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    • 5. 发明授权
    • Method of magnetic field controlled shimming
    • 磁场调节方法
    • US06819108B2
    • 2004-11-16
    • US10410416
    • 2003-04-09
    • Jinhua HuangBu-Xin XuBijan DorriBruce Amm
    • Jinhua HuangBu-Xin XuBijan DorriBruce Amm
    • G01V300
    • G01R33/3873G01R33/3875
    • The present invention is directed to a method of shimming a magnet assembly of an MR imaging system such that a desired B0 field strength may be created with minimal inhomogeneities therethrough. With this method, sufficient shimming of the magnet assembly may be achieved without requiring mechanical variations to the magnet assembly after the magnet assembly has been assembled. The invention analyzes variations from the desired B0 field and inhomogeneities at a number of target points along the magnet assembly or B0 field. A comparison is then made at each point to determine a shimming or weighting factor such that the desired overall B0 field strength and targeted field homogeneity is achieved. Active and/or passive shim elements may then be incorporated into the magnet assembly at each target point to achieve the desired overall field strength and minimum overall field homogeneity.
    • 本发明涉及一种对MR成像系统的磁体组件进行匀场的方法,使得可以以最小的非均匀性通过其产生所需的B0场强。 利用这种方法,可以在磁体组件组装之后不需要对磁体组件的机械变化来实现磁体组件的足够的垫片。 本发明分析了沿着磁体组件或B0场的多个目标点处的期望的B0场和不均匀性的变化。 然后在每个点进行比较以确定匀场或加权因子,使得实现期望的总体B0场强和目标场均匀性。 然后可以在每个目标点处将主动和/或被动垫片元件并入到磁体组件中,以实现期望的总场强和最小的整体场均匀性。