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    • 10. 发明申请
    • FRONT CONTACT HETEROJUNCTION PROCESS
    • 前接触异常过程
    • US20160072000A1
    • 2016-03-10
    • US14578216
    • 2014-12-19
    • David D. Smith
    • David D. Smith
    • H01L31/18H01L31/0236H01L31/068H01L31/0368H01L31/0224
    • H01L31/1804H01L31/02363H01L31/0745H01L31/0747H01L31/075H01L31/1872Y02E10/547Y02E10/548Y02P70/521
    • Methods of fabricating solar cells using improved front contact heterojunction processes, and the resulting solar cells, are described. In an example, a solar cell includes a substrate having first and second light-receiving surfaces. A tunnel dielectric layer is disposed on the first and second light-receiving surfaces. An N-type polycrystalline silicon layer is disposed on the portion of the tunnel dielectric layer disposed on the first light-receiving surface. A P-type polycrystalline silicon layer is disposed on the portion of the tunnel dielectric layer disposed on the second light-receiving surface. A transparent conductive oxide layer is disposed on the N-type polycrystalline silicon layer and on the P-type polycrystalline silicon layer. A first set of conductive contacts is disposed on the portion of the transparent conductive oxide layer disposed on the N-type polycrystalline silicon layer. A second set of conductive contacts is disposed on the portion of the transparent conductive oxide layer disposed on the P-type polycrystalline silicon layer.
    • 描述了使用改进的前接触异质结工艺制造太阳能电池的方法,以及所得到的太阳能电池。 在一个示例中,太阳能电池包括具有第一和第二光接收表面的基板。 隧道介电层设置在第一和第二光接收表面上。 N型多晶硅层设置在设置在第一受光面上的隧道介电层的部分上。 P型多晶硅层设置在设置在第二受光面上的隧道介电层的部分上。 在N型多晶硅层和P型多晶硅层上设置透明导电氧化物层。 第一组导电触点设置在设置在N型多晶硅层上的透明导电氧化物层的部分上。 第二组导电触点设置在设置在P型多晶硅层上的透明导电氧化物层的部分上。