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1. 发明授权

US07156111B2 Megasonic cleaning using supersaturated cleaning solution 有权
标题翻译：超声波清洗使用过饱和清洗液
公开(公告)号：US07156111B2
公开(公告)日：2007-01-02
申请号：US10864929
申请日：2004-06-10
申请人： Cole S. Franklin , Yi Wu , Brian Fraser
发明人： Cole S. Franklin , Yi Wu , Brian Fraser
IPC分类号： B08B3/00
CPC分类号： B08B3/12 , H01L21/67051 , Y10S438/906
摘要： A method and system for the megasonic cleaning of one or more substrates that reduces damage to the substrate(s) resulting from the megasonic energy. The substrates are supported in a process chamber and contacted with a cleaning solution comprising a cleaning liquid having carbon dioxide gas dissolved in the cleaning liquid in such amounts that the carbon dioxide gas is at a supersaturated concentration for the conditions within the process chamber. Megasonic energy is then transmitted to the substrate. The cleaning solution provides protection from damage resulting from the application of megasonic/acoustical energy. In another aspect, the invention is a system for carrying out the method. The invention is not limited to carbon dioxide but can be used in conjunction with any gas that, when so dissolved in a cleaning liquid, protects substrates from being damaged by the application of megasonic/acoustical energy.
摘要翻译：用于超声波清洗一个或多个基板的方法和系统，其减少由兆声波能量引起的对基板的损坏。基板被支撑在处理室中，并与包括清洁液体的清洁溶液接触，所述清洗溶液具有溶解在清洗液中的二氧化碳气体，其量使二氧化碳气体处于处理室内的条件的过饱和浓度。然后将兆声波能量传输到基板。清洁液可以防止因应用超声波/声能造成的损坏。另一方面，本发明是一种执行该方法的系统。本发明不限于二氧化碳，而是可以与任何气体一起使用，当这些气体溶解在清洁液体中时，可以保护基材免受应用兆声/声能的损害。

2. 发明授权

US07578302B2 Megasonic cleaning using supersaturated solution 有权
标题翻译：超声波清洗使用过饱和溶液
公开(公告)号：US07578302B2
公开(公告)日：2009-08-25
申请号：US11595029
申请日：2006-11-09
申请人： Cole S. Franklin , Yi Wu , Brian Fraser
发明人： Cole S. Franklin , Yi Wu , Brian Fraser
IPC分类号： B08B3/00
CPC分类号： B08B3/12 , H01L21/67051 , Y10S438/906
摘要： A method and system for the megasonic cleaning of one or more substrates that reduces damage to the substrate(s) resulting from the megasonic energy. The substrates are supported in a process chamber and contacted with a cleaning solution comprising a cleaning liquid having carbon dioxide gas dissolved in the cleaning liquid in such amounts that the carbon dioxide gas is at a supersaturated concentration for the conditions within the process chamber. Megasonic energy is then transmitted to the substrate. The cleaning solution provides protection from damage resulting from the application of megasonic/acoustical energy. The invention is not limited to carbon dioxide but can be used in conjunction with any gas that, when so dissolved in a cleaning liquid, protects substrates from being damaged by the application of megasonic/acoustical energy.
摘要翻译：用于超声波清洗一个或多个基板的方法和系统，其减少由兆声波能量引起的对基板的损坏。基板被支撑在处理室中，并与包括清洁液体的清洁溶液接触，所述清洗溶液具有溶解在清洗液中的二氧化碳气体，其量使二氧化碳气体处于处理室内的条件的过饱和浓度。然后将兆声波能量传输到基板。清洁液可以防止因应用超声波/声能造成的损坏。本发明不限于二氧化碳，而是可以与任何气体一起使用，当这些气体溶解在清洁液体中时，可以保护基材免受应用兆声/声能的损害。

3. 发明授权

US07104268B2 Megasonic cleaning system with buffered cavitation method 有权
标题翻译：具有缓冲空化法的超声波清洗系统
公开(公告)号：US07104268B2
公开(公告)日：2006-09-12
申请号：US10341425
申请日：2003-01-10
申请人： Yi Wu , Cole S. Franklin , Brian Fraser , Thomas Nicolosi
发明人： Yi Wu , Cole S. Franklin , Brian Fraser , Thomas Nicolosi
IPC分类号： B08B6/00
CPC分类号： B08B3/12 , Y10S438/906
摘要： A wafer cleaning method and system including a combined high frequency signal, a low frequency signal, and in one embodiment a biased voltage signal, allows cleaning particles and impurities off of fine-structured wafers, through application of an acoustic field to the wafer through a cleaning liquid which fosters micro-bubble formation for effective cleaning while buffering micro-bubble growth which would otherwise damage the wafer.
摘要翻译：一种晶片清洗方法和系统，包括组合的高频信号，低频信号，在一个实施例中为偏置电压信号，允许通过将声场施加到晶片通过一个清洁液体，其促进微气泡形成以有效清洁，同时缓冲微气泡生长，否则会损坏晶片。

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