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    • 1. 发明申请
    • Low-noise semiconductor photodetectors
    • 低噪声半导体光电探测器
    • US20080128849A1
    • 2008-06-05
    • US11978276
    • 2007-10-29
    • Conor S. RaffertyClifford A. King
    • Conor S. RaffertyClifford A. King
    • H01L31/0352H01L21/331
    • H01L31/0352H01L27/14649H01L31/03529H01L31/101H01L2924/0002Y02E10/50H01L2924/00
    • A photodetector is formed from a body of semiconductor material substantially surrounded by dielectric surfaces. A passivation process is applied to at least one surface to reduce the rate of carrier generation and recombination on that surface. Photocurrent is read out from at least one electrical contact, which is formed on a doped region whose surface lies entirely on a passivated surface. Unwanted leakage current from un-passivated surfaces is reduced through one of the following methods. (a) The un-passivated surface is separated from the photo-collecting contact by at least two junctions (b) The un-passivated surface is doped to a very high level, at least equal to the conduction band or valence band density of states of the semiconductor (c) An accumulation or inversion layer is formed on the un-passivated surface by the application of an electric field. Electrical contacts are made to all doped regions, and bias is applied so that a reverse bias is maintained across all junctions.
    • 光电检测器由基本上被电介质表面包围的半导体材料体形成。 钝化过程被应用于至少一个表面以降低载体在该表面上的产生和重组的速率。 从至少一个电触点读出光电流,该电触点形成在其表面完全位于钝化表面上的掺杂区域上。 通过以下方法之一减少未钝化表面的不需要的泄漏电流。 (a)未钝化的表面通过至少两个结与光电收集接触分离(b)未钝化的表面被掺杂到非常高的水平,至少等于状态的导带或价带密度 的半导体(c)通过施加电场在未钝化的表面上形成堆积或反转层。 对所有掺杂区域进行电触点,并且施加偏压,使得跨所有接合部保持反向偏压。
    • 4. 发明授权
    • Low-noise semiconductor photodetectors
    • 低噪声半导体光电探测器
    • US08766393B2
    • 2014-07-01
    • US13230715
    • 2011-09-12
    • Conor S. RaffertyClifford A. King
    • Conor S. RaffertyClifford A. King
    • H01L31/00H01L31/06H01L31/102
    • H01L31/0352H01L27/14649H01L31/03529H01L31/101H01L2924/0002Y02E10/50H01L2924/00
    • A photodetector is formed from a body of semiconductor material substantially surrounded by dielectric surfaces. A passivation process is applied to at least one surface to reduce the rate of carrier generation and recombination on that surface. Photocurrent is read out from at least one electrical contact, which is formed on a doped region whose surface lies entirely on a passivated surface. Unwanted leakage current from un-passivated surfaces is reduced through one of the following methods: (a) The un-passivated surface is separated from the photo-collecting contact by at least two junctions; (b) The un-passivated surface is doped to a very high level, at least equal to the conduction band or valence band density of states of the semiconductor; (c) An accumulation or inversion layer is formed on the un-passivated surface by the application of an electric field.
    • 光电检测器由基本上被电介质表面包围的半导体材料体形成。 钝化过程被应用于至少一个表面以降低载体在该表面上的产生和重组的速率。 从至少一个电触点读出光电流,该电触点形成在其表面完全位于钝化表面上的掺杂区域上。 通过以下方法之一减少未钝化表面的不需要的泄漏电流:(a)未钝化的表面通过至少两个接头与光电收集触点分离; (b)未钝化的表面被掺杂到非常高的水平,至少等于半导体状态的导带或价带密度; (c)通过施加电场在未钝化的表面上形成堆积或反转层。
    • 10. 发明授权
    • Image sensor comprising isolated germanium photodetectors integrated with a silicon substrate and silicon circuitry
    • 图像传感器包括与硅衬底和硅电路集成的孤立的锗光电探测器
    • US07973377B2
    • 2011-07-05
    • US12271601
    • 2008-11-14
    • Clifford A. KingConor S. Rafferty
    • Clifford A. KingConor S. Rafferty
    • H01L27/14H01L31/00H01L31/0232H01L29/82H01L29/84
    • H01L27/14634H01L21/02381H01L21/02532H01L21/02639H01L27/14632H01L27/14643H01L27/14649H01L31/028H01L2924/351
    • In accordance with the invention, an improved image sensor comprises an array of germanium photosensitive elements integrated with a silicon substrate and integrated with silicon readout circuits. The silicon transistors are formed first on a silicon substrate, using well known silicon wafer fabrication techniques. The germanium elements are subsequently formed overlying the silicon by epitaxial growth. The germanium elements are advantageously grown within surface openings of a dielectric cladding. Wafer fabrication techniques are applied to the elements to form isolated germanium photodiodes. Since temperatures needed for germanium processing are lower than those for silicon processing, the formation of the germanium devices need not affect the previously formed silicon devices. Insulating and metallic layers are then deposited and patterned to interconnect the silicon devices and to connect the germanium devices to the silicon circuits. The germanium elements are thus integrated to the silicon by epitaxial growth and integrated to the silicon circuitry by common metal layers.
    • 根据本发明,改进的图像传感器包括与硅衬底集成并与硅读出电路集成的锗感光元件的阵列。 首先使用公知的硅晶片制造技术在硅衬底上形成硅晶体管。 随后通过外延生长将锗元素覆盖在硅上。 有利地,锗元素在电介质包层的表面开口内生长。 将晶片制造技术应用于元件以形成分离的锗光电二极管。 由于锗处理所需的温度低于硅处理所需的温度,锗器件的形成不必影响先前形成的硅器件。 然后沉积和图案化绝缘和金属层以互连硅器件并将锗器件连接到硅电路。 因此,锗元素通过外延生长与硅集成到一起,并通过公共金属层与硅电路集成。