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    • 2. 发明授权
    • Alkylphenylbisacylphosphine oxides and photoinitiator mixtures
    • 烷基苯基双酰基氧化膦和光引发剂混合物
    • US06284813B1
    • 2001-09-04
    • US09009827
    • 1998-01-20
    • David George LeppardManfred KöhlerAndreas Valet
    • David George LeppardManfred KöhlerAndreas Valet
    • C08F246
    • G03F7/029B33Y70/00C07F9/5337C08F2/50C09D4/00Y10S430/117
    • Compounds of the formula I in which R1 is C1-C4alkyl, R2 is hydrogen, C1-C4alkyl or C1-C4alkoxy and R3, R3, R4, R5, R6, and R7 independently of one another are hydrogen, halogen, C1-C20alkyl, cyclopentyl, cyclohexyl, C2-C12alkenyl, C2-C18 alkyl which is interrupted by one or more oxygen atoms, or are phenyl-substituted C1-C4alkyl, or are phenyl which is unsubstituted or is mono- or disubstituted by C1-C4alkyl and/or C1-C4alkoxy, with the provisos that at least one of the radicals R3, R4, R5, R6 and R7 is other than hydrogen and that, if R1 and R2 are methyl, R3 and R6 are not methyl, and mixtures of such compounds with &agr;-hydroxy ketones, benzophenones and &agr;-amino ketones, are suitable as photoinitiators.
    • R 1为C 1 -C 4烷基,R 2为氢,C 1 -C 4烷基或C 1 -C 4烷氧基且R 3,R 3,R 4,R 5,R 6和R 7彼此独立地为氢,卤素,C 1 -C 20烷基,环戊基 环己基,C 2 -C 12烯基,被一个或多个氧原子间隔的C 2 -C 18烷基,或是苯基取代的C 1 -C 4烷基,或者是未被取代或被C 1 -C 4烷基和/或C 1 -C 1烷基单或二取代的苯基 -C4烷氧基,条件是R 3,R 4,R 5,R 6和R 7中的至少一个不是氢,并且如果R 1和R 2是甲基,则R 3和R 6不是甲基,并且这些化合物与α的混合物 - 羟基酮,二苯甲酮和α-氨基酮适合作为光引发剂。
    • 3. 发明授权
    • Photoinitiator formulations
    • 光引发剂配方
    • US06803392B1
    • 2004-10-12
    • US10088222
    • 2002-03-18
    • Manfred KöhlerBeat Michael AebliMartin HolerErnst EcksteinJean-Pierre Wolf
    • Manfred KöhlerBeat Michael AebliMartin HolerErnst EcksteinJean-Pierre Wolf
    • C08F246
    • G03F7/029C08F2/50
    • Aqueous storage-stable, non-sedimenting photoinitiator suspensions comprising (a) a mono- or bis-acylphosphine oxide of formula (I), wherein R1 is C1-C20alkyl; C2-C20alkyl interrupted by one or more O atoms; C1-C12alkoxy; phenyl-C1-C4alkyl; or phenyl that is unsubstituted or substituted by C1C20alkyl, C1-C12alkoxy, halogen, cyclopentyl, cyclohexyl, C2-C12alkenyl, C2-C18alkyl interrupted by one or more O atoms, and/or by phenyl-C1-C4alkyl; or R1 is biphenylyl; R2 is an aromatic radical or has one of the meanings give for R1; R3 and R4 are each independently of the other C1-C12alkyl, C1-C12alkoxy or halogen; and R5 is hydrogen, C1-C12alkyl, C1-C12alkoxy or halogen; (b) a dispersant; and (c) water are suitable especially in the photopolymerisation of aqueous formulations comprising ethylenically unsaturated monomers.
    • 含水储存稳定的非沉降光引发剂悬浮液,其包含(a)式(I)的单或双酰基氧化膦,其中R 1为C 1 -C 20烷基; 被一个或多个O原子间断的C 2 -C 20烷基; C1-C12烷氧基; 苯基-C 1 -C 4烷基; 或未被取代或被C 1 -C 20烷基,C 1 -C 12烷氧基,卤素,环戊基,环己基,C 2 -C 12烯基,被一个或多个O原子间隔的C 2 -C 18烷基和/或被苯基-C 1 -C 4烷基取代的苯基; 或R 1为联苯基; R2是芳族基团或具有R1的含义之一; R 3和R 4各自独立地为C 1 -C 12烷基,C 1 -C 12烷氧基或卤素; 和R 5是氢,C 1 -C 12烷基,C 1 -C 12烷氧基或卤素; (b)分散剂; 和(c)水尤其适用于包含烯属不饱和单体的水性制剂的光聚合。
    • 5. 发明授权
    • Method for producing adhesive surface coatings
    • 生产粘合剂表面涂层的方法
    • US06548121B1
    • 2003-04-15
    • US09830485
    • 2002-01-09
    • Michael BauerManfred KöhlerMartin KunzLjubomir Misev
    • Michael BauerManfred KöhlerMartin KunzLjubomir Misev
    • B05D138
    • B05D3/062B05D3/10B05D3/142C23C14/024
    • The invention relates to a process for the production of strongly adherent coatings on an inorganic or organic substrate that comprises, in a first step a) subjecting the inorganic or organic substrate to the action of a low-temperature plasma discharge, a corona discharge, high-energy UV radiation or electron radiation, then discontinuing the radiation or discharge; in a further step b) under vacuum or at normal pressure, applying one or more photoinitiators containing at least one ethylenically unsaturated group to the inorganic or organic substrate, and allowing reaction with the free-radical sites formed there; and c1) coating the substrate so precoated with photoinitiator with a composition comprising at least one ethylenically unsaturated monomer or oligomer, and curing the coating by means of UV/VIS radiation or c2) depositing a metal, semi-metal oxide or metal oxide from the gaseous phase, in the presence of UV light, on the substrate so precoated with photoinitiator. The invention relates also to the use of photoinitiators having at least one ethylenically unsaturated group in the production of such layers and to the strongly adherent coatings themselves.
    • 本发明涉及一种用于在无机或有机基底上生产强粘附涂层的方法,该方法包括在第一步骤中,使无机或有机基底经受低温等离子体放电,电晕放电, 紫外辐射或电子辐射,然后停止辐射或放电; 在进一步的步骤b)中,在真空或常压下,将一种或多种含有至少一个烯键式不饱和基团的光引发剂施加到无机或有机底物上,并允许与在其上形成的自由基部位反应; 和c1)使用包含至少一种烯键式不饱和单体或低聚物的组合物用光引发剂预涂底物,并通过UV / VIS辐射固化该涂层; c)从气相沉积金属,半金属氧化物或金属氧化物 在UV光的存在下,在光引发剂上预涂的基材上。 本发明还涉及在制备这些层中使用具有至少一个烯属不饱和基团的光引发剂和本身具有强粘附性的涂层。
    • 6. 发明授权
    • Mono-and Bis-acylphosphine oxide photoinitiator combinations
    • 单 - 和二 - 酰基氧化膦光引发剂组合
    • US06486228B2
    • 2002-11-26
    • US09820105
    • 2001-03-28
    • Manfred KöhlerJean-Pierre WolfAndré LitzlerGuido TolottiNils Hoeck
    • Manfred KöhlerJean-Pierre WolfAndré LitzlerGuido TolottiNils Hoeck
    • C08K322
    • C09D175/16B33Y70/00C07F9/3264C08F2/48C08F2/50C08F2222/1086C09D4/00
    • Photoinitiator combinations comprising at least one compound of formula (I)  wherein R1 is C1-C4alkyl, C1-C4alkoxy or halogen; R2 is hydrogen, C1-C4alkyl, C1-C4alkoxy or halogen; R3 is, for example, C1-C20alkyl, cyclopentyl, cyclohexyl, phenyl-C1-C4alkyl, naphthyl or biphenylyl or an O-, S- or N-containing 5- or 6-membered heterocyclic ring; and at least one compound of formula (II)  wherein R1 and R2 are as defined above; R9 is, for example, C1-C20alkyl, cyclopentyl, cyclohexyl, phenyl-C1-C4alkyl, naphthyl, biphenylyl or an O-, S- or N-containing 5- or 6-membered heterocyclic ring; and R10 is, for example, C1-C20alkyl, C2-C20alkyl interrupted by one or more O atoms, cyclopentyl, cyclohexyl, phenyl-C1-C4alkyl, naphthyl, biphenylyl or an O-, S- or N-containing 5- or 6-membered heterocyclic ring; are reactive photohardeners causing only a low degree of yellowing in the cured substrates.
    • 包含至少一种式(I)化合物的光引发剂组合,其中R 1是C 1 -C 4烷基,C 1 -C 4烷氧基或卤素; R2是氢,C1-C4烷基,C1-C4烷氧基或卤素; R 3是例如C 1 -C 20烷基,环戊基,环己基,苯基-C 1 -C 4烷基,萘基或联苯基或含O-,S-或N的5-或6-元杂环; 和至少一种式(II)的化合物,其中R 1和R 2如上所定义; R 9是例如C 1 -C 20烷基,环戊基,环己基,苯基-C 1 -C 4烷基,萘基,联苯基或含O-,S-或N的5-或6-元杂环; R 10为例如C 1 -C 20烷基,被一个或多个O原子间隔的C 2 -C 20烷基,环戊基,环己基,苯基-C 1 -C 4烷基,萘基,联苯基或含O-,S-或N的5-或6 杂环; 是在固化的基底中仅引起低度黄化的活性光固化剂。
    • 7. 发明授权
    • Photoinitiator combinations
    • 光引发剂组合
    • US06251963B1
    • 2001-06-26
    • US09453356
    • 1999-12-01
    • Manfred KöhlerJean-Pierre WolfAndré LitzlerGuido TolottiNils Hoeck
    • Manfred KöhlerJean-Pierre WolfAndré LitzlerGuido TolottiNils Hoeck
    • C08F246
    • C09D175/16B33Y70/00C07F9/3264C08F2/48C08F2/50C08F2222/1086C09D4/00
    • Photoinitiator combinations comprising at least one compound of formula (I) R1 is C1-C4alkyl, C1-C4alkoxy or halogen; R2 is hydrogen, C1-C4alkyl, C1-C4alkoxy or halogen; R3 is, for example, C1-C20alkyl, cyclopentyl, cyclohexyl, phenyl-C1-C4alkyl, naphthyl or biphenylyl or an O—, S— or N-containing 5- or 6-membered heterocyclic ring; and at least one compound of formula (II) R1 and R2 are as defined above; R9 is, for example, C1-C20alkyl, cyclopentyl, cyclohexyl, phenyl-C1-C4alkyl, naphthyl, biphenylyl or an O—, S— or N-containing 5- or 6-membered heterocyclic ring; and R10 is, for example, C1-C20alkyl, C2-C20alkyl interrupted by one or more O atoms, cyclopentyl, cyclohexyl, phenyl-C1-C4alkyl, naphthyl, biphenylyl or an O—, S— or N-containing 5- or 6-membered heterocyclic ring; are reactive photo hardeners causing only a low degree of yellowing in the cured substrates.
    • 包含至少一种式(I)R 1的化合物的光引发剂组合是C 1 -C 4烷基,C 1 -C 4烷氧基或卤素; R 2是氢,C 1 -C 4烷基,C 1 -C 4烷氧基或卤素; R 3是例如C 1 -C 20烷基,环戊基,环己基,苯基-C 1 -C 4烷基,萘基或联苯基或O-,S-或N- 或6元杂环; 并且至少一种式(II)化合物R 1和R 2如上所定义; R 9是例如C 1 -C 20烷基,环戊基,环己基,苯基-C 1 -C 4烷基,萘基,联苯基或含O-,S-或N的5-或6-元杂环; R 10为例如C 1 -C 20烷基,被一个或多个O原子间隔的C 2 -C 20烷基,环戊基,环己基,苯基-C 1 -C 4烷基,萘基,联苯基或含O-,S-或N的5-或6 杂环; 是在固化的基底中仅引起低度黄化的活性光固化剂。