会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 4. 发明授权
    • Positive-working photoresist compositions
    • 积极工作的光电组合物
    • US5104770A
    • 1992-04-14
    • US167068
    • 1988-03-11
    • Douglas A. UsiferMichael G. Kelly
    • Douglas A. UsiferMichael G. Kelly
    • G03F7/004G03F7/039
    • G03F7/0045
    • A photolithographic resist with sensitivity for actinic radiation in the short wavelength, ultraviolet region is produced from (1) an organic film-forming material, and (2) an oxime carboxylate ester which releases a carboxylic acid on exposure to deep ultraviolet radiation, thereby rendering the composition more soluble in a developer in the exposed regions than in the unexposed regions. A process for the formation of an image is also disclosed comprising (1) exposing the above composition to actinic radiation in a pre-determined pattern and (2) treating the composition with aqueous base developer to remove the exposed areas. The image-forming process may be used in the production of printing plates and microelectronic circuits.
    • 由(1)有机成膜材料和(2)在暴露于深紫外线辐射时释放羧酸的肟羧酸酯产生在短波长紫外线区域中对光化辐射具有敏感性的光刻抗蚀剂,从而使 所述组合物在暴露区域中比在未曝光区域中更易溶于显影剂。 还公开了一种用于形成图像的方法,其包括(1)将上述组合物以预定图案曝光于光化辐射,和(2)用碱性显影剂水溶液处理该组合物以除去暴露的区域。 图像形成工艺可以用于制造印版和微电子电路。