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    • 1. 发明申请
    • RETICLE POD
    • US20140183076A1
    • 2014-07-03
    • US14139653
    • 2013-12-23
    • Entegris, Inc.
    • Steven P. KolbowKevin McMullenAnthony M. TiebenMatthew KuszDavid L. HalbmaierJohn Lystad
    • B65D85/48
    • B65D85/48G03F1/66H01L21/67353H01L21/67359H01L21/67383H01L21/67386
    • A dual containment pod having an outer pod and an inner pod that provides support structure and environmental control means. The inner pod includes a base having a flat, polished surface with protrusions upon which the reticle seats and providing a gap between the reticle and the polished surface. The gap separates the reticle from the flat, polished surface of the base and is dimensioned to inhibit migration of particles into the gap, thereby preventing contamination of sensitive surfaces of the wafer or reticle. The top cover of the inner pod seats on the polished surface proximate a periphery of the base. Moveable reticle engaging pins on the top cover of the inner pod are engaged by the top cover of the outer container when the inner pod is assembled inside the outer pod providing reticle restraint.
    • 一个双重安全壳,具有一个外舱和一个提供支撑结构和环境控制装置的内舱。 内部容器包括具有平坦的抛光表面的基部,该表面具有突出部,所述掩模版位于所述底部上并且在所述掩模版和抛光表面之间提供间隙。 该间隙将掩模版与基底的平坦抛光表面分开,并且其尺寸被设计成抑制颗粒迁移到间隙中,从而防止晶片或掩模版的敏感表面的污染。 内部容器的顶盖位于靠近基座周边的抛光表面上。 内部容器的顶盖上的可移动的标线接合销与外部容器的顶盖接合,当内部容器组装在外部容器内部时,提供掩模版限制。