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    • 1. 发明授权
    • Fabrication of complementary modulation-doped filed effect transistors
    • 互补调制掺杂场效应晶体管的制造
    • US4603469A
    • 1986-08-05
    • US715698
    • 1985-03-25
    • Craig A. ArmientoPeter E. Norris
    • Craig A. ArmientoPeter E. Norris
    • H01L21/8252H01L21/20H01L21/265
    • H01L21/8252
    • Method of fabricating a monolithic integrated circuit structure incorporating a complementary pair of GaAs/AlGaAs modulation-doped field effect transistors (MODFET's) including providing a substrate of semi-insulating GaAs, depositing an epitaxial layer of undoped AlGaAs on its surface, and ion-implanting a heavily doped N-type donor region and a heavily doped P-type acceptor region in the undoped AlGaAs. A thin spacer layer of undoped AlGaAs is epitaxially deposited on the previously deposited AlGaAs layer, and an epitaxial layer of undoped GaAs is deposited on the spacer layer. First and second gate members which form Schottky barriers with the GaAs are placed on the GaAs layer overlying portions of the N-type donor region and P-type acceptor region, respectively. N-type source and drain zones are formed in the GaAs layer on opposite sides of the first gate member, and P-type source and drain zones are formed in the GaAs layer on opposite sides of the second gate member. A first MODFET is provided by the N-type donor region, the N-type source and drain, the region of undoped GaAs between the source and drain which form a two-dimensional electron gas region, and the first gate member. A second MODFET complementary to the first is provided by the P-type acceptor region, the P-type source and drain, the region of undoped GaAs between the source and drain which form a two-dimensional hole gas region, and the second gate member.
    • 制造包含互补对的GaAs / AlGaAs调制掺杂场效应晶体管(MODFET)的单片集成电路结构的方法,包括提供半绝缘GaAs的衬底,在其表面上沉积未掺杂的AlGaAs的外延层,以及离子注入 重掺杂的N型施主区域和未掺杂的AlGaAs中的重掺杂的P型受主区域。 在先前沉积的AlGaAs层上外延沉积未掺杂的AlGaAs的薄间隔层,并且在间隔层上沉积未掺杂的GaAs的外延层。 分别在GaAs层上叠置形成肖特基势垒的第一和第二栅极元件,分别覆盖N型施主区域和P型受主区域的部分。 在第一栅极部件的相对侧上的GaAs层中形成有N型源极和漏极区域,并且在第二栅极部件的相对侧的GaAs层中形成P型源极和漏极区域。 第一MODFET由N型施主区域,N型源极和漏极,源极和漏极之间的未掺杂GaAs的区域形成二维电子气区域和第一栅极部件提供。 与第一个互补的第二个MODFET由P型受主区域,P型源极和漏极,源极和漏极之间的未掺杂GaAs的区域形成二维空穴气体区域,第二栅极部件 。