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    • 8. 发明授权
    • Protection of NROM devices from charge damage
    • 保护NROM设备免受充电损坏
    • US07317633B2
    • 2008-01-08
    • US11175801
    • 2005-07-05
    • Eli LuskyIlan BloomAssaf ShappirBoaz Eitan
    • Eli LuskyIlan BloomAssaf ShappirBoaz Eitan
    • G11C16/22H01L23/62
    • H01L27/105G11C16/22H01L27/0266H01L27/11568
    • A method for protecting NROM devices from charge damage during process steps, the method including providing X-decoder structure for word line connections, wherein each word line is connected to a pair of transistors, a PMOS transistor and an NMOS transistor the PMOS transistors sharing a common deep N well and the NMOS transistors connected to a P well, wherein during negative charging, the NMOS transistors shunt leakage current to ground, and during positive charging, the PMOS transistors shunt leakage current to ground, providing an N+ tap connected to the N well and connecting the N+ tap to a positive voltage clamping device, and connecting all the P wells together to a common P+ tap and connecting the P+ tap to a negative voltage clamping device, wherein during process steps, the negative and positive voltage clamping devices direct leakage current to ground.
    • 一种用于在处理步骤期间保护NROM器件免受电荷损伤的方法,所述方法包括提供用于字线连接的X解码器结构,其中每个字线连接到一对晶体管,PMOS晶体管和NMOS晶体管,PMOS晶体管共享 公共深N阱和连接到P阱的NMOS晶体管,其中在负电荷期间,NMOS晶体管将泄漏电流分流到地,并且在正充电期间,PMOS晶体管将泄漏电流分流到地,提供连接到N的N +抽头 并且将N +抽头连接到正电压钳位装置,并将所有P阱连接到一个公共P +抽头,并将P +抽头连接到负电压钳位装置,其中在处理步骤期间,负和正电压钳位装置直接 漏电流到地。
    • 9. 发明申请
    • Protection of NROM devices from charge damage
    • 保护NROM设备免受充电损坏
    • US20060007612A1
    • 2006-01-12
    • US11175801
    • 2005-07-05
    • Eli LuskyIlan BloomAssaf ShappirBoaz Eitan
    • Eli LuskyIlan BloomAssaf ShappirBoaz Eitan
    • H02H9/00
    • H01L27/105G11C16/22H01L27/0266H01L27/11568
    • A method for protecting NROM devices from charge damage during process steps, the method including providing X-decoder structure for word line connections, wherein each word line is connected to a pair of transistors, a PMOS transistor T1 and an NMOS transistor T2, the PMOS transistors T1 sharing a common deep N well and the NMOS transistors T2 connected to a P well, wherein during negative charging, the NMOS transistors T2 shunt leakage current to ground, and during positive charging, the PMOS transistors T1 shunt leakage current to ground, providing an N+ tap connected to the N well and connecting the N+ tap to a positive voltage clamping device, and connecting all the P wells together to a common P+ tap and connecting the P+ tap to a negative voltage clamping device, wherein during process steps, the negative and positive voltage clamping devices direct leakage current to ground.
    • 一种用于在处理步骤期间保护NROM器件免受电荷损伤的方法,所述方法包括提供用于字线连接的X解码器结构,其中每个字线连接到一对晶体管,PMOS晶体管T1和NMOS晶体管T2,PMOS 晶体管T1共享共同的深N阱和连接到P阱的NMOS晶体管T2,其中在负电荷期间,NMOS晶体管T2将漏电流分配到地,并且在正充电期间,PMOS晶体管T1将漏电流分流到地,提供 N +抽头连接到N阱并将N +抽头连接到正电压钳位装置,并将所有P阱连接到一个公共P +抽头,并将P +抽头连接到负电压钳位装置,其中在处理步骤期间, 负和正电压钳位器件将漏电流直接接地。