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    • 1. 发明申请
    • MASTER FOR MANUFACTURING MOLD, MOLD FOR MANUFACTURING DISPLAY DEVICE AND MANUFACTURING METHODS THEREOF
    • 主要用于制造模具,用于制造显示装置的模具及其制造方法
    • US20090309257A1
    • 2009-12-17
    • US12273467
    • 2008-11-18
    • Dae-Jin ParkJung-Mok BaeJae-Hyuk ChangJu-Han Bae
    • Dae-Jin ParkJung-Mok BaeJae-Hyuk ChangJu-Han Bae
    • B29C33/40
    • B29C33/40
    • The present invention relates to a master for manufacturing a mold, a mold for manufacturing a display device, a manufacturing method of the mold using the master, and a manufacturing method of the display device using the mold in an imprinting process. A master for manufacturing a mold according to one or more embodiments of the present invention comprises a substrate, and a master pattern formed on the substrate and comprising an embossed portion, wherein the embossed portion comprises levees formed on both edges thereof. A side surface of the embossed portion may form an angle of about 60 to 90 degrees with a surface of the substrate. When the mold manufactured using the master is used in the imprinting process to manufacture the display device, air bubbles are kept away from the side surface of a resin pattern. Accordingly, defects of the wire pattern of the display device may be prevented.
    • 本发明涉及用于制造模具的主体,用于制造显示装置的模具,使用母版的模具的制造方法以及在压印过程中使用该模具的显示装置的制造方法。 根据本发明的一个或多个实施例的用于制造模具的母版包括基底和形成在基底上并包括压纹部分的母图案,其中压花部分包括在其两个边缘上形成的堤坝。 压纹部分的侧表面可以与基底的表面形成约60度至90度的角度。 当使用母版制造的模具用于印刷工艺以制造显示装置时,气泡保持远离树脂图案的侧表面。 因此,可以防止显示装置的线图形的缺陷。
    • 4. 发明授权
    • Imprinting device, method of fabricating the same, and method of patterning thin film using the same
    • 印刷装置及其制造方法以及使用其形成薄膜的方法
    • US08986909B2
    • 2015-03-24
    • US12030959
    • 2008-02-14
    • Jung-Mok Bae
    • Jung-Mok Bae
    • G03H1/04G03F7/00B82Y10/00B82Y40/00
    • G03F7/0002B82Y10/00B82Y40/00
    • An imprinting device includes a first substrate, a light blocking layer formed on the first substrate corresponding to a light blocking area, and a patterned layer formed on the first substrate. The patterned layer includes an etch pattern and a flow control pattern formed on the first substrate corresponding to a transmittance area and the light blocking area, respectively. When the patterned layer presses a resin layer, the resin layer pressed by the etch pattern moves towards the flow control pattern or a photosensitive resin layer pressed by the flow control pattern moves towards the etch pattern according to a shape of the flow control pattern. Thus, when the shape of the flow control pattern is controlled, the resin layer pressed by the patterned layer may be formed with a uniform thickness.
    • 压印装置包括第一基板,形成在对应于遮光区域的第一基板上的遮光层和形成在第一基板上的图案层。 图案化层包括分别在对应于透射区域和遮光区域的第一基板上形成的蚀刻图案和流动控制图案。 当图案化层按压树脂层时,被蚀刻图案按压的树脂层朝向流动控制图案移动,或者由流动控制图案按压的感光性树脂层根据流动控制图案的形状向蚀刻图案移动。 因此,当控制流动控制图案的形状时,由图案化层压制的树脂层可以形成均匀的厚度。