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1. 发明授权

US4551416A Process for preparing semiconductors using photosensitive bodies 失效
标题翻译：使用感光体制备半导体的方法
公开(公告)号：US4551416A
公开(公告)日：1985-11-05
申请号：US489796
申请日：1983-04-29
申请人： Edwin A. Chandross , Elsa Reichmanis , Cletus W. Wilkins, Jr.
发明人： Edwin A. Chandross , Elsa Reichmanis , Cletus W. Wilkins, Jr.
IPC分类号： C08K5/00 , C07F7/18 , C07J51/00 , C08K5/32 , C08L33/00 , C08L33/02 , G03C1/72 , G03C5/08 , G03F7/004 , G03F7/039 , G03F7/20 , H01L21/027 , G03C5/00
CPC分类号： C07F7/1804 , C07F7/1856 , C07J51/00 , G03F7/0045
摘要： Photosensitive bodies that are sensitive to ultraviolet radiation and that exhibit excellent contrast are formed from base soluble polymers such as poly(methyl methacrylate-co-methacrylic acid) physically mixed with base insoluble materials such as o,o'-dinitrobenzyl esters. The base insoluble esters decompose upon irradiation to form base soluble entities in the irradiated regions. These irradiated portions are then soluble in basic solutions that are used to develop the desired image.
摘要翻译：对紫外线辐射敏感并且表现出优异对比度的感光体由基础可溶性聚合物形成，例如与基础不溶性物质如邻二甲基苄基酯物理混合的聚（甲基丙烯酸甲酯 - 共 - 甲基丙烯酸）。碱不溶性酯在照射时分解，以在照射区域中形成碱溶性实体。然后这些照射的部分可溶于用于显影所需图像的碱性溶液中。

2. 发明授权

US4666820A Photosensitive element comprising a substrate and an alkaline soluble mixture 失效
标题翻译：包含底物和碱溶性混合物的感光元件
公开(公告)号：US4666820A
公开(公告)日：1987-05-19
申请号：US764612
申请日：1985-08-12
申请人： Edwin A. Chandross , Elsa Reichmanis , Cletus W. Wilkins, Jr.
发明人： Edwin A. Chandross , Elsa Reichmanis , Cletus W. Wilkins, Jr.
IPC分类号： C07F7/18 , C07J51/00 , G03F7/004 , G03C1/76
CPC分类号： G03F7/0045 , C07F7/1856 , C07J51/00
摘要： Photosensitive bodies that are sensitive to ultraviolet radiation and that exhibit excellent contrast are formed from base soluble polymers such as poly(methyl methacrylate-co-methacrylic acid) physically mixed with base insoluble materials such as o,o'-dinitrobenzyl esters. The base insoluble esters decompose upon irradiation to form base soluble entities in the irradiated regions. These irradiated portions are then soluble in basic solutions that are used to develop the desired image.
摘要翻译：对紫外线辐射敏感并且表现出优异对比度的感光体由基础可溶性聚合物形成，例如与基础不溶性物质如邻二甲基苄基酯物理混合的聚（甲基丙烯酸甲酯 - 共 - 甲基丙烯酸）。碱不溶性酯在照射时分解，以在照射区域中形成碱可溶性物质。然后这些照射的部分可溶于用于显影所需图像的碱性溶液中。

3. 发明授权

US4400461A Process of making semiconductor devices using photosensitive bodies 失效
标题翻译：使用感光体制造半导体器件的工艺
公开(公告)号：US4400461A
公开(公告)日：1983-08-23
申请号：US265554
申请日：1981-05-22
申请人： Edwin A. Chandross , Elsa Reichmanis , Cletus W. Wilkins, Jr.
发明人： Edwin A. Chandross , Elsa Reichmanis , Cletus W. Wilkins, Jr.
IPC分类号： C08K5/00 , C08K5/32 , C08L33/00 , C08L33/02 , G03C1/00 , G03F7/004 , G03F7/039 , G03C5/00
CPC分类号： G03F7/0045
摘要： Photosensitive bodies that are sensitive to ultraviolet radiation and that exhibit excellent contrast are formed from base soluble polymers such as poly(methyl methacrylate-co-methacrylic acid) physically mixed with base insoluble materials such as o-nitrobenzyl esters. The base insoluble esters decompose upon irradiation to form base soluble entities in the irradiated regions. These irradiated portions are then soluble in basic solutions that are used to develop the desired image.
摘要翻译：对紫外线辐射敏感并且表现出优异对比度的感光体由基础可溶性聚合物形成，例如与基础不溶性物质如邻硝基苄基酯物理混合的聚（甲基丙烯酸甲酯 - 共 - 甲基丙烯酸）。碱不溶性酯在照射时分解，以在照射区域中形成碱溶性实体。然后这些照射的部分可溶于用于显影所需图像的碱性溶液中。

4. 发明授权

US4373018A Multiple exposure microlithography patterning method 失效
标题翻译：多曝光微光刻图案法
公开(公告)号：US4373018A
公开(公告)日：1983-02-08
申请号：US270792
申请日：1981-06-05
申请人： Elsa Reichmanis , Bernard J. Roman , King L. Tai , Cletus W. Wilkins, Jr.
发明人： Elsa Reichmanis , Bernard J. Roman , King L. Tai , Cletus W. Wilkins, Jr.
IPC分类号： G03F7/095 , G03C5/00 , G03C1/76
CPC分类号： G03F7/095
摘要： High-resolution patterning of a device surface is effected by a method which involves the use of a multi-layer resist structure. An organic resist layer is on the surface to be patterned, and an inorganic resist layer is on the organic resist layer. A pattern is produced in the inorganic layer by exposure to actinic radiation and, after development of the inorganic layer, the pattern is replicated in the organic layer by additional exposure to actinic radiation. The pattern is then developed in the organic layer so as to leave exposed surface portions to be affected by a fabrication agent.
摘要翻译：通过涉及使用多层抗蚀剂结构的方法来实现器件表面的高分辨率图案化。有机抗蚀剂层在待图案化的表面上，无机抗蚀剂层在有机抗蚀剂层上。通过暴露于光化辐射，在无机层中产生图案，并且在无机层显影之后，通过额外暴露于光化辐射，在有机层中复制图案。然后在有机层中显影图案，以使暴露的表面部分受到制造剂的影响。

5. 发明授权

US4521274A Bilevel resist 失效
标题翻译：双层抗蚀剂
公开(公告)号：US4521274A
公开(公告)日：1985-06-04
申请号：US613884
申请日：1984-05-24
申请人： Elsa Reichmanis , Cletus W. Wilkins, Jr.
发明人： Elsa Reichmanis , Cletus W. Wilkins, Jr.
IPC分类号： G03F7/11 , G03C1/00 , G03C1/72 , G03F7/00 , G03F7/022 , G03F7/039 , G03F7/075 , G03F7/09 , H01L21/027 , H01L21/30 , B44C1/22 , B29C17/08 , C03C15/00 , C03C25/06
CPC分类号： G03F7/094 , Y10S438/95
摘要： Excellent resolution in the lithographic fabrication of electronic devices is achieved with a specific bilevel resist. This bilevel resist includes an underlying layer formed with a conventional material such as a novolac resist baked at 200.degree. C. for 30 minutes and an overlying layer including a silicon containing material such as that formed by the condensation of formaldehyde with a silicon-substituted phenol. This bilevel resist has the attributes of a trilevel resist and requires significantly less processing.
摘要翻译：使用特定的双层抗蚀剂实现了电子器件的光刻制造中的优异分辨率。这种双层抗蚀剂包括用常规材料形成的下层，例如在200℃下烘烤30分钟的酚醛清漆抗蚀剂，以及包含含硅材料的覆盖层，例如通过甲醛与硅取代的苯酚。这种双层抗蚀剂具有三层抗蚀剂的性质，并且需要显着更少的加工。

6. 发明授权

US4343889A Process of exposing and developing terpolymer photosensitive bodies 失效
标题翻译：三元共聚物感光体的曝光和显影工艺
公开(公告)号：US4343889A
公开(公告)日：1982-08-10
申请号：US236114
申请日：1981-02-19
申请人： Elsa Reichmanis , Cletus W. Wilkins, Jr.
发明人： Elsa Reichmanis , Cletus W. Wilkins, Jr.
IPC分类号： G03F7/039 , G03C5/00
CPC分类号： G03F7/039
摘要： A photolithographic resist with excellent sensitivity for actinic radiation in the short wavelength ultraviolet region is produced from terpolymers of (1) methyl methacrylate, (2) materials such as 3-oximino-2-butanone methacrylate, and (3) compounds such as methacrylonitrile.
摘要翻译：（1）甲基丙烯酸甲酯，（2）诸如3-肟基-2-丁酮甲基丙烯酸酯的材料和（3）化合物如甲基丙烯腈的三元共聚物制备了在短波紫外区域中对光化辐射具有优异灵敏度的光刻抗蚀剂。

7. 发明授权

US4382120A Photosensitive element containing UV sensitive terpolymers 失效
标题翻译：含有紫外线敏感三元共聚物的感光元件
公开(公告)号：US4382120A
公开(公告)日：1983-05-03
申请号：US347483
申请日：1982-02-10
申请人： Elsa Reichmanis , Cletus W. Wilkins, Jr.
发明人： Elsa Reichmanis , Cletus W. Wilkins, Jr.
IPC分类号： G03F7/039 , G03C1/68
CPC分类号： G03F7/039 , Y10S522/91
摘要： A photolithographic resist with excellent sensitivity for actinic radiation in the short wavelength ultraviolet region is produced from terpolymers of (1) methyl methacrylate, (2) materials such as 3-oximino-2-butanone methacrylate, and (3) compounds such as methacrylonitrile.
摘要翻译：由（1）甲基丙烯酸甲酯，（2）诸如3-肟基-2-丁酮甲基丙烯酸酯的材料和（3）化合物如甲基丙烯腈的三元共聚物制备了在短波长紫外区域中具有优异的光化辐射灵敏度的光刻抗蚀剂。

8. 发明授权

US07569415B2 Liquid phase fabrication of active devices including organic semiconductors 失效
标题翻译：包括有机半导体在内的有源器件的液相制造
公开(公告)号：US07569415B2
公开(公告)日：2009-08-04
申请号：US11240222
申请日：2005-09-30
申请人： Florian Dötz , Howard E. Katz , Jimmy Granstrom , Elsa Reichmanis , Subramanian Vaidyanathan , Ingolf Hennig , Frauke Richter
发明人： Florian Dötz , Howard E. Katz , Jimmy Granstrom , Elsa Reichmanis , Subramanian Vaidyanathan , Ingolf Hennig , Frauke Richter
IPC分类号： H01L51/40
CPC分类号： H01L51/0068 , H01L51/0003 , H01L51/0055 , H01L51/052 , H01L51/0529
摘要： Techniques including steps of: providing a support body; forming an organic semiconductor composition body including an organic semiconductor composition on the support body, no more than 10% by weight of the organic semiconductor composition being pentacene; providing a first organic dielectric composition mobilized in a first liquid medium, the organic semiconductor composition being insoluble in the first liquid medium; and forming a first organic dielectric composition body from the first organic dielectric composition on the organic semiconductor composition body. Techniques in which an organic semiconductor composition body is formed on an organic dielectric composition body. Apparatus having an organic dielectric composition body on an organic semiconductor composition body.
摘要翻译：技术包括以下步骤：提供支撑体; 在载体上形成包含有机半导体组合物的有机半导体组合物，不超过10重量％的有机半导体组合物为并五苯; 提供在第一液体介质中移动的第一有机电介质组合物，所述有机半导体组合物不溶于所述第一液体介质; 以及在所述有机半导体组合物主体上从所述第一有机电介质组合物形成第一有机电介质组合物体。在有机电介质组合物体上形成有机半导体组合物体的技术。在有机半导体组合物主体上具有有机电介质组合物本体的装置。

9. 发明授权

US07309876B2 Organic semiconductor having polymeric and nonpolymeric constituents 失效
标题翻译：具有聚合物和非聚合物成分的有机半导体
公开(公告)号：US07309876B2
公开(公告)日：2007-12-18
申请号：US11362671
申请日：2006-02-27
申请人： Elsa Reichmanis , Oleksander Sydorenko , Subramanian Vaidyanathan
发明人： Elsa Reichmanis , Oleksander Sydorenko , Subramanian Vaidyanathan
IPC分类号： H01L29/08
CPC分类号： H01L51/0545 , H01L51/0036 , H01L51/0039 , H01L51/0043 , H01L51/0055 , H01L51/0071 , H01L51/0094 , H01L51/0566
摘要： A composition, comprising organic polymer molecules, and organic nonpolymeric molecules, wherein the composition is a semiconducting solid. The composition includes a distribution of crystal domains of the polymer molecules and inter-domain regions between the crystal domains, a concentration of polymer molecules being higher in the crystal domains than in the inter-domain regions, and a concentration of nonpolymeric molecules being higher in the inter-domain regions than in the crystal domains.
摘要翻译：包含有机聚合物分子和有机非聚合物分子的组合物，其中所述组合物是半导体固体。该组合物包括聚合物分子的晶体畴和晶体域之间的畴间区域的分布，晶体域中聚合物分子的浓度高于域间区域，并且非聚合物分子的浓度高于域间区域比晶体域中。

10. 发明授权

US07168266B2 Process for making crystalline structures having interconnected pores and high refractive index contrasts 有权
$Process for making crystalline structures having interconnected pores and high refractive index contrasts$
标题翻译：具有互连孔和高折射率对比的结晶结构的方法
公开(公告)号：US07168266B2
公开(公告)日：2007-01-30
申请号：US10383150
申请日：2003-03-06
申请人： Gang Chen , Ronen Rapaport , Elsa Reichmanis , Shu Yang
发明人： Gang Chen , Ronen Rapaport , Elsa Reichmanis , Shu Yang
IPC分类号： C03B19/12
CPC分类号： C03B19/12 , C03B2201/58 , C03C11/00
摘要： Techniques for producing a glass structure having interconnected macroscopic pores, employing steps of filling polymerizable glass precursors into pores in a polymeric structure having interconnected macroscopic pores; polymerizing the precursors; and decomposing the polymers to produce a glass oxide structure having interconnected macroscopic pores. Further techniques employ steps of exposing portions of a photosensitive medium including glass precursors to an optical interference pattern; polymerizing or photodeprotecting the exposed portions and removing unpolymerized or deprotected portions; and decomposing the polymerized or deprotected portions to produce a glass structure having interconnected macroscopic pores. Techniques for filling pores of such glass structure with a material having a high refractive index, and for then removing the glass structure. Structures can be produced having interconnected macroscopic pores and high refractive index contrasts, which can be used, for example, as photonic band gaps.
摘要翻译：用于生产具有互连的宏观孔的玻璃结构的技术，采用将可聚合的玻璃前体填充到具有互连的宏观孔的聚合物结构的孔中的步骤; 聚合前体; 并分解聚合物以产生具有互连的宏观孔的玻璃氧化物结构。其他技术采用将包括玻璃前体的光敏介质的部分暴露于光学干涉图案的步骤; 聚合或光致保护暴露部分并除去未聚合或去保护的部分; 并分解聚合或去保护的部分以产生具有互连的宏观孔的玻璃结构。用具有高折射率的材料填充这种玻璃结构的孔的技术，然后去除玻璃结构。可以制造具有互连的宏观孔和高折射率对比度的结构，其可以用作例如光子带隙。

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