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1. 发明申请

US20110317141A1 LITHOGRAPHIC APPARATUS 有权
标题翻译： LITHOGRAPHIC设备
公开(公告)号：US20110317141A1
公开(公告)日：2011-12-29
申请号：US13115334
申请日：2011-05-25
申请人： Doede Frans KUIPER , Hans BUTLER
发明人： Doede Frans KUIPER , Hans BUTLER
IPC分类号： G03B27/54
CPC分类号： G03F7/70775 , G03F7/70716 , G03F7/7085
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the device being capable of imparting the beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a stage system to position the table relative to a reference structure; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; an optical measurement system including a sensor part and an optical part, the optical part being configured to optically interact with the patterned radiation beam and to transmit a result from the interaction as output to the sensor part, wherein the optical part is arranged on the table, and the sensor part is arranged on the stage system or the reference structure.
摘要翻译：光刻设备包括被配置为调节辐射束的照明系统; 构造为支撑图案形成装置的支撑件，所述装置能够在其横截面中赋予所述梁的图案以形成图案化的辐射束; 构造成保持基板的基板台; 一个用于将表相对于参考结构定位的阶段系统; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 包括传感器部分和光学部件的光学测量系统，所述光学部件被配置为与所述图案化的辐射束光学相互作用并且将所述相互作用的结果作为输出传输到所述传感器部分，其中所述光学部件布置在所述台面上并且传感器部分布置在平台系统或参考结构上。

2. 发明申请

US20100020296A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20100020296A1
公开(公告)日：2010-01-28
申请号：US12499595
申请日：2009-07-08
申请人： Jan-Jaap KUIT , Doede Frans KUIPER
发明人： Jan-Jaap KUIT , Doede Frans KUIPER
IPC分类号： G03B27/52
CPC分类号： G03F7/70875 , G03F7/70508 , G03F7/707 , G03F7/70775
摘要： A lithographic apparatus having an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and, an actuator arranged to exert a force on an object, wherein the apparatus includes a thermal expansion error compensator configured to avoid an error caused by thermal expansion of the object by any heat dissipated by the actuator or another heat source.
摘要翻译：一种光刻设备，具有被配置为调节辐射束的照明系统，构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束，衬底桌子被建造以保持基板; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 以及致动器，其被布置成对物体施加力，其中所述装置包括热膨胀误差补偿器，所述热膨胀误差补偿器被配置为通过由所述致动器或另一热源消散的任何热量来避免由所述物体的热膨胀引起的误差。

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