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    • 3. 发明申请
    • ELECTROSTATIC DISCHARGE PROTECTION STRUCTURE FOR AN ACTIVE ARRAY SUBSTRATE
    • 主动阵列基板的静电放电保护结构
    • US20130207113A1
    • 2013-08-15
    • US13684586
    • 2012-11-26
    • E Ink Holdings Inc.
    • Xue-Hung TSAIChia-Chun YEHHenry WANGTed-Hong SHINN
    • H01L29/786
    • H01L29/786H01L27/0296H01L27/1225
    • Disclosed herein is an electrostatic discharge protection structure which includes a signal line, a thin-film transistor and a shunt wire. The thin-film transistor includes a gate electrode, a metal-oxide semiconductor layer, a source electrode and a drain electrode. The first metal-oxide semiconductor layer is disposed above the first gate electrode. The metal-oxide semiconductor layer has a channel region characterized in having a width/length ratio of less than 1. The source electrode is equipotentially connected to the gate electrode. The shunt wire is electrically connected to the drain electrode. When the signal line receives a voltage surge of greater than a predetermined magnitude, the voltage surge is shunted through the thin-film transistor to the shunt wire.
    • 本文公开了一种静电放电保护结构,其包括信号线,薄膜晶体管和分流导线。 薄膜晶体管包括栅电极,金属氧化物半导体层,源电极和漏电极。 第一金属氧化物半导体层设置在第一栅电极的上方。 金属氧化物半导体层具有特征在于宽度/长度比小于1的沟道区。源电极等效连接到栅电极。 分路导线电连接到漏电极。 当信号线接收到大于预定幅度的电压浪涌时,电压浪涌通过薄膜晶体管分流到分流导线。
    • 6. 发明申请
    • METAL OXIDE THIN FILM TRANSISTOR
    • 金属氧化物薄膜晶体管
    • US20150357475A1
    • 2015-12-10
    • US14825187
    • 2015-08-13
    • E Ink Holdings Inc.
    • Chia-Chun YEHHenry WANGXue-Hung TSAIChih-Hsuan WANG
    • H01L29/786H01L29/417
    • H01L29/41733H01L29/7869
    • A metal oxide thin film transistor (TFT) includes a gate electrode, a gate insulating layer, a metal oxide active layer, a source electrode, and a drain electrode. The gate electrode is formed on a substrate. The gate insulating layer is formed on the substrate and covers the gate electrode. The metal oxide active layer is formed on the gate insulating layer. The drain electrode and the source electrode are formed on two opposite ends of the metal oxide active layer in a spaced-apart manner, in which at least one of the orthographic projection of the source electrode and the orthographic projection of the drain electrode on the substrate does not overlap the gate electrode.
    • 金属氧化物薄膜晶体管(TFT)包括栅电极,栅极绝缘层,金属氧化物有源层,源电极和漏电极。 栅电极形成在基板上。 栅极绝缘层形成在基板上并覆盖栅电极。 金属氧化物有源层形成在栅极绝缘层上。 漏极电极和源极电极以间隔方式形成在金属氧化物有源层的两个相对端上,其中源电极的正投影和漏电极的正投影至少一个在基板上 不与栅电极重叠。