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    • 8. 发明授权
    • Polymer comprising end groups containing photoacid generator, photoresist comprising the polymer, and method of making a device
    • 包含含有光酸产生剂的端基的聚合物,包含聚合物的光致抗蚀剂,以及制造器件的方法
    • US09052589B2
    • 2015-06-09
    • US14012174
    • 2013-08-28
    • Dow Global Technologies LLC
    • John W. KramerDaniel J. Arriola
    • G03F7/004G03F7/20C08F2/38G03F7/039C08F220/28C08F220/18C08F220/38
    • G03F7/0041C08F2/38C08F220/28C08F2220/1891C08F2220/387C08F2438/03G03F7/0045G03F7/0046G03F7/0397G03F7/20C08F2220/282C08F2220/1866C08F220/24
    • A polymer comprises the polymerized product of unsaturated monomers comprising an acid-deprotectable monomer, a base-soluble monomer, a lactone-containing monomer, a photoacid-generating monomer, or a combination comprising at least one of the foregoing monomers, with a chain transfer agent of Formula (I); wherein in Formula (I), Z is a y valent C1-20 organic group, L is a heteroatom or a single bond, A1 and A2 are each independently ester containing or non-ester containing and are fluorinated or non-fluorinated, and are independently C1-40 alkylene, C3-40 cycloalkylene, C6-40 arylene, or C7-40 aralkylene, and A1 contains a nitrile, ester, or aryl substituent group alpha to the point of attachment with sulfur, X1 is a single bond, —O—, —S—, —C(═O)—O—, —O—C(═O)—, —O—C(═O)—O—, —C(═O)—NR—, —NR—C(═O)—, —NR—C(═O)—NR—, —S(═O)2—O—, —O—S(═O)2—O—, —NR—S(═O)2—, or —S(═O)2—NR, wherein R is H, C1-10 alkyl, C3-10 cycloalkyl or C6-10 aryl, Y− is an anionic group, G+ is a metallic or non-metallic cation, and y is an integer of 1 to 6. A photoresist composition comprising the polymer, a coated substrate, comprising a layer of the photoresist composition, and a method of forming an electronic device from the photoresist, are also disclosed.
    • 聚合物包含不饱和单体的聚合产物,其包含酸可脱保护的单体,可溶于碱的单体,含内酯的单体,产生光致酸的单体或包含至少一种前述单体的组合与链转移 式(I)的试剂; 其中在式(I)中,Z是一价C 1-20有机基团,L是杂原子或单键,A1和A2各自独立地为含酯或非酯,并且为氟化或非氟化的,并且独立地为 C 1-4亚烷基,C 3-40亚环烷基,C 6-40亚芳基或C 3-40亚芳基,并且A1含有与硫连接点的腈,酯或芳基取代基α,X1是单键,-O - , - S - , - C(= O)-O-,-O-C(= O) - , - O-C(= O)-O-,-C(= -C(= O) - , - NR-C(= O)-NR - , - S(= O)2-O-,-O-S(= O)2-O-,-NR-S O)2-或-S(= O)2 -NR,其中R是H,C 1-10烷基,C 3-10环烷基或C 6-10芳基,Y-是阴离子基团,G +是金属或非金属, 金属阳离子,y为1〜6的整数。包含聚合物的光致抗蚀剂组合物,包含光致抗蚀剂组合物的层的涂布基材,以及从该光刻胶形成电子器件的方法 抗拒,也被披露。