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1. 发明授权

US11676837B2 Substrate holder 有权
公开(公告)号：US11676837B2
公开(公告)日：2023-06-13
申请号：US16401841
申请日：2019-05-02
申请人： EBARA CORPORATION
发明人： Matsutaro Miyamoto
IPC分类号： C25D17/06 , C25D17/00 , H01L21/673 , H01L21/687
CPC分类号： H01L21/673 , C25D17/001 , C25D17/06 , H01L21/68721 , H01L21/68785
摘要： One object of this application is to provide an advanced substrate holder including a clamper. A substrate holder holds a substrate by interposing the substrate between frames. The substrate holder includes a front frame, a rear frame, and one or a plurality of clampers. Each of the clampers includes a hook portion including a hook base and a hook main body, and a plate including at least one claw. At least one of the clampers includes the plate including a first claw for a lock and a second claw for a semi-lock.

2. 发明授权

US11668018B2 Contact structure, substrate holder, apparatus for plating, and method of feeding electric power to substrate 有权
公开(公告)号：US11668018B2
公开(公告)日：2023-06-06
申请号：US17356228
申请日：2021-06-23
申请人： EBARA CORPORATION
发明人： Matsutaro Miyamoto
IPC分类号： C25D17/00 , H01R13/52 , H01R4/34 , H01R4/36 , H01R4/44 , C25D17/06 , H01R13/22 , H01R12/71
CPC分类号： C25D17/005 , C25D17/004 , C25D17/06 , H01R4/34 , H01R4/36 , H01R4/44 , H01R13/22 , H01R13/521 , H01R12/714
摘要： There is provided a contact structure, comprising a substrate contact including a first contact portion that is located on a leading end side of the substrate contact and that comes into contact with a substrate and a second contact portion that is located nearer to a base end side of the substrate contact than the first contact portion; a seal member configured to cover a periphery of the substrate contact and to have a sealing surface that comes into contact with the substrate to seal the substrate contact; a first pressing portion configured to elastically apply a contact pressure on the substrate to the substrate contact; and a second pressing portion configured to come into contact with the seal member and to apply a contact pressure on the substrate to the seal member independently of the first pressing portion, wherein the first contact portion adheres to the seal member, and the second contact portion is fit in the seal member to be displaceable relative to the seal member.

3. 发明授权

US11542625B2 Substrate holder 有权
公开(公告)号：US11542625B2
公开(公告)日：2023-01-03
申请号：US17117706
申请日：2020-12-10
申请人： EBARA CORPORATION
发明人： Matsutaro Miyamoto
IPC分类号： C25D17/06 , C25D17/00
摘要： There is provided a substrate holder configured to hold a substrate, the substrate holder comprising: a first holding member; and a second holding member configured to hold the substrate between the first holding member and the second holding member, wherein the first holding member comprises: at least one substrate contact arranged to come into contact with the substrate; at least one seal member provided with a first seal portion configured to cover periphery of a leading end portion of one or a plurality of the substrate contacts; and at least one bus bar electrically connected with the one or plurality of substrate contacts and provided with one or a plurality of first through holes to receive the first seal portion, wherein the leading end portion of the one or plurality of substrate contacts is arranged to pass through the first through hole from a side opposite to the second holding member toward the second holding member and is fixed to the bus bar in a state that the periphery of the leading end portion of the one or plurality of substrate contacts is covered by the first seal portion.

4. 发明申请

US20220098749A1 CONTACT STRUCTURE, SUBSTRATE HOLDER, APPARATUS FOR PLATING, AND METHOD OF FEEDING ELECTRIC POWER TO SUBSTRATE 有权
公开(公告)号：US20220098749A1
公开(公告)日：2022-03-31
申请号：US17356228
申请日：2021-06-23
申请人： EBARA CORPORATION
发明人： Matsutaro Miyamoto
IPC分类号： C25D17/00 , H01R13/52 , H01R4/34 , H01R4/36 , H01R13/22 , H01R4/44 , C25D17/06
摘要： There is provided a contact structure, comprising a substrate contact including a first contact portion that is located on a leading end side of the substrate contact and that comes into contact with a substrate and a second contact portion that is located nearer to a base end side of the substrate contact than the first contact portion; a seal member configured to cover a periphery of the substrate contact and to have a sealing surface that comes into contact with the substrate to seal the substrate contact; a first pressing portion configured to elastically apply a contact pressure on the substrate to the substrate contact; and a second pressing portion configured to come into contact with the seal member and to apply a contact pressure on the substrate to the seal member independently of the first pressing portion, wherein the first contact portion adheres to the seal member, and the second contact portion is fit in the seal member to be displaceable relative to the seal member.

5. 发明授权

US11236435B2 Method for holding substrate on substrate holder 有权
公开(公告)号：US11236435B2
公开(公告)日：2022-02-01
申请号：US16596788
申请日：2019-10-09
申请人： EBARA CORPORATION
发明人： Matsutaro Miyamoto
IPC分类号： H01L21/687 , C25D17/06
摘要： A method for holding a substrate on the substrate holder is provided, and in this method, the substrate holder includes a front frame, a rear frame, a clamper for clamping the front frame and the rear frame; and seals configured to come into contact with the substrate and one of the front frame and the rear frame when the front frame and the rear frame are clamped. The method includes pressing at least one of the front frame and the rear frame toward another one to press the seals against the substrate, and compressing the seals; and clamping the front frame and the rear frame by the clamper in a state that the seals are compressed. During the seals being compressed, a place where a force is applied to at least one of the front frame and the rear frame is a position closer to the clamper than the seals.

6. 外观设计

USD910579S1 Electrical contact 有权
公开(公告)号：USD910579S1
公开(公告)日：2021-02-16
申请号：US29680563
申请日：2019-02-18
申请人： EBARA CORPORATION
设计人： Matsutaro Miyamoto

7. 发明授权

US11718925B2 Holder for holding substrate and system for plating 有权
公开(公告)号：US11718925B2
公开(公告)日：2023-08-08
申请号：US17689312
申请日：2022-03-08
申请人： EBARA CORPORATION
发明人： Shota Moriyama , Matsutaro Miyamoto
IPC分类号： C25D17/08 , C25D21/00
CPC分类号： C25D17/08 , C25D21/00
摘要： There is provided a substrate holder for holding a substrate including a first holding member having a first opening portion for exposing a first surface of the substrate, and a second holding member configured to hold the substrate together with the first holding member and having a second opening portion for exposing a second surface of the substrate, wherein the first holding member has at least one first external connection contact, and the second holding member has at least one second external connection contact that is independent of the first external connection contact.

8. 发明授权

US11697886B2 Substrate holder 有权
公开(公告)号：US11697886B2
公开(公告)日：2023-07-11
申请号：US17117804
申请日：2020-12-10
申请人： EBARA CORPORATION
发明人： Matsutaro Miyamoto
IPC分类号： C25D17/06 , C25D17/00
CPC分类号： C25D17/06 , C25D17/001 , C25D17/004 , C25D17/005
摘要： There is provided a substrate holder. The substrate holder comprises a contact assembly; a first plate configured to hold a substrate between the contact assembly and the first plate; at least one first pin fixed to the contact assembly, extended toward a first plate side on outside of the substrate, and provided with a locked portion; a locking member placed on a side opposite to the contact assembly relative to the first plate and configured to be displaceable between a locked state and an unlocked state with respect to the locked portion of the first pin; and at least one first biasing member placed between the locking member and the first plate along an outer circumferential part of the substrate such as to separate the locking member and the first plate from each other and compressed between the locking member and the first plate in the locked state to bias the first plate toward the contact assembly.

9. 外观设计

USD948438S1 Electrical contact 有权
公开(公告)号：USD948438S1
公开(公告)日：2022-04-12
申请号：US29679449
申请日：2019-02-06
申请人： EBARA CORPORATION
设计人： Matsutaro Miyamoto

10. 发明授权

US11232972B2 Substrate holder, plating device, and plating method of substrate 有权
公开(公告)号：US11232972B2
公开(公告)日：2022-01-25
申请号：US16680451
申请日：2019-11-11
申请人： EBARA CORPORATION
发明人： Matsutaro Miyamoto
IPC分类号： H01L21/687 , C25D17/06 , C25D17/00
摘要： A substrate holder capable of being used in both single-side plating and double-side plating is required. Disclosed is a substrate holder for holding a substrate to be plated. The substrate holder includes a first frame having a first opening for exposing one surface of the substrate and a second frame having a second opening for exposing the other surface of the substrate, and the substrate is sandwiched between the first frame and the second frame. The substrate holder further includes a dummy substrate which is detachably disposed between the first frame and the substrate and formed of a material that at least direct current does not substantially flow therein. At least a part of the dummy substrate is in contact with at least a part of the one surface of the substrate, and the dummy substrate protects the one surface of the substrate from a plating solution.

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