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    • 3. 发明申请
    • PYROGENICALLY PRODUCED SILICON DIOXIDE POWDER
    • 生产二氧化硅粉末
    • US20080145659A1
    • 2008-06-19
    • US12017861
    • 2008-01-22
    • Kai SCHUMACHERNaruyasu IshibashiHitoshi KobayashiPaul Brandl
    • Kai SCHUMACHERNaruyasu IshibashiHitoshi KobayashiPaul Brandl
    • C01B33/12
    • C01B33/183Y10T428/2982
    • Pyrogenically produced silicon dioxide powder in the form of aggregates of primary particles having a BET surface area of 300±25 m2/g, wherein the aggregates display an average surface area of 4800 to 6000 nm2, an average equivalent circle diameter (ECD) of 60 to 80 nm and an average circumference of 580 to 750 nm.It is produced by a pyrogenic process in which silicon tetrachloride and a maximum of up to 40 wt. % of a second silicon component comprising H3SiCl, H2SiCl2, HSiCl3, CH3SiCl3, (CH3)2SiCl2, (CH3)3SiCl and/or (n-C3H7)SiCl3 are mixed with primary air and a combustion gas and burnt into a reaction chamber, secondary air also being introduced into the reaction chamber, and the feed materials being chosen such that an adiabatic flame temperature of 1390 to 1450° C. is obtained.It can be used as a filler.
    • 以BET表面积为300±25m 2 / g的一次粒子的聚集体形式的热解生成的二氧化硅粉末,其中聚集体的平均表面积为4800〜6000nm, 2,平均当量圆直径(ECD)为60〜80nm,平均周长为580〜750nm。 它是通过热解法生产的,其中四氯化硅和最多达40wt。 %的包含H 3 SiCl,H 2 SiCl 2,HSiCl 3,CH,SUB的第二硅组分的% (CH 3)3 SiCl 3,(CH 3 3)2 SiCl 2,(CH 3) 3 N 3 SiCl 3和/或(n C 3 H 7)SiCl 3 3与 初级空气和燃烧气体并燃烧到反应室中,二次空气也被引入反应室,并且进料选择为使得绝热火焰温度为1390至1450℃。 它可以用作填料。
    • 6. 发明授权
    • Pyrogenically produced silicon dioxide powder
    • 热解生成二氧化硅粉末
    • US07351388B2
    • 2008-04-01
    • US11085151
    • 2005-03-22
    • Kai SchumacherNaruyasu IshibashiHitoshi KobayashiPaul Brandl
    • Kai SchumacherNaruyasu IshibashiHitoshi KobayashiPaul Brandl
    • C01B33/12
    • C01B33/183Y10T428/2982
    • Pyrogenically produced silicon dioxide powder in the form of aggregates of primary particles having a BET surface area of 300±25 m2/g, wherein the aggregates display an average surface area of 4800 to 6000 nm2, an average equivalent circle diameter (ECD) of 60 to 80 nm and an average circumference of 580 to 750 nm.It is produced by a pyrogenic process in which silicon tetrachloride and a maximum of up to 40 wt. % of a second silicon component comprising H3SiCl, H2SiCl2, HSiCl3, CH3SiCl3, (CH3)2SiCl2, (CH3)3SiCl and/or (n-C3H7)SiCl3 are mixed with primary air and a combustion gas and burnt into a reaction chamber, secondary air also being introduced into the reaction chamber, and the feed materials being chosen such that an adiabatic flame temperature of 1390 to 1450° C. is obtained.It can be used as a filler.
    • 以BET表面积为300±25m 2 / g的一次粒子的聚集体形式的热解生成的二氧化硅粉末,其中聚集体的平均表面积为4800〜6000nm, 2,平均当量圆直径(ECD)为60〜80nm,平均周长为580〜750nm。 它是通过热解法生产的,其中四氯化硅和最多达40wt。 %的包含H 3 SiCl,H 2 SiCl 2,HSiCl 3,CH,SUB的第二硅组分的% (CH 3)3 SiCl 3,(CH 3 3)2 SiCl 2,(CH 3) 3 N 3 SiCl 3和/或(n C 3 H 7)SiCl 3 3与 初级空气和燃烧气体并燃烧到反应室中,二次空气也被引入反应室,并且进料选择为使得绝热火焰温度为1390至1450℃。 它可以用作填料。
    • 7. 发明申请
    • Pyrogenically produced silicone dioxide powder
    • 热解产生的二氧化硅粉末
    • US20060153764A1
    • 2006-07-13
    • US11085151
    • 2005-03-22
    • Kai SchumacherNaruyasu IshibashiHitoshi KobayashiPaul Brandl
    • Kai SchumacherNaruyasu IshibashiHitoshi KobayashiPaul Brandl
    • C01B33/12
    • C01B33/183Y10T428/2982
    • Pyrogenically produced silicon dioxide powder in the form of aggregates of primary particles having a BET surface area of 300±25 m2/g, wherein the aggregates display an average surface area of 4800 to 6000 nm2, an average equivalent circle diameter (ECD) of 60 to 80 nm and an average circumference of 580 to 750 nm. It is produced by a pyrogenic process in which silicon tetrachloride and a maximum of up to 40 wt. % of a second silicon component comprising H3SiCl, H2SiCl2, HSiCl3, CH3SiCl3, (CH3)2SiCl2, (CH3)3SiCl and/or (n-C3H7)SiCl3 are mixed with primary air and a combustion gas and burnt into a reaction chamber, secondary air also being introduced into the reaction chamber, and the feed materials being chosen such that an adiabatic flame temperature of 1390 to 1450° C. is obtained. It can be used as a filler.
    • 以BET表面积为300±25m 2 / g的一次粒子的聚集体形式的热解生成的二氧化硅粉末,其中聚集体的平均表面积为4800〜6000nm, 2,平均当量圆直径(ECD)为60〜80nm,平均周长为580〜750nm。 它是通过热解法生产的,其中四氯化硅和最多达40wt。 %的包含H 3 SiCl,H 2 SiCl 2,HSiCl 3,CH,SUB的第二硅组分的% (CH 3)3 SiCl 3,(CH 3 3)2 SiCl 2,(CH 3) 3 N 3 SiCl 3和/或(n C 3 H 7)SiCl 3 3与 初级空气和燃烧气体并燃烧到反应室中,二次空气也被引入反应室,并且进料选择为使得绝热火焰温度为1390至1450℃。 它可以用作填料。