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1. 外观设计

USD508853S1 Child-resistant closure 失效
公开(公告)号：USD508853S1
公开(公告)日：2005-08-30
申请号：US29211123
申请日：2004-08-11
申请人： David Ziegenhorn , Robert A. Simpson
设计人： David Ziegenhorn , Robert A. Simpson

2. 外观设计

USD508203S1 Child-resistant closure 失效
标题翻译：防儿童关闭
公开(公告)号：USD508203S1
公开(公告)日：2005-08-09
申请号：US29211138
申请日：2004-08-11
申请人： David Ziegenhorn , Robert A. Simpson
设计人： David Ziegenhorn , Robert A. Simpson

3. 发明授权

US4595836A Alignment correction technique 失效
标题翻译：校准校正技术
公开(公告)号：US4595836A
公开(公告)日：1986-06-17
申请号：US626368
申请日：1984-06-29
申请人： Robert A. Simpson
发明人： Robert A. Simpson
IPC分类号： G01N23/203 , G01R19/00 , H01J37/304 , G01N23/00
CPC分类号： H01J37/3045 , G01R19/0038
摘要： An E-beam alignment correction system employing an up-up integration technique. Input signals during each scan period are integrated and digitized then held in respective registers. The value in one register is converted to its negative value then digitally combined with the other value to generate an alignment correction value. This technique eliminates the requirement of positive and negative integrations needed with up-down integration techniques and droop of the sample and hold device as a function of time. A common analog path is used so that errors add out during digital combination of signal values.
摘要翻译：采用上行集成技术的电子束对准校正系统。每个扫描周期内的输入信号被积分并数字化，然后保存在相应的寄存器中。一个寄存器中的值转换为负值，然后与另一个值进行数字组合，以生成对齐校正值。这种技术消除了上下积分技术所需的正和负积分的要求以及取样和保持装置作为时间的函数的下降。使用通用的模拟路径，以便在信号值的数字组合期间增加错误。

4. 发明授权

US5428552A Data compaction techniques for generation of a complex image 失效
标题翻译：用于生成复杂图像的数据压缩技术
公开(公告)号：US5428552A
公开(公告)日：1995-06-27
申请号：US238348
申请日：1994-05-05
申请人： John R. Rudert, Jr. , Robert A. Simpson
发明人： John R. Rudert, Jr. , Robert A. Simpson
IPC分类号： H01L21/30 , G06F17/50 , G06T3/00 , G06T9/00 , H01L21/027
CPC分类号： G06T9/001
摘要： A data compaction technique permits electron beam lithography systems to operate more efficiently in the fabrication of complex computer chips. One or more building block patterns are selected for the design to be encoded. Each shape in the set of building block patterns is given a sequence number for use in a data word for the design. The set of shape descriptors for each block is stored in a reference memory. The data word referencing a block includes a number of bytes which specify the stored block pattern data and control bits corresponding to sequence numbers of the pattern shapes in a maximum shape configuration. Each shape is assigned a bit according to its sequence number.
摘要翻译：数据压缩技术允许电子束光刻系统在复杂的计算机芯片的制造中更有效地操作。为要编码的设计选择一个或多个构建块模式。给定一组构造块图案中的每个形状，用于设计数据字中使用的序列号。每个块的形状描述符集合存储在参考存储器中。引用块的数据字包括指定存储的块模式数据的字节数和与最大形状配置中的模式形状的序列号对应的控制位。每个形状根据其序号分配一位。

5. 发明授权

US4417203A System for contactless electrical property testing of multi-layer ceramics 失效
标题翻译：多层陶瓷非接触电性能试验系统
公开(公告)号：US4417203A
公开(公告)日：1983-11-22
申请号：US267119
申请日：1981-05-26
申请人： Hans C. Pfeiffer , Robert A. Simpson , Werner Stickel
发明人： Hans C. Pfeiffer , Robert A. Simpson , Werner Stickel
IPC分类号： H01L21/66 , G01Q30/02 , G01R31/02 , G01R31/302 , G01R31/305 , H05K3/46
CPC分类号： B82Y15/00 , G01R31/305
摘要： An electron beam system for non contact testing of three dimensional networks of conductors embedded in dielectric material, specifically detection of open and short circuit conditions. Top to bottom and top to top surface wiring is tested electrically without making physical electrical contact. The system comprises two flood beams and a focus probe beam wih one flood beam located at either side of the specimen. Proper choice of acceleration potentials, beam currents and dwell times of the beams allow alteration of the secondary electron emission from the specimen in such a way that electrical properties of the conductor networks can be measured directly. The difference in secondary electron emission resulting from different surface potentials is detected as a strong signal which allows clear discrimination between uninterrupted and interrupted as well as shorted pairs of conductors. This testing system can be applied to the high speed testing of advanced VLSI packaging substrates as well as to the greensheets, sublaminates, and laminates from which they are fabricated.
摘要翻译：用于非接触测试的电子束系统，用于嵌入介质材料的导体的三维网络，特别是开路和短路条件的检测。从顶部到底部以及顶部到顶部的表面布线都进行电气测试，而不会进行物理电气接触。该系统包括两个横梁和一个焦点探针光束，一个位于样品两侧的一个放射束。正确选择加速电位，光束电流和停留时间可以改变样品的二次电子发射，从而可以直接测量导体网络的电气特性。由不同表面电位产生的二次电子发射的差异被检测为强信号，其允许清晰地区分不间断的和中断的以及短路导体对。该测试系统可以应用于高级VLSI封装基板的高速测试以及制造它们的绿色薄片，亚层压板和层压板。

6. 发明授权

US4581537A Method for generating inspection patterns 失效
标题翻译：产生检验模式的方法
公开(公告)号：US4581537A
公开(公告)日：1986-04-08
申请号：US592986
申请日：1984-03-23
申请人： Wallace J. Guillaume , John F. Loughran , Jan Rogoyski , Robert A. Simpson , Edward V. Weber
发明人： Wallace J. Guillaume , John F. Loughran , Jan Rogoyski , Robert A. Simpson , Edward V. Weber
IPC分类号： H01L21/66 , G01B21/20 , G03F1/44 , G03F1/84 , H01J37/30 , H01L21/027 , H01J37/00
CPC分类号： G03F1/44 , G03F1/84 , H01J37/3005
摘要： A method of forming inspection patterns for inspecting a workpiece, e.g., for electron beam inspection of optical photomasks. The inspection patterns are formed from the workpiece patterns themselves by applying a first positive windage to the workpiece patterns, inverting the first positive windaged workpiece patterns and applying a second positive windage to the inverted first positive windaged workpiece patterns. The inspection patterns so produced will contain the requisite guard band and the requisite overlap of abutting patterns.
摘要翻译：形成用于检查工件的检查图案的方法，例如用于光学光掩模的电子束检查。通过对工件图案施加第一正向风挡，反转第一正卷绕工件图案并将第二正向风边施加到倒置的第一正卷绕工件图案上，从工件图案本身形成检查图案。所产生的检查图样将包含所需的保护带和邻接图案的必要重叠。

7. 发明授权

US4546260A Alignment technique 失效
标题翻译：对齐技术
公开(公告)号：US4546260A
公开(公告)日：1985-10-08
申请号：US509515
申请日：1983-06-30
申请人： Robert A. Simpson , Ralph R. Trotter , Edward V. Weber
发明人： Robert A. Simpson , Ralph R. Trotter , Edward V. Weber
IPC分类号： H01L21/027 , H01J37/304 , H01L21/68 , H01L23/544 , H01J37/00
CPC分类号： H01J37/3045 , H01L23/544 , H01L2223/54453 , H01L2924/0002
摘要： An alignment system for registration of a scanning beam in a mask inspection tool. Minimum scan widths (W) in the registration process are attained thereby increasing registration sensitivity. This technique allows initial placement of the E-Beam to be outside the capture range so that the scan on one side is completely off the metal (on glass) and the scan on the other side is completely on the metal. Correction signals are obtained by comparing the backscattered electron signals from the two scans with the magnitude of the signal being indicative of the amount of correction required and the sign being indicative of the direction of correction.
摘要翻译：一种用于在掩模检查工具中对准扫描光束的对准系统。达到配准过程中的最小扫描宽度（W），从而提高了配准灵敏度。该技术允许电子束的初始放置在捕获范围之外，使得一侧的扫描完全离开金属（在玻璃上），另一侧的扫描完全在金属上。校正信号是通过比较来自两次扫描的反向散射电子信号与信号的大小指示所需的校正量以及符号表示校正方向来获得的。

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