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    • 4. 发明授权
    • Semiconductor device
    • 半导体器件
    • US4603402A
    • 1986-07-29
    • US677639
    • 1984-12-04
    • Roger CuppensCornelis D. Hartgring
    • Roger CuppensCornelis D. Hartgring
    • G11C17/00G11C16/04G11C16/10G11C16/14H01L21/8247H01L27/115H01L29/788H01L29/792G11C11/40
    • G11C16/10G11C16/14H01L29/7881H01L29/7883
    • The invention relates to an EPROM or an EEPROM in which the information is stored in the form of electrical charge above the channel region of a MOST, as a result of which the threshold voltage of the MOST is determined by the stored information. Writing/erasing of the memory generally requires high voltages to cause charge current to flow through an insulating layer to and from the charge storage region. In order to avoid having the parasitic MOSTs becoming conductive, means are provided by which during operation a small reverse bias is applied to the sources of these parasitic transistors, as a result of which due to the high k factor the threshold voltage of the parasitic transistors increases considerably. This does not require additional logic because use can be made of the generator in the reading circuit, which generates a suitable small voltage.
    • 本发明涉及一种EPROM或EEPROM,其中信息以MOST的信道区域上方的电荷形式存储,结果MOST的阈值电压由存储的信息确定。 存储器的写入/擦除通常需要高电压以使充电电流通过电荷存储区域中的绝缘层流过绝缘层。 为了避免使寄生MOST变得导通,提供了在操作期间向这些寄生晶体管的源极施加小的反向偏压的装置,其结果是由于高k因子,寄生晶体管的阈值电压 大大增加 这不需要额外的逻辑,因为可以在读取电路中使用发生器,从而产生合适的小电压。
    • 7. 发明授权
    • Non-volatile, programmable semiconductor memory having reduced testing
time
    • 非易失性,可编程半导体存储器具有缩短的测试时间
    • US4862418A
    • 1989-08-29
    • US266346
    • 1988-11-01
    • Roger CuppensJoannes J. M. Koomen
    • Roger CuppensJoannes J. M. Koomen
    • H01L27/10G11C16/04G11C17/00G11C29/00G11C29/24
    • G11C29/24
    • In programmable memories of the EPROM or EEPROM type, a row and/or column of test memory cells are added to the matrix of rows and columns of non-volatile memory cells for the testing of the peripheral circuits which select and read the memory cells. The test memory cells have a very short write time as compared with the non-volatile memory cells and may be of the dynamic (or volatile) type. The write time for a memory cell of the EPROM or EEPROM may be, for example, 10 msec. The write time for a dynamic memory cell, however, is 100 nsec. The time required for testing the peripheral circuits can therefore be reduced by a factor of 80 (for a 16 Kbit memory) or higher (for memories larger than 16 Kbits).
    • 在EPROM或EEPROM类型的可编程存储器中,测试存储器单元的行和/或列被添加到非易失性存储单元的行和列的矩阵中,用于测试选择和读取存储单元的外围电路。 测试存储单元与非易失性存储单元相比具有非常短的写入时间,并且可以是动态(或易失性)类型。 EPROM或EEPROM的存储单元的写入时间可以是例如10毫秒。 然而,动态存储单元的写入时间为100ns。 因此,测试外围电路所需的时间可以降低80倍(对于16 Kbit存储器)或更高(对于大于16 Kbits的存储器)。
    • 10. 发明授权
    • Semiconductor device having a non-volatile memory and method of
manufacturing such a semiconductor device
    • 具有非易失性存储器的半导体器件和制造这种半导体器件的方法
    • US5895950A
    • 1999-04-20
    • US838247
    • 1997-04-17
    • Andrew J. WalkerRoger CuppensAlwin N. Kronert
    • Andrew J. WalkerRoger CuppensAlwin N. Kronert
    • H01L21/8247G11C16/16H01L27/105H01L27/115H01L29/788H01L29/792
    • H01L29/7885G11C16/16H01L27/105H01L27/11526
    • The invention relates to a non-volatile memory with floating gate, in particular a Flash-EPROM, in which writing takes place through injection of hot electrons into the floating gate and in which erasing takes place through injection of hot holes. To keep the write and erase voltages sufficiently low, p-type zones which locally increase the background doping concentration of the p-type substrate are provided around the n-type source and drain zones. These p-type zones cause an increased field strength at the drain zone whereby hot electrons are formed at the pinch-off point also at lower voltages. This increased background concentration in addition reduces the breakdown voltage of the pn junction of the source and drain zones, so that hot holes for erasing can be formed by pn breakdown at comparatively low voltages. The device is particularly suitable for being integrated into a signal processing IC manufactured in a standard process, such as a microcontroller.
    • 本发明涉及一种具有浮动栅极,特别是闪存EPROM的非易失性存储器,其中通过将热电子注入到浮动栅极中进行写入,并且其中通过注入热孔进行擦除。 为了保持写入和擦除电压足够低,在n型源极和漏极区域周围设置有局部增加p型衬底的背景掺杂浓度的p型区域。 这些p型区域在漏极区域引起增加的场强,从而也在较低电压下在夹断点处形成热电子。 此外,这种增加的背景浓度还降低了源区和漏区的pn结的击穿电压,从而可以通过在较低电压下的pn击穿来形成用于擦除的热孔。 该器件特别适合于集成到诸如微控制器的标准处理中制造的信号处理IC中。