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    • 8. 发明申请
    • Method of forming an integrated circuit incorporating higher voltage devices and low voltage devices therein
    • 形成其中包含较高电压装置和低电压装置的集成电路的方法
    • US20060040449A1
    • 2006-02-23
    • US10924469
    • 2004-08-23
    • Ashraf LotfiJian Tan
    • Ashraf LotfiJian Tan
    • H01L21/336
    • H01L21/823814H01L21/82385H01L21/823857
    • A method of forming an integrated circuit configured to accommodate higher voltage and low voltage devices. In one embodiment, the method of forming the integrated circuit includes forming a transistor by forming a gate over a semiconductor substrate. The method of forming the transistor also includes forming a source/drain by forming a lightly doped region adjacent a channel region recessed into the semiconductor substrate and forming a heavily doped region adjacent the lightly doped region. The method of forming the transistor further includes forming an oppositely doped well under and within the channel region, and forming a doped region between the heavily doped region and the oppositely doped well. The doped region has a doping concentration profile less than a doping concentration profile of the heavily doped region. The method of forming the integrated circuit also includes forming a driver switch of a driver on the semiconductor substrate.
    • 一种形成集成电路的方法,其被配置为容纳更高电压和低电压的装置。 在一个实施例中,形成集成电路的方法包括通过在半导体衬底上形成栅极来形成晶体管。 形成晶体管的方法还包括通过形成与凹入半导体衬底中的沟道区相邻的轻掺杂区域并形成邻近轻掺杂区的重掺杂区来形成源极/漏极。 形成晶体管的方法还包括在沟道区内和沟道区内形成相对掺杂的阱,并在重掺杂区和相对掺杂的阱之间形成掺杂区。 掺杂区域具有小于重掺杂区域的掺杂浓度分布的掺杂浓度分布。 形成集成电路的方法还包括在半导体衬底上形成驱动器的驱动器开关。
    • 9. 发明申请
    • INTEGRATED CIRCUIT EMPLOYABLE WITH A POWER CONVERTER
    • 集成电路与电源转换器配合使用
    • US20060038225A1
    • 2006-02-23
    • US10924003
    • 2004-08-23
    • Ashraf LotfiJian Tan
    • Ashraf LotfiJian Tan
    • H01L29/76H01L31/062
    • H02M3/156H01L27/0922
    • An integrated circuit employable with a power converter. In one embodiment, the integrated circuit includes a transistor employable as a switch of a power train of the power converter including a gate located over a channel region recessed into a semiconductor substrate. The transistor also includes a source/drain including a lightly doped region located adjacent the channel region and a heavily doped region located adjacent the lightly doped region. The transistor further includes an oppositely doped well located under and within the channel region. The transistor still further includes a doped region, located between the heavily doped region and the oppositely doped well, having a doping concentration profile less than a doping concentration profile of the heavily doped region. The integrated circuit also includes a driver switch of a driver configured to provide a drive signal to the transistor and formed on the semiconductor substrate.
    • 具有电源转换器的集成电路。 在一个实施例中,集成电路包括可用作功率转换器的传动系的开关的晶体管,其包括位于凹入半导体衬底的沟道区域上方的栅极。 晶体管还包括源极/漏极,其包括位于沟道区附近的轻掺杂区域和位于轻掺杂区域附近的重掺杂区域。 晶体管还包括位于沟道区域下方和沟槽区域内的相对掺杂阱。 晶体管还包括位于重掺杂区和相对掺杂阱之间的掺杂区,其具有小于重掺杂区的掺杂浓度分布的掺杂浓度分布。 集成电路还包括被配置为向晶体管提供驱动信号并形成在半导体衬底上的驱动器的驱动器开关。