专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20150133597A1 POLYMER RESIN COMPOSITION 审中-公开
标题翻译：聚合物树脂组合物
公开(公告)号：US20150133597A1
公开(公告)日：2015-05-14
申请号：US14601549
申请日：2015-01-21
申请人： EVONIK HANSE GmbH
发明人： Christian Eger , Stephan Sprenger
IPC分类号： C08L9/02 , C09D109/02 , C08K3/36
CPC分类号： C08L9/02 , C08K3/36 , C08L51/006 , C08L55/00 , C08L2666/02 , C09D109/02 , C09D151/006 , C09D155/00 , C09J151/006 , C09J155/00 , C08L2666/04
摘要： The invention provides a polymeric composition comprising: a) at least one resin selected from the group consisting of vinyl ester resins, unsaturated polyester resins, acrylates and methacrylates, b) at least one copolymer having resin-reactive groups and a glass transition temperature Tg of −20° C. or less, c) nanoparticles having an average particle size dmax as measured by means of small-angle neutron scattering (SANS) of 5 to 150 nm. The compilation according to the invention allows the production of composite materials, coatings, casting compositions, adhesives, and dental materials which have enhanced mechanical properties, particularly enhanced impact strength.
摘要翻译：本发明提供一种聚合物组合物，其包含：a）至少一种选自乙烯基酯树脂，不饱和聚酯树脂，丙烯酸酯和甲基丙烯酸酯的树脂，b）至少一种具有树脂反应性基团和玻璃化转变温度Tg -20℃或更低，c）通过5至150nm的小角度中子散射（SANS）测量的具有平均粒度dmax的纳米颗粒。根据本发明的编辑允许生产具有增强的机械性能，特别是增强的冲击强度的复合材料，涂层，铸造组合物，粘合剂和牙科材料。

2. 发明授权

US09376544B2 Silicon dioxide dispersion 有权
标题翻译：二氧化硅分散体
公开(公告)号：US09376544B2
公开(公告)日：2016-06-28
申请号：US14512017
申请日：2014-10-10
申请人： EVONIK HANSE GMBH
发明人： Johannes Adam , Christof Roscher , Christian Eger , Thorsten Adebahr , Robert Wieczorreck , Manfred Pyrlik
IPC分类号： C08K3/36 , C08K7/18
CPC分类号： C08K3/36 , C08K7/18 , Y10T436/10
摘要： The invention relates to a silicon dioxide dispersion that comprises a) an outer flowable phase containing 1) polymerizable monomers, oligomers and/or prepolymers that can be converted to polymers by non-radical reaction; and/or 2) polymers, and b) a disperse phase containing amorphous silicon dioxide. The inventive dispersion is characterized in that the average particle size dmax of the silicon dioxide as measured by small angle neutron scattering (SANS) is between 3 and 50 nm at a maximum half-width of the distribution curve of 1.5 dmax. Such a silicon dioxide dispersion can be easily manufactured even at higher concentrations of the disperse phase and can be used to produce polymer materials that have advantageous properties, especially advantageous mechanical properties.
摘要翻译：本发明涉及二氧化硅分散体，其包含：a）外部可流动相，其含有可聚合单体，低聚物和/或预聚物，其可通过非自由基反应转化为聚合物; 和/或2）聚合物，和b）含有无定形二氧化硅的分散相。本发明的分散体的特征在于，通过小角度中子散射（SANS）测量的二氧化硅的平均粒径dmax在1.5dmax的分布曲线的最大半值宽度在3和50nm之间。这样的二氧化硅分散体即使在分散相的较高浓度下也可以容易地制造，并且可以用于制备具有有利性质，特别有利的机械性能的聚合物材料。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式