专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20170211920A1 METHOD FOR MACHINING A SCALE 审中-公开
公开(公告)号：US20170211920A1
公开(公告)日：2017-07-27
申请号：US15414729
申请日：2017-01-25
申请人： DR. JOHANNES HEIDENHAIN GmbH
发明人： Moritz Schwabe , Peter Speckbacher , Josef Weidmann
IPC分类号： G01B3/04 , B24B19/26
CPC分类号： G01B3/04 , B24B19/26 , G01D5/24438 , G01D5/34707 , G01D11/16
摘要： A method for machining a scale of a position-measuring system is provided for such a scale having, on a first surface, a measuring graduation and, on a second surface, is attachable to a carrier body. The first and second surfaces are bounded respectively by first and second edges in a region of a lateral peripheral side edge. The scale is machined to produce a defined outer contour of the scale such that a raised ridge of material is formed at each of the first and second edges. The scale is machined differently at the first edge than at the second edge in such a manner that a dimension of the raised ridge of material at the first edge perpendicular to the first surface is smaller than a dimension of the raised ridge of material at the second edge perpendicular to the second surface.

2. 发明申请

US20170211951A1 SCALE AND POSITION-MEASURING DEVICE HAVING SUCH A SCALE 有权
公开(公告)号：US20170211951A1
公开(公告)日：2017-07-27
申请号：US15415913
申请日：2017-01-26
申请人： DR. JOHANNES HEIDENHAIN GmbH
发明人： Stefan Funk , Peter Speckbacher
IPC分类号： G01D5/26 , G01D5/30
CPC分类号： G01D5/264 , G01D5/266 , G01D5/30 , G01D5/38 , G02B5/1861
摘要： A scale for an optically scanning position-measuring device includes a carrier and a reflective layer disposed on the carrier. A transparent spacer layer is disposed on the reflective layer. The spacer layer has a patterned, partially transparent layer thereon which defines a bright/dark pattern in which regions having the partially transparent layer appear dark and regions without the partially transparent layer appear bright. A sealing layer is disposed on the patterned, partially transparent layer. Products of refractive index and layer thickness are the same for the spacer layer and the sealing layer, or differ by an odd multiple.

3. 发明申请

US20170211923A1 OPTICAL POSITION-MEASURING DEVICE 审中-公开
公开(公告)号：US20170211923A1
公开(公告)日：2017-07-27
申请号：US15410806
申请日：2017-01-20
申请人： DR. JOHANNES HEIDENHAIN GmbH
发明人： Peter Speckbacher , Tobias Gruendl , Christian Baeuml , Josef Weidmann
IPC分类号： G01B9/02
CPC分类号： G01B9/02034 , G01B9/02017 , G01B2290/30 , G01B2290/65 , G01D5/38
摘要： An optical position-measuring device includes a scale and a scanning reticle, whose relative position is determinable in three linearly independent spatial directions using interfering light beams. A splitter grating is disposed on the scanning reticle and adapted to split light into sub-beams of different diffraction orders. An optical grating is disposed on the scale and adapted to further split the sub-beams and to recombine them after they have been reflected back from the scanning reticle. Grating fields configured as phase gratings are disposed on a side of the scanning reticle that faces the scale. The grating fields act as diffractive optics that influence the further split sub-beams. The grating fields have different step heights. An output grating is disposed on the scanning reticle and adapted to output, as interfering sub-beams, light that has been multiply reflected between the scale and the scanning reticle.

4. 发明授权

US09677874B2 Position-measuring device 有权
公开(公告)号：US09677874B2
公开(公告)日：2017-06-13
申请号：US15005079
申请日：2016-01-25
申请人： DR. JOHANNES HEIDENHAIN GmbH
发明人： Peter Speckbacher , Tobias Gruendl , Josef Weidmann , Andrew Graham , Daniela Bayer
IPC分类号： G01B11/14 , G01D5/34 , G01D5/347 , G01B5/008
CPC分类号： G01B11/14 , G01B5/008 , G01D5/34 , G01D5/34707 , G01D5/34715 , G01D5/34746 , G03F7/70775
摘要： A position-measuring device includes a first scale and a second scale, which are arranged end-to-end to extend across a measurement range, as well as a scanning unit having a light source configured to emit a light beam. The first scale includes a reflective phase grating having first periodic marks which diffract an incident light beam into a predetermined diffraction order with a first diffraction efficiency. The second scale includes a reflective phase grating having second periodic marks that differ in shape from the first periodic marks. A reflectivity of the phase grating of the second scale is reduced compared to a reflectivity of the phase grating of the first scale to such an extent that the phase grating of the second scale diffracts the incident light beam into the predetermined diffraction order with the first diffraction efficiency.

5. 发明申请

US20160216103A1 POSITION-MEASURING DEVICE 有权
标题翻译：位置测量装置
公开(公告)号：US20160216103A1
公开(公告)日：2016-07-28
申请号：US15005079
申请日：2016-01-25
申请人： DR. JOHANNES HEIDENHAIN GmbH
发明人： Peter Speckbacher , Tobias Gruendl , Josef Weidmann , Andrew Graham , Daniela Bayer
IPC分类号： G01B11/14 , G01D5/34
CPC分类号： G01B11/14 , G01B5/008 , G01D5/34 , G01D5/34707 , G01D5/34715 , G01D5/34746 , G03F7/70775
摘要： A position-measuring device includes a first scale and a second scale, which are arranged end-to-end to extend across a measurement range, as well as a scanning unit having a light source configured to emit a light beam. The first scale includes a reflective phase grating having first periodic marks which diffract an incident light beam into a predetermined diffraction order with a first diffraction efficiency. The second scale includes a reflective phase grating having second periodic marks that differ in shape from the first periodic marks. A reflectivity of the phase grating of the second scale is reduced compared to a reflectivity of the phase grating of the first scale to such an extent that the phase grating of the second scale diffracts the incident light beam into the predetermined diffraction order with the first diffraction efficiency.
摘要翻译：位置测量装置包括端对端地跨越测量范围布置的第一刻度和第二刻度，以及具有被配置为发射光束的光源的扫描单元。第一刻度包括具有第一周期标记的反射相位光栅，该第一周期标记以入射光束以第一衍射效率衍射成预定的衍射级。第二刻度包括具有与第一周期标记不同形状的第二周期标记的反射相位光栅。与第一刻度的相位光栅的反射率相比，第二刻度的相位光栅的反射率减小到使得第二刻度的相位光栅将入射光束衍射成具有第一衍射的预定衍射级的程度效率。

6. 发明授权

US10914615B2 Scanning reticle including a grating formed in a substrate for an optical position measuring device 有权
公开(公告)号：US10914615B2
公开(公告)日：2021-02-09
申请号：US16048740
申请日：2018-07-30
申请人： DR. JOHANNES HEIDENHAIN GmbH
发明人： Stefan Funk , Andreas Hofmann , Peter Speckbacher
IPC分类号： G01D5/38 , G01D5/347 , G02B1/115 , G02B5/18
摘要： A scanning reticle for an optical position measuring device includes a substrate having an upper surface, operating in transmission, and having different functional regions. The upper surface includes at least one region having a grating made up of gaps and ribs, the ribs being formed in the substrate. The upper surface includes an antireflection layer, which is discontinuous in the region of the gaps.

7. 发明授权

US09453744B2 Measuring graduation and photoelectric position measuring device having the same 有权
标题翻译：测量刻度和光电位置测量装置具有相同的功能
公开(公告)号：US09453744B2
公开(公告)日：2016-09-27
申请号：US14504472
申请日：2014-10-02
申请人： DR. JOHANNES HEIDENHAIN GmbH
发明人： Josef Weidmann , Peter Speckbacher , Andrew Graham
IPC分类号： G01B11/14 , G01D5/347 , G01D5/38
CPC分类号： G01D5/34707 , G01B11/14 , G01D5/38
摘要： A measuring graduation includes a phase grating for a photoelectric position measuring device for measuring positions in a first direction and in a second direction extending orthogonally to the first direction. The phase grating has a periodic array of grating elements in the first direction and in the second direction. The grating elements each have an outer contour that is formed by a continuous line which includes two mutually opposing first straight edges, two mutually opposing second straight edges extending perpendicularly to the first straight edges, and connecting lines extending between the first straight edges and the second straight edges. The connecting lines form an obtuse angle with the first straight edges and with the second straight edges.
摘要翻译：测量刻度包括用于光电位置测量装置的相位光栅，用于测量在与第一方向正交的第一方向和第二方向上的位置。相位光栅在第一方向和第二方向上具有光栅元件的周期性阵列。光栅元件各自具有由连续线形成的外轮廓，该连续线包括两个相互相对的第一直边缘，垂直于第一直边缘延伸的两个彼此相对的第二直边缘，以及在第一直边缘和第二直边缘之间延伸的连接线直边。连接线与第一直边缘和第二直边缘形成钝角。

8. 发明授权

US10222192B2 Method for machining a scale 有权
公开(公告)号：US10222192B2
公开(公告)日：2019-03-05
申请号：US15414729
申请日：2017-01-25
申请人： DR. JOHANNES HEIDENHAIN GmbH
发明人： Moritz Schwabe , Peter Speckbacher , Josef Weidmann
IPC分类号： G01B3/04 , B24B19/26 , G01D5/244 , G01D5/347 , G01D11/16
摘要： A method for machining a scale of a position-measuring system is provided for such a scale having, on a first surface, a measuring graduation and, on a second surface, is attachable to a carrier body. The first and second surfaces are bounded respectively by first and second edges in a region of a lateral peripheral side edge. The scale is machined to produce a defined outer contour of the scale such that a raised ridge of material is formed at each of the first and second edges. The scale is machined differently at the first edge than at the second edge in such a manner that a dimension of the raised ridge of material at the first edge perpendicular to the first surface is smaller than a dimension of the raised ridge of material at the second edge perpendicular to the second surface.

9. 发明授权

US10119802B2 Optical position-measuring device having grating fields with different step heights 有权
公开(公告)号：US10119802B2
公开(公告)日：2018-11-06
申请号：US15410806
申请日：2017-01-20
申请人： DR. JOHANNES HEIDENHAIN GmbH
发明人： Peter Speckbacher , Tobias Gruendl , Christian Baeuml , Josef Weidmann
IPC分类号： G01B9/02 , G01D5/38
摘要： An optical position-measuring device includes a scale and a scanning reticle, whose relative position is determinable in three linearly independent spatial directions using interfering light beams. A splitter grating is disposed on the scanning reticle and adapted to split light into sub-beams of different diffraction orders. An optical grating is disposed on the scale and adapted to further split the sub-beams and to recombine them after they have been reflected back from the scanning reticle. Grating fields configured as phase gratings are disposed on a side of the scanning reticle that faces the scale. The grating fields act as diffractive optics that influence the further split sub-beams. The grating fields have different step heights. An output grating is disposed on the scanning reticle and adapted to output, as interfering sub-beams, light that has been multiply reflected between the scale and the scanning reticle.

10. 发明授权

US11480717B2 Grating structure for a diffractive optic 有权
$Grating structure for a diffractive optic$
公开(公告)号：US11480717B2
公开(公告)日：2022-10-25
申请号：US16589160
申请日：2019-10-01
申请人： DR. JOHANNES HEIDENHAIN GmbH
发明人： Josef Weidmann , Peter Speckbacher
IPC分类号： G02B5/18 , B29D11/00 , G03F9/00
摘要： A grating structure for a diffractive optic includes grating lines, each of which is approximated by successive segments. Longitudinal axes of the segments each have an angle relative to a first coordinate axis of a reference coordinate system. A first section of a first one of the grating lines is approximated by a first group of the segments, and a second section adjacent to the first section of the first grating line is approximated by a second group of segments. The longitudinal axes of a major portion of the segments of the first group have a first predetermined angle relative to the first coordinate axis of the reference coordinate system, and the longitudinal axes of a major portion of the segments of the second group have a second predetermined angle different from the first predetermined angle relative to the first coordinate axis of the reference coordinate system.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式