水表面的平版印刷基底上具有第一层，该第一层包括可溶于碱性水溶液的聚合物和位于同一侧上的顶层作为第一层的平版印刷基层，其顶层不可渗透或不溶于含有硅酸盐形式的SiO 2的碱性显影剂; 其特征在于，所述第一层和所述顶层包含能够将IR光转换成热的化合物。

3. 发明授权

US6083663A Method for making positive working printing plates from a heat mode sensitive image element 有权
标题翻译：从加热模式敏感图像元件制作正性印刷版的方法
公开(公告)号：US6083663A
公开(公告)日：2000-07-04
申请号：US161469
申请日：1998-09-28
申请人： Joan Vermeersch , Marc Van Damme , Guido Hauquier , Eric Verschueren
发明人： Joan Vermeersch , Marc Van Damme , Guido Hauquier , Eric Verschueren
IPC分类号： B41C1/10 , B41M5/36 , G03F7/004
CPC分类号： B41C1/1016 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/24 , B41C2210/262
摘要： According to the present invention there is provided a method for making lithographic printing plates including the following steps:a) preparing a heat mode imaging element having on a lithographic base with a hydrophilic surface a first layer including a polymer, soluble in an aqueous alkaline solution, a compound capable of converting light to heat and a top layer on the same side of the lithographic base as the first layer which top layer is unpenetrable for an alkaline developer containing SiO.sub.2 as silicate;b) exposing imagewise the heat mode imaging element to actinic light;c) developing the imagewise exposed heat mode imaging element with the alkaline developer so that the exposed areas of the top layer and the underlying areas of the first layer are dissolved and the unexposed areas of the first layer remain undissolved characterized in that said top layer includes an organic quaternary ammonium salt.
摘要翻译：根据本发明，提供一种制备平版印刷版的方法，包括以下步骤：a）制备具有亲水表面的平版印刷基底上的热模式成像元件，该第一层包括可溶于碱性水溶液的聚合物能够将光转换成热的化合物和在与第一层相同的一侧上的顶层，该顶层对于含有SiO 2作为硅酸盐的碱性显影剂是不可穿透的; b）将热模式成像元件成像曝光成光化光; c）用碱性显影剂显影图像曝光的热模式成像元件，使得顶层的暴露区域和第一层的下面的区域被溶解，并且第一层的未曝光区域保持不溶解，其特征在于所述顶层包括有机季铵盐。

4. 发明授权

US6022667A Heat sensitive imaging element and a method for producing lithographic plates therewith 失效
标题翻译：热敏成像元件及其制造方法
公开(公告)号：US6022667A
公开(公告)日：2000-02-08
申请号：US73343
申请日：1998-05-06
申请人： Joan Vermeersch , Marc Van Damme , Eric Verschueren , Guy Hauquier
发明人： Joan Vermeersch , Marc Van Damme , Eric Verschueren , Guy Hauquier
IPC分类号： B41C1/10 , B41M5/36 , G03F7/11
CPC分类号： B41C1/1025 , B41M5/366 , B41C2210/04 , B41C2210/06 , B41C2210/24 , B41C2210/262 , Y10S430/127 , Y10S430/145
摘要： According to the present invention there is provided a heat sensitive imaging element comprising a lithographic base with a hydrophilic surface, an image forming layer including a hydrophobic thermoplastic polymer latex and a compound capable of converting light into heat being present in said image forming layer or a layer adjacent thereto, characterized in that the heat-sensitive imaging element comprises a barrier layer between the lithographic base having a hydrophilic surface and the image forming layer, said barrier layer and said image forming layer being removable in an aqueous solution with a pH of at least 5.
摘要翻译：根据本发明，提供了一种热敏成像元件，其包括具有亲水表面的光刻基底，包含疏水性热塑性聚合物胶乳的图像形成层和能够将光转换成热的化合物存在于所述图像形成层中，或其特征在于，所述热敏成像元件包括具有亲水表面的所述光刻基底与所述图像形成层之间的阻挡层，所述阻挡层和所述图像形成层可在pH为at的水溶液中除去至少5。

5. 发明申请

US20050037287A1 Method for postbaking a lithographic printing plate 审中-公开
标题翻译：印刷平版印刷版的方法
公开(公告)号：US20050037287A1
公开(公告)日：2005-02-17
申请号：US10914336
申请日：2004-08-09
申请人： Eric Verschueren , Marc Van Damme
发明人： Eric Verschueren , Marc Van Damme
IPC分类号： G03F7/26
CPC分类号： B41C1/1008 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , B41N3/08 , G03F7/40
摘要： A method for making a lithographic printing plate is disclosed wherein the method comprises the steps of: (i) providing a lithographic printing plate precursor comprising a photosensitive coating on a substrate having a hydrophilic surface, (ii) image-wise exposing said photosensitive coating, (iii) developing said exposed coating to form an image on said substrate and optionally gumming the plate and (iv) baking the image on the plate, wherein said baking step is carried out within a dwell-time of less than 1 minute and wherein the chemical resistance of the coating against printing liquids and press chemicals is improved. This baking step is preferably carried out by exposing the printing plate to an infrared radiation source, preferably in a dynamic configuration.
摘要翻译：公开了一种制备平版印刷版的方法，其中所述方法包括以下步骤：（i）提供平版印刷版前体，其包含在具有亲水表面的基底上的感光涂层，（ii）成像曝光所述光敏涂层，（iii）显影所述暴露的涂层以在所述基底上形成图像，并且任选地涂覆所述板，和（iv）在所述板上烘烤图像，其中所述烘烤步骤在小于1分钟的停留时间内进行，并且其中提高了涂料对印刷液和印刷化学品的耐化学性。该烘烤步骤优选通过将印刷版暴露于红外辐射源，优选以动态构型进行。

6. 发明授权

US06192799B1 Heat mode sensitive imaging element for making positive working printing plates 有权
标题翻译：加热模式敏感成像元件，用于制作正性印刷版
公开(公告)号：US06192799B1
公开(公告)日：2001-02-27
申请号：US09267681
申请日：1999-03-15
申请人： Marc Van Damme , Joan Vermeersch , Guido Hauquier , Eric Verschueren
发明人： Marc Van Damme , Joan Vermeersch , Guido Hauquier , Eric Verschueren
IPC分类号： B41C110
CPC分类号： B41C1/1016 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/24 , B41C2210/262
摘要： According to the present invention there is provided a heat mode imaging element for making a lithographic printing plate having on a lithographic base with a hydrophilic surface a first layer including a polymer that is soluble in an aqueous alkaline solution and a top layer on the same side of the lithographic base as the first layer that is IR-sensitive and unpenetrable for an alkaline developer; characterized in that at least one of the first layer and the top layer includes a surfactant.
摘要翻译：根据本发明，提供了一种热模式成像元件，用于制造在具有亲水表面的平版印刷基底上的平版印刷版，第一层包括可溶于碱性水溶液的聚合物和位于同一侧的顶层的光刻基底作为对于碱性显影剂是IR敏感且不透气的第一层; 其特征在于，所述第一层和所述顶层中的至少一个包括表面活性剂。

7. 发明授权

US6152036A Heat mode sensitive imaging element for making positive working printing plates 失效
标题翻译：加热模式敏感成像元件，用于制作正性印刷版
公开(公告)号：US6152036A
公开(公告)日：2000-11-28
申请号：US280659
申请日：1999-03-29
申请人： Eric Verschueren , Huub Van Aert , Joan Vermeersch , Marc Van Damme , Guido Hauquier
发明人： Eric Verschueren , Huub Van Aert , Joan Vermeersch , Marc Van Damme , Guido Hauquier
IPC分类号： B41C1/10 , B41M5/36 , G03F7/00
CPC分类号： B41C1/1008 , B41C1/1016 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/24 , B41C2210/26 , B41C2210/264
摘要： The present invention is directed to a heat mode imaging element for making a lithographic printing plate including on a lithographic base with a hydrophilic surface, a first layer including a polymer, soluble in an aqueous alkaline solution, and a top layer on the same side of the lithographic base as the first layer. The top layer is IR-sensitive and unpenetrable for an alkaline developer. The first layer and the top layer may be one and the same layer. The top layer is characterized in that it contains at least one compound containing epoxy units in an amount between 20 and 500 mg/m.sup.2 and a hardener.
摘要翻译：本发明涉及一种用于制造平版印刷版的热模式成像元件，该平版印刷版包括在具有亲水表面的光刻基底上，包含可溶于碱性水溶液的聚合物的第一层和位于同一侧的顶层光刻基底为第一层。顶层对于碱性显影剂是IR敏感的和不可穿透的。第一层和顶层可以是同一层。顶层的特征在于其含有至少一种含有20-500mg / m 2的环氧单元的化合物和一种硬化剂。

8. 发明授权

US06569594B2 Heat mode sensitive imaging element for making positive working printing plates 有权
标题翻译：加热模式敏感成像元件，用于制作正性印刷版
公开(公告)号：US06569594B2
公开(公告)日：2003-05-27
申请号：US09267634
申请日：1999-03-15
申请人： Marc Van Damme , Joan Vermeersch , Eric Verschueren , Guido Hauquier
发明人： Marc Van Damme , Joan Vermeersch , Eric Verschueren , Guido Hauquier
IPC分类号： G03F7039
CPC分类号： B41C1/1016 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/24 , B41C2210/262 , B41M5/465 , B41N3/03 , Y10S430/145 , Y10S430/146 , Y10S430/165
摘要： According to the present invention there is provided a heat mode imaging element for providing a lithographic printing plate consisting of a lithographic base with a hydrophilic surface and a top layer that is sensitive to IR-radiation, comprises a polymer soluble in an aqueous alkaline solution, and is unpenetrable for an aqueous alkaline developer, characterized in that said top layer comprises a polysiloxane surfactant.
摘要翻译：根据本发明，提供了一种用于提供由具有亲水表面的光刻基底和对IR辐射敏感的顶层组成的平版印刷版的热模式成像元件，包括可溶于碱性水溶液的聚合物，并且对于含水碱性显影剂是不可穿透的，其特征在于所述顶层包含聚硅氧烷表面活性剂。

9. 发明授权

US06447977B2 Heat mode sensitive imaging element for making positive working printing plates 有权
标题翻译：加热模式敏感成像元件，用于制作正性印刷版
公开(公告)号：US06447977B2
公开(公告)日：2002-09-10
申请号：US09260062
申请日：1999-03-02
申请人： Joan Vermeersch , Marc Van Damme , Eric Verschueren , Guido Hauquier
发明人： Joan Vermeersch , Marc Van Damme , Eric Verschueren , Guido Hauquier
IPC分类号： G03F7039
CPC分类号： B41C1/1016 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/24 , B41C2210/262 , Y10S430/145 , Y10S430/146 , Y10S430/165
摘要： According to the present invention there is provided a heat mode imaging element for making a lithographic printing plate having on a lithographic base with a hydrophilic surface a first layer including a polymer soluble in an aqueous alkaline solution, and a top layer on the same side of the lithographic base as the first layer that is IR-sensitive and unpenetrable for an aqueous alkaline developer wherein said first layer and said top layer may be one and the same layer; characterized in that the surface of said element upon exposure and treatment with an aqueous alkaline developer is such that a) the contact angle between the unexposed areas of the imaging element and the aqueous alkaline developer changes for at most 6° during the first minute of contact with said developer; b) the contact angle between the exposed areas of the imaging element and the aqueous alkaline developer changes more than 15° during the first minute of contact with said developer; c) the difference in contact angle between on the one side the unexposed areas and on the other side the exposed areas of the imaging element with the aqueous alkaline solution at the onset of the measurement is not higher than 10°.
摘要翻译：根据本发明，提供了一种用于制造平版印刷版的热模式成像元件，该平版印刷版在具有亲水表面的光刻基底上具有包含可溶于碱性水溶液的聚合物的第一层，作为第一层的平版印刷基底，其对于碱性水溶液的IR敏感性和不透气性，其中所述第一层和所述顶层可以是同一层; 其特征在于，当用碱性显影剂水溶液曝光和处理时，所述元件的表面是这样的：a）成像元件的未曝光区域与含水碱性显影剂之间的接触角在接触第一分钟期间变化最多6° 所述显影剂; b）在与所述显影剂接触的第一分钟期间，成像元件的暴露区域和碱性水性显影剂之间的接触角变化大于15°; c）一侧上未曝光的接触角之间的差异在测量开始时，成像元件与碱性水溶液的曝光区域不高于10°。

10. 发明授权

US06489079B1 Heat mode sensitive imaging element for making positive working printing plates 有权
标题翻译：加热模式敏感成像元件，用于制作正性印刷版
公开(公告)号：US06489079B1
公开(公告)日：2002-12-03
申请号：US09391421
申请日：1999-09-08
申请人： Eric Verschueren , Joan Vermeersch , Marc Van Damme , Guido Hauquier , Huub Van Aert
发明人： Eric Verschueren , Joan Vermeersch , Marc Van Damme , Guido Hauquier , Huub Van Aert
IPC分类号： G03F7004
CPC分类号： B41C1/1025 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/24 , B41N1/083 , Y10S430/165
摘要： According to the present invention there is provided a heat mode imaging element for making a lithographic printing plate comprising on a lithographic base with a hydrophilic surface a first layer including a polymer, soluble in an aqueous alkaline solution and a top layer on the same side of the lithographic base as the first layer which top layer is IR-sensitive and unpenetrable for an alkaline developer wherein said first layer and said top layer may be one and the same layer; characterized in that said top layer contains at least one blockcopolymer in an amount between 0.5 and 500 mg/m2.
摘要翻译：根据本发明，提供一种用于制造平版印刷版的热模式成像元件，该平版印刷版包括在具有亲水表面的平版印刷基底上，第一层包括可溶于碱性水溶液的聚合物和位于同一侧上的顶层作为第一层的光刻基底，其顶层对于碱性显影剂是IR敏感的和不可穿透的，其中所述第一层和所述顶层可以是同一层; 其特征在于所述顶层含有至少一种0.5-500mg / m 2的嵌段共聚物。

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