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    • 5. 发明申请
    • SCRATCH-RESISTANT AND EXPANDABLE CORROSION PREVENTION LAYER FOR LIGHT METAL SUBSTRATES
    • 轻金属基材的防切割和可扩展防腐层
    • US20120003483A1
    • 2012-01-05
    • US12740022
    • 2008-10-31
    • Dirk SalzKlaus-Dieter Vissing
    • Dirk SalzKlaus-Dieter Vissing
    • B32B15/08B32B15/20B05D3/00B05D3/06B05D5/00
    • B05D1/62B05D3/141B05D2202/20Y10T428/31663
    • The present invention relates to a method for coating the surface of a light metal substrate, including the following steps: A. preparing the light metal substrate and optionally cleaning the substrate surface to be coated, B. coating the substrate surface optionally cleaned in step A in a plasma polymerization reactor by means of plasma polymerization, wherein one or more organosilicon and also (a) no further or (b) further compounds are used in step B as the precursor(s) for the plasma and in step B the light metal substrate is arranged in the plasma polymerization reactor in such a way that it (i) is located between the zone in which the plasma is formed and the cathode or (ii) acts as a cathode, characterized in that the method is conducted in such a way that the coating produced by the method displays a carbon content, which can be determined by XPS measurement, of from 5 to 20 atom %, preferably 10 to 15 atom %, based on the total number of carbon, silicon and oxygen atoms contained in the coating, a yellow index, determined in accordance with ASTM D 1925, of ≦3, preferably ≦2.5 and a hardness, to be measured by means of nanoindentation, in the range of from 2.5 to 6 GPa, preferably 3.1 to 6 GPa.
    • 本发明涉及一种涂覆轻金属基材表面的方法,包括以下步骤:A.制备轻金属基材并任选地清洗待涂布的基材表面; B.涂​​覆步骤A中任选地清洁的基材表面 在等离子体聚合反应器中,其中一个或多个有机硅和(a)在步骤B中不再使用(b)另外的化合物作为等离子体的前体,在步骤B中,轻金属 衬底被布置在等离子体聚合反应器中,使得其(i)位于形成等离子体的区域和阴极之间,或(ii)用作阴极,其特征在于,该方法以这样的方式进行 通过该方法制备的涂层以基于碳,硅和氧原子总数的总数显示出5至20原子%,优选10至15原子%的可通过XPS测量确定的碳含量的方法 固定在涂层中,根据ASTM D 1925测定的黄色指数为n1E,3,优选为n1E,2.5,通过纳米压痕测量的硬度为2.5至6GPa,优选为3.1 至6 GPa。