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1. 发明授权

US5391259A Method for forming a substantially uniform array of sharp tips 失效
标题翻译：用于形成基本均匀的锋利尖端阵列的方法
公开(公告)号：US5391259A
公开(公告)日：1995-02-21
申请号：US184819
申请日：1994-01-21
申请人： David A. Cathey , Kevin Tjaden
发明人： David A. Cathey , Kevin Tjaden
IPC分类号： C23F4/00 , H01J9/02 , H01J9/00
CPC分类号： H01J9/025 , H01J2201/30403
摘要： A method for forming a substantially uniform array of atomically sharp emitter tips, comprising: patterning a substrate with a mask, thereby defining an array; isotropically etching the array to form pointed tips; and removing the mask when substantially all of the tips have become sharp. A mask having a composition and dimensions which enable the mask to remain balanced on the apex of the tips until all of the tips are of substantially the same shape is used to form the array of substantially uniform tips.
摘要翻译：一种用于形成基本上均匀阵列的原子锋利的发射极尖端的方法，包括：用掩模图案化衬底，从而限定阵列; 各向同性蚀刻阵列以形成尖端; 并且当基本上所有的尖端已经变得尖锐时去除掩模。具有使掩模在尖端的顶点上保持平衡的成分和尺寸的掩模，直到所有尖端具有基本相同的形状，以形成基本均匀的尖端的阵列。

2. 发明授权

US6165374A Method of forming an array of emitter tips 失效
标题翻译：形成发射器尖端阵列的方法
公开(公告)号：US6165374A
公开(公告)日：2000-12-26
申请号：US354529
申请日：1999-07-15
申请人： David A. Cathey , Kevin Tjaden
发明人： David A. Cathey , Kevin Tjaden
IPC分类号： H01J9/02 , B44C1/22 , H01L21/00
CPC分类号： H01J9/025 , H01J2201/30403
摘要： A method for fabricating sharp asperities. A substrate is provided which has a mask layer disposed thereon, and a layer of micro-spheres is disposed superjacent the mask layer. The micro-spheres are for patterning the mask layer. Portions of the mask layer are selectively removed, thereby forming circular masks. The substrate is isotropically etched, thereby creating sharp asperities.
摘要翻译：一种制造尖锐凹凸的方法。提供了具有设置在其上的掩模层的基板，并且在该掩模层的上方布置一层微球。微球用于图案化掩模层。选择性地去除掩模层的一部分，从而形成圆形掩模。基板被各向同性地蚀刻，从而产生尖锐的凹凸。

3. 发明授权

US06423239B1 Methods of making an etch mask and etching a substrate using said etch mask 失效
标题翻译：使用所述蚀刻掩模制造蚀刻掩模和蚀刻衬底的方法
公开(公告)号：US06423239B1
公开(公告)日：2002-07-23
申请号：US09591192
申请日：2000-06-08
申请人： David A. Cathey , Kevin Tjaden
发明人： David A. Cathey , Kevin Tjaden
IPC分类号： H01J900
CPC分类号： H01J9/025 , H01J2201/30403
摘要： A method for fabricating sharp asperities. A substrate is provided which has a mask layer disposed thereon, and a layer of micro-spheres is disposed superjacent the mask layer. The micro-spheres are for patterning the mask layer. Portions of the mask layer are selectively removed, thereby forming circular masks. The substrate is isotropically etched, thereby creating sharp asperities.
摘要翻译：一种制造尖锐凹凸的方法。提供了具有设置在其上的掩模层的基板，并且在该掩模层的上方布置一层微球。微球用于图案化掩模层。选择性地去除掩模层的一部分，从而形成圆形掩模。基板被各向同性地蚀刻，从而产生尖锐的凹凸。

4. 发明授权

US06176752B1 Baseplate and a method for manufacturing a baseplate for a field emission display 失效
公开(公告)号：US06176752B1
公开(公告)日：2001-01-23
申请号：US09152772
申请日：1998-09-10
申请人： Kevin Tjaden , David A. Cathey , John K. Lee
发明人： Kevin Tjaden , David A. Cathey , John K. Lee
IPC分类号： H01J900
CPC分类号： H01J9/025
摘要： The present invention is a baseplate that has a supporting substrate with a primary surface upon which an array of emitters is formed. An insulator layer with a plurality of cavities aligned with respective emitters is disposed on the primary surface, and an extraction grid with a plurality of cavity openings aligned with respective emitters is deposited on the insulator layer. The extraction grid is made from a silicon based layer of material. A current control substrate formed from the silicon based layer of material of the extraction grid is provided such that the current control substrate is electrically isolated from the extraction grid and electrically connected to the emitters. The current control substrate has sufficient resistivity to limit the current from the emitters.

5. 发明授权

US06780491B1 Microstructures including hydrophilic particles 有权
标题翻译：微结构包括亲水性颗粒
公开(公告)号：US06780491B1
公开(公告)日：2004-08-24
申请号：US09621496
申请日：2000-07-21
申请人： David A. Cathey , Kevin Tjaden , James J. Alwan
发明人： David A. Cathey , Kevin Tjaden , James J. Alwan
IPC分类号： B44C122
CPC分类号： H01J9/025 , Y10T428/24355 , Y10T428/24372 , Y10T428/24421
摘要： A substrate is placed on a charging surface, to which a first voltage is applied. Etch-resistant dry particles are placed in a cup in a nozzle to which a second voltage, less than the first voltage, is applied. A carrier gas is directed through the nozzle, which projects the dry particles out of the nozzle toward the substrate. The particles pick up a charge from the potential applied to the nozzle and are electrostatically attracted to the substrate. The particles adhere to the substrate, where they form an etch mask. The substrate is etched and the particles are removed. Emitter tips for a field emission display may be formed in the substrate.
摘要翻译：将基板放置在施加第一电压的充电表面上。将耐蚀刻干燥颗粒放置在喷嘴中的杯中，其中施加小于第一电压的第二电压。载气被引导通过喷嘴，其将干燥颗粒从喷嘴向衬底投射。颗粒从施加到喷嘴的电位拾取电荷，并被静电吸引到基板上。颗粒粘附到基底上，在那里它们形成蚀刻掩模。蚀刻基板并除去颗粒。用于场致发射显示器的发射极尖端可以形成在衬底中。

6. 发明授权

US06369505B2 Baseplate and a method for manufacturing a baseplate for a field emission display 失效
标题翻译：基板和用于制造用于场发射显示器的基板的方法
公开(公告)号：US06369505B2
公开(公告)日：2002-04-09
申请号：US09769150
申请日：2001-01-23
申请人： Kevin Tjaden , David A. Cathey , John K. Lee
发明人： Kevin Tjaden , David A. Cathey , John K. Lee
IPC分类号： H01J162
CPC分类号： H01J9/025
摘要： The present invention is a baseplate that has a supporting substrate with a primary surface upon which an array of emitters is formed. An insulator layer with a plurality of cavities aligned with respective emitters is disposed on the primary surface, and an extraction grid with a plurality of cavity openings aligned with respective emitters is deposited on the insulator layer. The extraction grid is made from a silicon based layer of material. A current control substrate formed from the silicon based layer of material of the extraction grid is provided such that the current control substrate is electrically isolated from the extraction grid and electrically connected to the emitters. The current control substrate has sufficient resistivity to limit the current from the emitters.
摘要翻译：本发明是一种基板，其具有支撑基板，该基板具有形成有发射体阵列的主表面。具有与相应发射器对准的多个空腔的绝缘体层设置在主表面上，并且具有与各个发射极对准的多个腔开口的引出栅格沉积在绝缘体层上。提取网格由硅基材料层制成。提供由提取栅格的硅基材料层形成的电流控制衬底，使得电流控制衬底与提取栅极电隔离并电连接到发射器。电流控制基板具有足够的电阻率以限制来自发射器的电流。

7. 发明授权

US6080325A Method of etching a substrate and method of forming a plurality of emitter tips 失效
标题翻译：蚀刻基板的方法和形成多个发射极尖端的方法
公开(公告)号：US6080325A
公开(公告)日：2000-06-27
申请号：US24877
申请日：1998-02-17
申请人： David A. Cathey , Kevin Tjaden
发明人： David A. Cathey , Kevin Tjaden
IPC分类号： H01J9/02 , H01J9/00
CPC分类号： H01J9/025 , H01J2201/30403
摘要： A method for fabricating sharp asperities. A substrate is provided which has a mask layer disposed thereon, and a layer of micro-spheres is disposed superjacent the mask layer. The micro-spheres are for patterning the mask layer. Portions of the mask layer are selectively removed, thereby forming circular masks. The substrate is isotropically etched, thereby creating sharp asperities.
摘要翻译：一种制造尖锐凹凸的方法。提供了具有设置在其上的掩模层的基板，并且一层微球设置在掩模层的上方。微球用于图案化掩模层。选择性地去除掩模层的一部分，从而形成圆形掩模。基板被各向同性地蚀刻，从而产生尖锐的凹凸。

8. 发明授权

US6010917A Electrically isolated interconnects and conductive layers in semiconductor device manufacturing 失效
标题翻译：半导体器件制造中的电隔离互连和导电层
公开(公告)号：US6010917A
公开(公告)日：2000-01-04
申请号：US725646
申请日：1996-10-15
申请人： James J. Alwan , Kevin Tjaden , David A. Cathey
发明人： James J. Alwan , Kevin Tjaden , David A. Cathey
IPC分类号： H01L21/00
CPC分类号： H01J31/127 , H01J29/467 , H01J3/022 , H01J9/148 , H01J2203/0228 , H01J2203/0232 , H01J2329/4626 , H01J2329/463
摘要： A method for fabricating microelectronic deices in which an interconnect layer is electrically isolated from large protuberances that project from a lower conductive layer to a desired endpoint of a chemical-mechanical planarization process. The lower conductive layer is covered with an insulating material to form an insulator layer that generally follows the contour of the lower conductive layer and any large protuberances. A highly conductive interconnect material is then deposited over the insulator layer to form an interconnect layer that generally follows the contour of the insulator layer. The interconnect layer may be deposited directly on the insulator layer, or it may be deposited on an intermediate layer between the interconnect layer and the insulator layer. After the upper conductive layer is deposited, the insulator layer and the upper conductive layer are planarized with a chemical-mechanical planarization process to a desired endpoint.
摘要翻译：一种用于制造微电子器件的方法，其中互连层与从下导电层突出到化学机械平面化工艺的期望端点的大突起电隔离。下导电层被绝缘材料覆盖以形成通常遵循下导电层和任何大突起的轮廓的绝缘体层。然后将高度导电的互连材料沉积在绝缘体层上，以形成大致遵循绝缘体层的轮廓的互连层。互连层可以直接沉积在绝缘体层上，或者它可以沉积在互连层和绝缘体层之间的中间层上。在沉积上导电层之后，通过化学机械平面化工艺将绝缘体层和上导电层平坦化成期望的端点。

9. 发明授权

US5817373A Dry dispense of particles for microstructure fabrication 失效
标题翻译：用于微结构制造的颗粒的干燥分配
公开(公告)号：US5817373A
公开(公告)日：1998-10-06
申请号：US764756
申请日：1996-12-12
申请人： David A. Cathey , Kevin Tjaden , James J. Alwan
发明人： David A. Cathey , Kevin Tjaden , James J. Alwan
IPC分类号： H01J9/02 , B05D1/06 , B05D1/32 , C03C25/06
CPC分类号： H01J9/025
摘要： A substrate is placed on a charging surface, to which a first voltage is applied. Etch-resistant dry particles are placed in a cup in a nozzle to which a second voltage, less than the first voltage, is applied. A carrier gas is directed through the nozzle, which projects the dry particles out of the nozzle toward the substrate. The particles pick up a charge from the potential applied to the nozzle and are electrostatically attracted to the substrate. The particles adhere to the substrate, where they form an etch mask. The substrate is etched and the particles are removed. Emitter tips for a field emission display may be formed in the substrate.
摘要翻译：将基板放置在施加第一电压的充电表面上。将耐蚀刻干燥颗粒放置在喷嘴中的杯中，其中施加小于第一电压的第二电压。载气被引导通过喷嘴，其将干燥颗粒从喷嘴向衬底投射。颗粒从施加到喷嘴的电位拾取电荷，并被静电吸引到基板上。颗粒粘附到基底上，在那里它们形成蚀刻掩模。蚀刻基板并除去颗粒。用于场致发射显示器的发射极尖端可以形成在衬底中。

10. 发明授权

US5753130A Method for forming a substantially uniform array of sharp tips 失效
标题翻译：用于形成基本均匀的锋利尖端阵列的方法
公开(公告)号：US5753130A
公开(公告)日：1998-05-19
申请号：US665620
申请日：1996-06-18
申请人： David A. Cathey , Kevin Tjaden
发明人： David A. Cathey , Kevin Tjaden
IPC分类号： H01J9/02 , H01J9/00
CPC分类号： H01J9/025 , H01J2201/30403
摘要： A method for fabricating sharp asperities. A substrate is provided which has a mask layer disposed thereon, and a layer of micro-spheres is disposed superjacent the mask layer. The micro-spheres are for patterning the mask layer. Portions of the mask layer are selectively removed, thereby forming circular masks. The substrate is isotropically etched, thereby creating sharp asperities.
摘要翻译：一种制造尖锐凹凸的方法。提供了具有设置在其上的掩模层的基板，并且在该掩模层的上方布置一层微球。微球用于图案化掩模层。选择性地去除掩模层的一部分，从而形成圆形掩模。基板被各向同性地蚀刻，从而产生尖锐的凹凸。

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