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1. 发明申请

US20050285053A1 Method and apparatus for electron beam processing of substrates 失效
标题翻译：用于基板电子束处理的方法和装置
公开(公告)号：US20050285053A1
公开(公告)日：2005-12-29
申请号：US10875629
申请日：2004-06-23
申请人： David Kuo , Christopher Formato , Neil Deeman , Sundeep Chauhan , Lawrence Bryant
发明人： David Kuo , Christopher Formato , Neil Deeman , Sundeep Chauhan , Lawrence Bryant
IPC分类号： G11B7/26 , H01J37/304 , H01L21/00 , H01L21/68
CPC分类号： H01L21/67259 , G11B7/261 , H01J2237/2025 , H01J2237/304 , H01L21/67253 , H01L21/681
摘要： Embodiments of the invention generally provide an electron beam substrate processing system. In one embodiment, the present invention provides an electron beam substrate processing system where a spindle shaft used to rotate substrates during processing includes two encoder wheels. One encoder wheel is configured to provide a rotational speed data signal to a rotational speed control system. Another encoder wheel is configured to provide a pattern generator clock signal at a higher frequency than the rotational speed data signal to a pattern generator. In one embodiment of the present invention, at least one of the encoder wheels is positioned adjacent the substrate to minimize torsional and differential movements between the at least one encoder wheel and the substrate.
摘要翻译：本发明的实施例通常提供电子束基板处理系统。在一个实施例中，本发明提供一种电子束基板处理系统，其中用于在加工过程中旋转基板的主轴用于包括两个编码轮。一个编码轮构造成向转速控制系统提供转速数据信号。另一个编码器轮被配置为向图案发生器提供比转速数据信号更高的频率的模式发生器时钟信号。在本发明的一个实施例中，编码器轮中的至少一个定位成与基板相邻，以最小化编码轮和基板之间的扭转和差速运动。

2. 发明授权

US06979831B2 Method and apparatus for a formatter following electron beam substrate processing system 失效
标题翻译：格式化板跟随电子束基板处理系统的方法和装置
公开(公告)号：US06979831B2
公开(公告)日：2005-12-27
申请号：US10783584
申请日：2004-02-19
申请人： Sundeep Chauhan , Lawrence Bryant , Neil Deeman , Christopher Formato , David Kuo
发明人： Sundeep Chauhan , Lawrence Bryant , Neil Deeman , Christopher Formato , David Kuo
IPC分类号： G11B5/596 , H01J37/00 , H01J37/304
CPC分类号： H01J37/302 , H01J37/3053
摘要： Embodiments of the invention generally provide an electron beam substrate processing system. In one embodiment, the present invention provides an electron beam substrate processing system where a spindle shaft used to rotate substrates during processing includes at least one optical encoder wheel assembly. The optical encoder wheel assembly is configured to provide rotational speed data signal to a rotational speed control system and a pattern generation clock circuit configured to a provide a corrected pattern generator clock signal to a pattern generator circuit. The pattern generation circuit is used to control modulation of an electron beam used for substrate processing. In one aspect of the present invention, repeatable deviations of the rotational speed are measured and processed during substrate processing to correct for such repeatable deviations to increase substrate pattern writing accuracy.
摘要翻译：本发明的实施例通常提供电子束基板处理系统。在一个实施例中，本发明提供一种电子束基板处理系统，其中用于在加工过程中旋转基板的主轴用于至少一个光学编码器轮组件。光学编码器轮组件被配置为向旋转速度控制系统和图案生成时钟电路提供转速数据信号，其被配置为向模式发生器电路提供校正的图案生成器时钟信号。图案生成电路用于控制用于基板处理的电子束的调制。在本发明的一个方面，在衬底处理期间测量和处理转速的可重复偏差以校正这种可重复偏差以增加衬底图案写入精度。

3. 发明申请

US20060262693A1 Apparatus and method for writing multiple radial locations during a single rotation of a disk recording medium 审中-公开
标题翻译：在盘记录介质的单次旋转期间写入多个径向位置的装置和方法
公开(公告)号：US20060262693A1
公开(公告)日：2006-11-23
申请号：US11132198
申请日：2005-05-19
申请人： Neil Deeman , David Kuo , Christopher Formato , Sundeep Chauhan , Lawrence Bryant
发明人： Neil Deeman , David Kuo , Christopher Formato , Sundeep Chauhan , Lawrence Bryant
IPC分类号： G11B7/0045
CPC分类号： G11B5/82 , B82Y10/00 , G11B5/743 , G11B9/10
摘要： An apparatus for and method of writing multiple radial locations during a single rotation by deflection and modulation of a recording beam, employs an electron beam with a width that is narrower than a radial width of the exposure pattern. Instead of employing multiple exposure passes, with each offset from the other by a certain radial distance, the apparatus performs the write of the pattern in a single pass. During this single pass, controlled by a single rotation of the turntable on which the disk recording medium is located, the electron beam is deflected in a radial direction by a required amount and modulated in synchronization with the radial deflection. This synchronization of the beam modulation with the beam deflection allows a plurality of tracks to be written or exposed in a single pass.
摘要翻译：通过记录光束的偏转和调制在单个旋转期间写入多个径向位置的装置和方法采用宽度比曝光图案的径向宽度窄的电子束。代替采用多个曝光通道，每个偏移距离彼此偏移一定的径向距离，设备以单次执行对图案的写入。在该单次通过期间，通过盘记录介质所在的转盘的单次旋转控制，电子束在径向上偏转所需量并与径向偏转同步地调制。光束调制与光束偏转的这种同步允许在单次通过中写入或曝光多个轨迹。

4. 发明申请

US20050185562A1 Method and apparatus for constant linear velocity electron beam substrate processing 有权
标题翻译：恒定线速度电子束衬底加工的方法和装置
公开(公告)号：US20050185562A1
公开(公告)日：2005-08-25
申请号：US10783263
申请日：2004-02-19
申请人： Sundeep Chauhan , Lawrence Bryant , Neil Deeman , Christopher Formato , David Kuo
发明人： Sundeep Chauhan , Lawrence Bryant , Neil Deeman , Christopher Formato , David Kuo
IPC分类号： G11B9/10 , H01J37/302
CPC分类号： G11B7/26 , G11B5/8404 , G11B9/10 , H01J37/3023 , H01J2237/31735
摘要： Embodiments of the invention generally provide an electron beam substrate processing system. In one embodiment, the present invention provides an electron beam substrate processing system where a spindle shaft used to rotate substrates during processing includes at least one optical encoder wheel assembly. The optical encoder wheel assembly is configured to provide rotational speed data signal to a rotational speed control system and a pattern generation clock circuit configured to a provide an angular pattern generator clock signal and to a pattern generator circuit. The pattern generation circuit is configured to control modulation of an electron beam used for substrate processing. In one aspect of the present invention, while the spindle shaft is rotated at a constant linear velocity, the pattern generation circuit controls the modulation of an electron beam such that written mark lengths are sized to be about constant in angular dimension.
摘要翻译：本发明的实施例通常提供电子束基板处理系统。在一个实施例中，本发明提供一种电子束基板处理系统，其中用于在加工过程中旋转基板的主轴用于至少一个光学编码器轮组件。光学编码器轮组件被配置为向旋转速度控制系统和图案生成时钟电路提供转速数据信号，其被配置为提供角度图形发生器时钟信号和模式发生器电路。图案生成电路被配置为控制用于基板处理的电子束的调制。在本发明的一个方面，当主轴以恒定的线速度旋转时，图案产生电路控制电子束的调制，使得书写标记长度的尺寸在角度尺寸上约为恒定。

5. 发明授权

US07382711B2 Method and apparatus for constant linear velocity electron beam substrate processing 有权
标题翻译：恒定线速度电子束衬底加工的方法和装置
公开(公告)号：US07382711B2
公开(公告)日：2008-06-03
申请号：US10783263
申请日：2004-02-19
申请人： Sundeep Chauhan , Lawrence Bryant , Neil Deeman , Christopher Formato , David Kuo
发明人： Sundeep Chauhan , Lawrence Bryant , Neil Deeman , Christopher Formato , David Kuo
IPC分类号： G11B9/10
CPC分类号： G11B7/26 , G11B5/8404 , G11B9/10 , H01J37/3023 , H01J2237/31735
摘要： Embodiments of the invention generally provide an electron beam substrate processing system. In one embodiment, the present invention provides an electron beam substrate processing system where a spindle shaft used to rotate substrates during processing includes at least one optical encoder wheel assembly. The optical encoder wheel assembly is configured to provide rotational speed data signal to a rotational speed control system and a pattern generation clock circuit configured to a provide an angular pattern generator clock signal and to a pattern generator circuit. The pattern generation circuit is configured to control modulation of an electron beam used for substrate processing. In one aspect of the present invention, while the spindle shaft is rotated at a constant linear velocity, the pattern generation circuit controls the modulation of an electron beam such that written mark lengths are sized to be about constant in angular dimension.
摘要翻译：本发明的实施例通常提供电子束基板处理系统。在一个实施例中，本发明提供一种电子束基板处理系统，其中用于在加工过程中旋转基板的主轴用于至少一个光学编码器轮组件。光学编码器轮组件被配置为向旋转速度控制系统和图案生成时钟电路提供转速数据信号，其被配置为提供角度图形发生器时钟信号和模式发生器电路。图案生成电路被配置为控制用于基板处理的电子束的调制。在本发明的一个方面，当主轴以恒定的线速度旋转时，图案产生电路控制电子束的调制，使得书写标记长度的尺寸在角度尺寸上约为恒定。

6. 发明申请

US20050184256A1 Method and apparatus for a formatter following electron beam substrate processing system 失效
公开(公告)号：US20050184256A1
公开(公告)日：2005-08-25
申请号：US10783584
申请日：2004-02-19
申请人： Sundeep Chauhan , Lawrence Bryant , Neil Deeman , Christopher Formato , David Kuo
发明人： Sundeep Chauhan , Lawrence Bryant , Neil Deeman , Christopher Formato , David Kuo
IPC分类号： G11B5/596 , H01J37/00 , H01J37/304
CPC分类号： H01J37/302 , H01J37/3053
摘要： Embodiments of the invention generally provide an electron beam substrate processing system. In one embodiment, the present invention provides an electron beam substrate processing system where a spindle shaft used to rotate substrates during processing includes at least one optical encoder wheel assembly. The optical encoder wheel assembly is configured to provide rotational speed data signal to a rotational speed control system and a pattern generation clock circuit configured to a provide a corrected pattern generator clock signal to a pattern generator circuit. The pattern generation circuit is used to control modulation of an electron beam used for substrate processing. In one aspect of the present invention, repeatable deviations of the rotational speed are measured and processed during substrate processing to correct for such repeatable deviations to increase substrate pattern writing accuracy.

7. 发明申请

US20060039264A1 Rotating recorder with dual encoder arrangement having eccentricity compensation 失效
标题翻译：具有双重编码器布置的旋转记录器具有偏心补偿
公开(公告)号：US20060039264A1
公开(公告)日：2006-02-23
申请号：US10921276
申请日：2004-08-19
申请人： Lawrence Bryant , Sundeep Chauhan , David Kuo
发明人： Lawrence Bryant , Sundeep Chauhan , David Kuo
IPC分类号： G11B7/00 , G11B9/00
CPC分类号： G11B5/59633 , G11B5/82 , G11B5/865 , G11B9/10 , G11B21/106
摘要： A rotating recording device, such as an electron beam recorder, is provided with a dual encoder arrangement. A first encoder is employed as a spindle motor controller and located at a first end of a spindle. A second encoder is mounted at a turntable adjacent to a recording surface and used as a position, velocity or clock source for recording the pattern on the substrate. Eccentricity of the mounting of the second encoder is measured against the more accurately mounted spindle control encoder and compensated by a digital clock generating system using a digital phase locked loop.
摘要翻译：诸如电子束记录器的旋转记录装置设有双编码器装置。第一编码器用作主轴电机控制器并且位于主轴的第一端。第二编码器安装在与记录表面相邻的转台上，并用作用于将图案记录在基板上的位置，速度或时钟源。第二编码器的安装偏心度是针对更准确地安装的主轴控制编码器进行测量的，并由使用数字锁相环的数字时钟发生系统补偿。

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