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1. 发明授权

US06662349B2 Method of repeater insertion for hierarchical integrated circuit design 有权
标题翻译：用于分层集成电路设计的中继器插入方法
公开(公告)号：US06662349B2
公开(公告)日：2003-12-09
申请号：US10086232
申请日：2002-02-27
申请人： David A. Morgan , Richard D. Blinne , James A. Jensen , Christopher J. Tremel
发明人： David A. Morgan , Richard D. Blinne , James A. Jensen , Christopher J. Tremel
IPC分类号： G06F1750
CPC分类号： G06F17/5068
摘要： A method of repeater insertion in a hierarchical integrated circuit includes defining an initial floorplan for a parent macro at a parent level in a hierarchical circuit design; passing outline and pin locations from the parent macro to a child macro sharing a common area with the parent macro; defining or modifying a floor plan for the child macro at a child level in the hierarchical circuit design in response to the outline and pin locations passed from the parent macro; passing physical restrictions in the child macro from the child macro to the parent macro; determining a location for a cell at the parent level of the hierarchical circuit design in an area of the parent macro shared by the child macro in response to the physical restrictions passed from the child macro; passing physical constraints in the parent macro associated with placement and routing of the cell from the parent level to the child macro; and generating an abstract representation for the child macro at the child level that includes an area cut out of the child macro corresponding to the location of the cell.
摘要翻译：在分级集成电路中插入中继器的方法包括：在分级电路设计中，在父级别定义母宏的初始平面图; 将轮廓和引脚位置从父宏传递到与父宏共享公共区域的子宏; 响应于从父宏传送的轮廓和针位置，在分级电路设计中定义或修改子级别的子宏的平面图; 将子宏中的子宏中的物理限制从子宏传递到父宏; 响应于从所述子宏中传递的物理限制，在所述子宏宏共享的所述母宏的区域中确定所述分级电路设计的所述母级的单元的位置; 在与从父级别到子宏的单元的放置和路由相关联的父宏中传递物理约束; 以及生成子级别的子宏的抽象表示，该子宏包括从对应于该单元的位置的子宏中切出的区域。

2. 发明授权

US07168353B2 Material handling systems 有权
标题翻译：物料搬运系统
公开(公告)号：US07168353B2
公开(公告)日：2007-01-30
申请号：US11140479
申请日：2005-05-26
申请人： Spencer B. Dick , Stuart Aldrich , David A. Morgan
发明人： Spencer B. Dick , Stuart Aldrich , David A. Morgan
IPC分类号： G06F19/00 , B26D7/06 , B27B31/00
CPC分类号： B26D7/0683 , B26D7/06 , Y10T83/0448 , Y10T83/182 , Y10T83/2098
摘要： A material handling system for a table saw that controls the orientation and speed of material as it moves through the system. The material handling system includes an idler device having upper and lower support surfaces configured to maintain a piece of processed material in the processing path until it substantially passes the upper support surface. The material handling system includes a ramp configured to deliver a piece of processed material from the processing path to a return conveyor.
摘要翻译：用于台锯的材料处理系统，用于在材料移动通过系统时控制材料的取向和速度。材料处理系统包括具有上和下支撑表面的惰轮装置，其构造成将处理材料片保持在处理路径中，直到其基本上通过上支撑表面。材料处理系统包括斜坡，其构造成将一批经处理的材料从处理路径输送到返回输送机。

3. 发明授权

US6063528A Thermosensitive composition 失效
标题翻译：热敏组合物
公开(公告)号：US6063528A
公开(公告)日：2000-05-16
申请号：US859681
申请日：1997-05-20
申请人： David A. Morgan
发明人： David A. Morgan
IPC分类号： B41C1/10 , B41M5/30 , B41M5/36 , G03C3/00
CPC分类号： B41C1/1008 , B41C2210/04 , B41C2210/08 , B41C2210/24 , B41M5/30 , B41M5/368
摘要： A thermosensitive composition consisting of a mixture of polyacrylic acid, a salt of a long chain fatty acid such as silver behenate, an infra-red absorbent and modifiers such as additional polymers and fillers. Both the water solubility and affinity to water and oil are changed when composition is heated.
摘要翻译：由聚丙烯酸，长链脂肪酸的盐如山嵛酸银的混合物，红外吸收剂和改性剂如其它聚合物和填料组成的热敏组合物。当组合物加热时，水溶性和对水和油的亲和力都会改变。

4. 发明授权

US5958647A Thermosensitive etch resist for forming a mask 失效
标题翻译：用于形成掩模的热敏蚀刻抗蚀剂
公开(公告)号：US5958647A
公开(公告)日：1999-09-28
申请号：US858977
申请日：1997-05-20
申请人： David A. Morgan
发明人： David A. Morgan
IPC分类号： G03C1/498 , H05K3/06 , G03C1/73
CPC分类号： H05K3/064 , G03C1/4989 , H05K2201/0112 , H05K2203/107
摘要： A thermosensitive resist used in the manufacturing of printed circuit boards comprising a mixture of polyacrylic acid, a salt of a long chain fatty acid such as silver behenate, an infra-red absorber and modifiers such as additional polymers. In the unheated form the resist can be easily washed away with water-based mild solutions or pure water. When selectively heated by an IR laser a non-soluble, etch resistant composition is formed protecting the copper clad printed circuit board from the etchants used in the process.
摘要翻译：用于制造印刷电路板的热敏抗蚀剂，其包含聚丙烯酸，长链脂肪酸的盐如山嵛酸银的混合物，红外吸收剂和诸如另外的聚合物的改性剂的混合物。在未加热的形式中，抗蚀剂可以容易地用水基温和溶液或纯水冲洗掉。当通过IR激光器选择性加热时，形成不可蚀刻的耐蚀刻组合物，以保护铜包覆印刷电路板免受在该工艺中使用的蚀刻剂的影响。

5. 发明授权

US07966714B2 Multi-step systems for processing workpieces 有权
标题翻译：用于加工工件的多步系统
公开(公告)号：US07966714B2
公开(公告)日：2011-06-28
申请号：US11702905
申请日：2007-02-05
申请人： Spencer B. Dick , Stuart Aldrich , David A. Morgan , David Lee
发明人： Spencer B. Dick , Stuart Aldrich , David A. Morgan , David Lee
IPC分类号： B23P23/00 , B23Q41/00
CPC分类号： B27M1/08 , F16B2200/30 , Y10T29/49616 , Y10T29/49963 , Y10T29/49996 , Y10T29/5107 , Y10T29/5124 , Y10T29/5136 , Y10T29/5138 , Y10T29/5143 , Y10T29/5145 , Y10T83/162
摘要： Systems, including method and apparatus, for processing workpieces driven automatically along a linear path to a plurality of positions disposed substantially along the linear path. In some embodiments, a workpiece may be processed at one or more of the positions using two or more processing stations, such as a first processing station that cuts the workpiece into segments and a second processing station that performs another processing operation on the workpiece.
摘要翻译：用于处理沿着线性路径自动驱动到基本上沿着线性路径设置的多个位置的工件的系统，包括方法和装置。在一些实施例中，可以使用两个或多个处理站（例如将工件切割成段）的第一处理站和在工件上执行另一处理操作的第二处理站在一个或多个位置处处理工件。

6. 发明授权

US07835808B2 Method and apparatus for processing material 有权
标题翻译：加工材料的方法和装置
公开(公告)号：US07835808B2
公开(公告)日：2010-11-16
申请号：US12005116
申请日：2007-12-21
申请人： Philip P. Sawyer , David A. Morgan , David Lee
发明人： Philip P. Sawyer , David A. Morgan , David Lee
IPC分类号： G06F19/00 , B26D7/06
CPC分类号： B23D59/008 , B23D59/001 , Y10T83/04 , Y10T83/145 , Y10T83/155 , Y10T83/2033
摘要： A system, including apparatus and method, for processing material includes a computer connected to a saw. A pusher is used to convey material along a processing path. The computer is programmed to control optimal processing of material to satisfy a cut list. The system for processing material may further include a printer configured to print labels for application to work pieces processed by the system.
摘要翻译：包括用于处理材料的装置和方法的系统包括连接到锯的计算机。推动器用于沿着处理路径传送材料。计算机被编程以控制材料的最佳处理以满足切割列表。用于处理材料的系统还可以包括被配置为打印用于应用于由系统处理的工件的标签的打印机。

7. 发明授权

US06775811B2 Chip design method for designing integrated circuit chips with embedded memories 失效
标题翻译：具有嵌入式存储器的集成电路芯片的芯片设计方法
公开(公告)号：US06775811B2
公开(公告)日：2004-08-10
申请号：US10151826
申请日：2002-05-22
申请人： Viswanathan Lakshmanan , Michael Josephides , Tom R. O'Brien , David A. Morgan
发明人： Viswanathan Lakshmanan , Michael Josephides , Tom R. O'Brien , David A. Morgan
IPC分类号： G06F1750
CPC分类号： G06F17/5072
摘要： A method of circuit design for designing integrated circuits with one or more embedded memories. A placement is generated for timing critical logic associated with each included embedded memory in a logic design. An augmented memory boundary is generated for said each included memory. Each augmented memory boundary encompasses one embedded memory and associated said timing critical logic.
摘要翻译：一种用于设计具有一个或多个嵌入存储器的集成电路的电路设计方法。在逻辑设计中生成与每个包含的嵌入式存储器相关联的定时关键逻辑的布局。为所述每个包括的存储器生成增强的存储器边界。每个增强的存储器边界包括一个嵌入式存储器和相关联的所述定时关键逻辑。

8. 发明授权

US06631006B2 System and method of marking materials for automated processing 有权
公开(公告)号：US06631006B2
公开(公告)日：2003-10-07
申请号：US09861231
申请日：2001-05-17
申请人： Spencer B. Dick , Douglas J. Malone , Jan Lankamp, Jr. , David Lee , David A. Morgan
发明人： Spencer B. Dick , Douglas J. Malone , Jan Lankamp, Jr. , David Lee , David A. Morgan
IPC分类号： G01B1114
CPC分类号： B23D47/042 , B23D59/001 , B23D59/008
摘要： A marking assembly for marking feature locations of a material and an automated processing system that uses input from the marking assembly to process the material. Feature locations such as defect positions and the size of the material are measured with an optical measuring device. The optical measuring device sends and receives light along a light path that is substantially parallel to a processing dimension of the material. A user manually interrupts the light path at a feature location, sending light from the feature location to the optical measuring device. The optical measuring device measures the feature location from the light received from the feature location and sends the feature location to a processor. The processor automatically positions the material relative to a modifying device, based on the feature location.

9. 发明申请

US20110175273A1 GAUGE SYSTEM 审中-公开
标题翻译：仪表系统
公开(公告)号：US20110175273A1
公开(公告)日：2011-07-21
申请号：US12889827
申请日：2010-09-24
申请人： Spencer B. Dick , Stuart R. Aldrich , David A. Morgan , Robert P. Hodges , Simon A. Soot , Jody S. Carpenter , John S. Gorny
发明人： Spencer B. Dick , Stuart R. Aldrich , David A. Morgan , Robert P. Hodges , Simon A. Soot , Jody S. Carpenter , John S. Gorny
IPC分类号： B23Q1/25
CPC分类号： B27B27/02 , B27B27/10 , Y10T83/741 , Y10T83/7647
摘要： Gauge system, including methods and apparatus, for positioning workpieces to be processed. In some embodiments, the gauge system may have a plurality of stops for positioning the end of a workpiece at distinct distances from a processing station. In some embodiments, the plurality of stops may be arrayed along a rail assembly having an adjustable length.
摘要翻译：测量系统，包括用于定位要处理的工件的方法和装置。在一些实施例中，计量系统可以具有多个止动件，用于将工件的端部定位在与处理站不同的距离处。在一些实施例中，多个止动件可以沿着具有可调节长度的轨道组件排列。

10. 发明申请

US20090105871A1 MULTI-STEP SYSTEMS FOR PROCESSING WORKPIECES 审中-公开
公开(公告)号：US20090105871A1
公开(公告)日：2009-04-23
申请号：US12260025
申请日：2008-10-28
申请人： Spencer B. Dick , Stuart Aldrich , David A. Morgan , David Lee
发明人： Spencer B. Dick , Stuart Aldrich , David A. Morgan , David Lee
IPC分类号： G06F19/00
CPC分类号： B27M1/08 , F16B2200/30 , Y10T29/49616 , Y10T29/49963 , Y10T29/49996 , Y10T29/5107 , Y10T29/5124 , Y10T29/5136 , Y10T29/5138 , Y10T29/5143 , Y10T29/5145 , Y10T83/162
摘要： Systems, including method and apparatus, for processing workpieces driven automatically along a linear path to a plurality of positions disposed substantially along the linear path. In some embodiments, a workpiece may be processed at one or more of the positions using two or more processing stations, such as a first processing station that cuts the workpiece into segments and a second processing station that performs another processing operation on the workpiece.

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