会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明申请
    • Method of forming fine partition walls, method of producing planar display device, and abrasive for jet processing
    • 形成细分隔壁的方法,制造平面显示装置的方法和用于喷射处理的磨料
    • US20050170755A1
    • 2005-08-04
    • US11090046
    • 2005-03-28
    • Eitaro YoshikawaHiroshi MoriTomohiro KimuraHidehiro Kawaguchi
    • Eitaro YoshikawaHiroshi MoriTomohiro KimuraHidehiro Kawaguchi
    • B24B1/00B24C11/00H01J9/00H01J9/24H01J11/00
    • H01J9/242H01J2211/36
    • A method of forming fine partition walls by which fine partition walls with stable shape can be formed with good processing accuracy and at good grinding efficiency by a jet processing technique, a method of producing a planar display device by application of the method, and an abrasive for jet processing to be used in these methods, are disclosed. The fine partition walls are formed on the surface of a substrate, by jet processing using an abrasive comprised of a powder of calcium carbonate coated with silicone on the surfaces thereof. Each of the particles constituting the abrasive has a three-dimensional shape comprised of a stack of different-sized triangular or more-angular polygonal layers. The maximum particle diameter of the abrasive is not more than ½ times the width (W1) of the fine partition walls, and the mean particle diameter of the abrasive is not more than ⅕ times the width (W1) of the fine partition walls. In addition, the maximum particle diameter of the abrasive is not more than 10 μm. The pitch (P1) of the fine partition walls (24) is not more than 150 μm, the width (W1) of the fine partition walls (24) is not more than 50 μm, and the height (H1) of the fine partition walls (24) is not more than 300 μm. The thickness of a resist film (30) is not more than 1.2 times the width (W1) of the fine partition walls (24).
    • 可以通过喷射加工技术形成具有稳定形状的细分隔壁的良好的加工精度和良好的研磨效率的精细隔壁的方法,通过应用该方法制造平面显示装置的方法和研磨剂 用于这些方法中的喷射处理。 通过使用在其表面上涂覆有硅氧烷的碳酸钙粉末的研磨剂喷射处理,在基材的表面上形成细分隔壁。 构成研磨剂的每个颗粒具有由不同大小的三角形或多角形多边形层组成的三维形状。 研磨剂的最大粒径不超过细分隔壁的宽度(W 1)的1/2倍,研磨剂的平均粒径不超过精细度的宽度(W 1)的1/5 隔墙。 此外,研磨剂的最大粒径不大于10微米。 细分隔壁(24)的间距(P1)不大于150μm,细分隔壁(24)的宽度(W 1)不大于50μm,高度(H 1)为 细分隔壁(24)不大于300μm。 抗蚀剂膜(30)的厚度不超过细分隔壁(24)的宽度(W 1)的1.2倍。
    • 7. 发明授权
    • Display device
    • 显示设备
    • US06184620B2
    • 2001-02-06
    • US09252065
    • 1999-02-18
    • Hiroshi MoriKiyohiko MiyaharaHidehiro KawaguchiSuehiro Nakamura
    • Hiroshi MoriKiyohiko MiyaharaHidehiro KawaguchiSuehiro Nakamura
    • H01J1720
    • H01J11/14H01J11/32H01J2211/323
    • In an alternating-current driving-type display device utilizing the plasma discharge, a discharge maintaining electrode group composed of a plurality of discharge maintaining electrodes (I) and an address electrode group composed of a plurality of address electrodes (J) are formed on one substrate (22), the address electrode group which crosses the discharge maintaining electrode group through an insulator layer (27) and a discharge starting address group from a plurality of discharge starting address electrodes (K) composing a part of the address electrode group are continuously formed at the same time, the discharge maintaining electrode group and the discharge starting address electrode group are formed on the same plane, and a dielectric layer is formed on the discharge maintaining electrode group, the address electrode group and the discharge starting address electrode group.
    • 在利用等离子体放电的交流驱动型显示装置中,由多个放电维持电极(I)构成的放电维持电极组和由多个寻址电极(J)组成的寻址电极组形成在一个 基板(22),连续地通过绝缘体层(27)与放电维持电极组交叉的寻址电极组和来自构成寻址电极组的一部分的多个放电起始寻址电极(K)的放电开始地址组, 同时形成放电维持电极组和放电开始寻址电极组,并且在放电维持电极组,寻址电极组和放电开始寻址电极组上形成电介质层。