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1. 发明授权

US08034517B2 Color filter and manufacturing method thereof 有权
标题翻译：滤色器及其制造方法
公开(公告)号：US08034517B2
公开(公告)日：2011-10-11
申请号：US11933421
申请日：2007-11-01
申请人： Chun-Chieh Tsao , Shu-Chin Lee , Hsiang-Lin Lin
发明人： Chun-Chieh Tsao , Shu-Chin Lee , Hsiang-Lin Lin
IPC分类号： G02B5/20 , G03F1/00
CPC分类号： G02B5/201 , G02B5/223 , G02F1/133516
摘要： A manufacturing method of a color filter comprising the following steps is provided. At first, a transparent substrate is provided. Next, a black matrix is formed on the transparent substrate to define a plurality of pixel areas on the transparent substrate. Then, an isolation layer is formed and patterned on the black matrix and then Red/Green/Blue color filter inks are filled into each of the pixel areas separately by inkjet printing. After that, the color filter inks are dried to form color filter units and optionally the isolation layer can further be patterned to form plenty of photo spacers on the black matrix. The isolation layers prevented the color filter inks from spilling out of the pixel areas and color mixing problems during color filter inkjet fabrication. Besides, it is characterized that the color filter units can be formed with even thickness.
摘要翻译：提供了一种包括以下步骤的滤色器的制造方法。首先，提供透明基板。接下来，在透明基板上形成黑矩阵，以在透明基板上限定多个像素区域。然后，在黑矩阵上形成并图案化隔离层，然后通过喷墨打印将红/绿/蓝滤色器墨水分别填充到每个像素区域中。之后，将滤色器油墨干燥以形成滤色器单元，并且任选地隔离层可进一步图案化以在黑色矩阵上形成大量的光隔离物。隔离层防止滤色器墨水在滤色器喷墨制造期间溢出像素区域和混色问题。此外，其特征在于可以形成均匀厚度的滤色器单元。

2. 发明申请

US20080158703A1 COLOR FILTER AND MANUFACTURING METHOD THEREOF 有权
标题翻译：彩色滤光片及其制造方法
公开(公告)号：US20080158703A1
公开(公告)日：2008-07-03
申请号：US11933421
申请日：2007-11-01
申请人： Chun-Chieh Tsao , Shu-Chin Lee , Hsiang-Lin Lin
发明人： Chun-Chieh Tsao , Shu-Chin Lee , Hsiang-Lin Lin
IPC分类号： G02B5/20 , G03F1/00
CPC分类号： G02B5/201 , G02B5/223 , G02F1/133516
摘要： A manufacturing method of a color filter comprising the following steps is provided. At first, a transparent substrate is provided. Next, a black matrix is formed on the transparent substrate to define a plurality of pixel areas on the transparent substrate. Then, an isolation layer is formed and patterned on the black matrix and then Red/Green/Blue color filter inks are filled into each of the pixel areas separately by inkjet printing. After that, the color filter inks are dried to form color filter units and optionally the isolation layer can further be patterned to form plenty of photo spacers on the black matrix. The isolation layers prevented the color filter inks from spilling out of the pixel areas and color mixing problems during color filter inkjet fabrication. Besides, it is characterized that the color filter units can be formed with even thickness.
摘要翻译：提供了一种包括以下步骤的滤色器的制造方法。首先，提供透明基板。接下来，在透明基板上形成黑矩阵，以在透明基板上限定多个像素区域。然后，在黑矩阵上形成并图案化隔离层，然后通过喷墨打印将红/绿/蓝滤色器墨水分别填充到每个像素区域中。之后，将滤色器油墨干燥以形成滤色器单元，并且任选地隔离层可进一步图案化以在黑色矩阵上形成大量的光隔离物。隔离层防止滤色器墨水在滤色器喷墨制造期间溢出像素区域和混色问题。此外，其特征在于可以形成均匀厚度的滤色器单元。

3. 发明授权

US07713797B2 Pixel structure and manufacturing method thereof 有权
标题翻译：像素结构及其制造方法
公开(公告)号：US07713797B2
公开(公告)日：2010-05-11
申请号：US12177882
申请日：2008-07-23
申请人： Hsiang-Lin Lin , Chun-Chieh Tsao
发明人： Hsiang-Lin Lin , Chun-Chieh Tsao
IPC分类号： H01L21/00 , H01L21/84
CPC分类号： G02F1/133555 , G02F1/136227 , H01L27/124 , H01L27/1248
摘要： A pixel structure including a gate, a gate dielectric layer, a patterned semiconductor layer having a channel area disposed above the gate, a patterned dielectric layer having an etching-stop layer disposed above the gate and a number of bumps, a patterned metal layer having a reflective pixel electrode, a source and a drain, an overcoat dielectric layer, and a transparent pixel electrode sequentially disposed on a substrate is provided. The source and the drain respectively cover portions of the channel area. The reflective pixel electrode connects the drain and covers the bumps to form an uneven surface. The overcoat dielectric layer disposed on a transistor constituted by the gate, the gate dielectric layer, the patterned semiconductor layer, the source and the drain has a contact opening exposing a portion of the reflective pixel electrode. The transparent pixel electrode is electrically connected to the reflective pixel electrode through the contact opening.
摘要翻译：一种像素结构，包括栅极，栅极电介质层，具有设置在栅极上方的沟道区域的图案化半导体层，具有设置在栅极上方的蚀刻停止层和多个凸起的图案化电介质层，具有提供反射像素电极，源极和漏极，外涂层电介质层和顺序地设置在基板上的透明像素电极。源极和漏极分别覆盖沟道区域的部分。反射像素电极连接漏极并覆盖凸块以形成不平坦的表面。设置在由栅极，栅极电介质层，图案化半导体层，源极和漏极构成的晶体管上的外涂层电介质层具有暴露反射像素电极的一部分的接触开口。透明像素电极通过接触开口电连接到反射像素电极。

4. 发明申请

US20080199638A1 Method for producing reflective layers in LCD display 有权
标题翻译： LCD显示屏反射层制作方法
公开(公告)号：US20080199638A1
公开(公告)日：2008-08-21
申请号：US11707577
申请日：2007-02-15
申请人： Hsiang-Lin Lin , Chun-Chieh Tsao
发明人： Hsiang-Lin Lin , Chun-Chieh Tsao
IPC分类号： C09K19/02 , G03F1/00
CPC分类号： G03F7/40 , G02F1/133504 , G02F1/133555 , G02F2201/123 , G03F7/0007 , H01R13/6675 , H02J7/0068 , Y10T307/625 , Y10T428/1068
摘要： A method for producing a light reflecting structure in a transflective or reflective liquid crystal display uses one or two masks for masking a photoresist layer in a back-side exposing process. The pattern on the masks is designed to produce rod-like structures or crevices and holes on exposed and developed photoresist layer. After the exposed photoresist is developed, a heat treatment process or a UV curing process is used to soften the photoresist layer so that the reshaped surface is more or less contiguous but uneven. A reflective coating is then deposited on the uneven surface. One or more intermediate layers can be made between the masks, between the lower mask and the substrate, and between the upper masks and the photoresist layers. The masks and the intermediate layers can be made in conjunction with the fabrication of the liquid crystal display panel.
摘要翻译：在半反射或反射型液晶显示器中制造光反射结构的方法使用一个或两个掩模来掩模背面曝光工艺中的光致抗蚀剂层。掩模上的图案被设计成在曝光和显影的光致抗蚀剂层上产生棒状结构或缝隙和孔。曝光的光致抗蚀剂显影后，使用热处理工艺或UV固化工艺来软化光致抗蚀剂层，使得整形表面或多或少地连续但不均匀。然后将反射涂层沉积在不平坦表面上。可以在掩模之间，下掩模和基板之间以及上掩模和光致抗蚀剂层之间形成一个或多个中间层。掩模和中间层可以与液晶显示面板的制造相结合。

5. 发明授权

US08059234B2 Color filter and black matrix thereof 有权
标题翻译：彩色滤光片及其黑色矩阵
公开(公告)号：US08059234B2
公开(公告)日：2011-11-15
申请号：US12017176
申请日：2008-01-21
申请人： Chun-Chieh Tsao , Hsiang-Lin Lin
发明人： Chun-Chieh Tsao , Hsiang-Lin Lin
IPC分类号： G02F1/1335
CPC分类号： G02F1/133516 , G02F1/133512
摘要： A color filter and a black matrix thereof are provided. The black matrix disposed on the substrate comprises a frame that defines a pixel area for accommodating color filter inks when performing the ink-jet process, and a spacer disposed in each of the pixels for preventing inks from overflowing to adjacent pixel areas and improving the flatness of the formed color filter layer.
摘要翻译：提供滤色器及其黑矩阵。设置在基板上的黑色矩阵包括框架，该框架在执行喷墨处理时限定用于容纳滤色器墨水的像素区域，以及设置在每个像素中的间隔物，用于防止墨水溢出到相邻像素区域并提高平坦度形成的滤色器层。

6. 发明授权

US07855382B2 Pixel structure 有权
标题翻译：像素结构
公开(公告)号：US07855382B2
公开(公告)日：2010-12-21
申请号：US12725458
申请日：2010-03-17
申请人： Hsiang-Lin Lin , Chun-Chieh Tsao
发明人： Hsiang-Lin Lin , Chun-Chieh Tsao
IPC分类号： H01L29/04 , H01L31/036 , H01L31/0376 , H01L31/20
CPC分类号： G02F1/133555 , G02F1/136227 , H01L27/124 , H01L27/1248
摘要： A pixel structure including a gate, a gate dielectric layer, a patterned semiconductor layer having a channel area disposed above the gate, a patterned dielectric layer having an etching-stop layer disposed above the gate and a number of bumps, a patterned metal layer having a reflective pixel electrode, a source and a drain, an overcoat dielectric layer, and a transparent pixel electrode sequentially disposed on a substrate is provided. The source and the drain respectively cover portions of the channel area. The reflective pixel electrode connects the drain and covers the bumps to form an uneven surface. The overcoat dielectric layer disposed on a transistor constituted by the gate, the gate dielectric layer, the patterned semiconductor layer, the source and the drain has a contact opening exposing a portion of the reflective pixel electrode. The transparent pixel electrode is electrically connected to the reflective pixel electrode through the contact opening.
摘要翻译：一种像素结构，包括栅极，栅极电介质层，具有设置在栅极上方的沟道区域的图案化半导体层，具有设置在栅极上方的蚀刻停止层和多个凸起的图案化电介质层，具有提供反射像素电极，源极和漏极，外涂层电介质层和顺序地设置在基板上的透明像素电极。源极和漏极分别覆盖沟道区域的部分。反射像素电极连接漏极并覆盖凸块以形成不平坦的表面。设置在由栅极，栅极电介质层，图案化半导体层，源极和漏极构成的晶体管上的外涂层电介质层具有暴露反射像素电极的一部分的接触开口。透明像素电极通过接触开口电连接到反射像素电极。

7. 发明申请

US20090086352A1 COLOR FILTER STRUCTURE AND METHOD OF MAKING THE SAME 审中-公开
标题翻译：彩色滤光片结构及其制作方法
公开(公告)号：US20090086352A1
公开(公告)日：2009-04-02
申请号：US12135215
申请日：2008-06-09
申请人： Chun-Chieh Tsao , Hsiang-Lin Lin
发明人： Chun-Chieh Tsao , Hsiang-Lin Lin
IPC分类号： G02B5/20 , G02B1/10
CPC分类号： G02B5/201 , G02B5/223
摘要： A color filter structure includes a plurality of hydrophobic light-shielding rows for a black matrix, and a color filter layer. Each hydrophobic light-shielding row has a plurality of light-shielding structures that have an individual space for accommodating the color filter layer and are arranged in series. In addition, each individual space of the light-shielding structures is closed, and this light-shielding structure involves at least one hydrophobic valve so as to provide a hydrophobic force.
摘要翻译：滤色器结构包括用于黑矩阵的多个疏水性遮光行和滤色器层。每个疏水性遮光行具有多个遮光结构，其具有用于容纳滤色器层的单独空间并串联布置。此外，遮光结构的每个单独的空间是封闭的，并且该遮光结构涉及至少一个疏水阀以提供疏水力。

8. 发明申请

US20080231778A1 Color Filter and Black Matrix Thereof 有权
标题翻译：彩色滤镜和黑色矩阵
公开(公告)号：US20080231778A1
公开(公告)日：2008-09-25
申请号：US12017176
申请日：2008-01-21
申请人： Chun-Chieh Tsao , Hsiang-Lin Lin
发明人： Chun-Chieh Tsao , Hsiang-Lin Lin
IPC分类号： G02F1/1339 , G02F1/1335
CPC分类号： G02F1/133516 , G02F1/133512
摘要： A color filter and a black matrix thereof are provided. The black matrix disposed on the substrate comprises a frame that defines a pixel area for accommodating color filter inks when performing the ink-jet process, and a spacer disposed in each of the pixels for preventing inks from overflowing to adjacent pixel areas and improving the flatness of the formed color filter layer.
摘要翻译：提供滤色器及其黑矩阵。设置在基板上的黑色矩阵包括框架，该框架在执行喷墨处理时限定用于容纳滤色器墨水的像素区域，以及设置在每个像素中的间隔物，用于防止墨水溢出到相邻像素区域并提高平坦度形成的滤色器层。

9. 发明授权

US08059236B2 Method for producing reflective layers in LCD display 有权
标题翻译： LCD显示屏反射层制作方法
公开(公告)号：US08059236B2
公开(公告)日：2011-11-15
申请号：US11707577
申请日：2007-02-15
申请人： Hsiang-Lin Lin , Chun-Chieh Tsao
发明人： Hsiang-Lin Lin , Chun-Chieh Tsao
IPC分类号： G02F1/1335 , G02F1/1333
CPC分类号： G03F7/40 , G02F1/133504 , G02F1/133555 , G02F2201/123 , G03F7/0007 , H01R13/6675 , H02J7/0068 , Y10T307/625 , Y10T428/1068
摘要： A method for producing a light reflecting structure in a transflective or reflective liquid crystal display uses one or two masks for masking a photoresist layer in a back-side exposing process. The pattern on the masks is designed to produce rod-like structures or crevices and holes on exposed and developed photoresist layer. After the exposed photoresist is developed, a heat treatment process or a UV curing process is used to soften the photoresist layer so that the reshaped surface is more or less contiguous but uneven. A reflective coating is then deposited on the uneven surface. One or more intermediate layers can be made between the masks, between the lower mask and the substrate, and between the upper masks and the photoresist layers. The masks and the intermediate layers can be made in conjunction with the fabrication of the liquid crystal display panel.
摘要翻译：在半反射或反射型液晶显示器中制造光反射结构的方法使用一个或两个掩模来掩模背面曝光工艺中的光致抗蚀剂层。掩模上的图案被设计成在曝光和显影的光致抗蚀剂层上产生棒状结构或缝隙和孔。曝光的光致抗蚀剂显影后，使用热处理工艺或UV固化工艺来软化光致抗蚀剂层，使得整形表面或多或少地连续但不均匀。然后将反射涂层沉积在不平坦表面上。可以在掩模之间，下掩模和基板之间以及上掩模和光致抗蚀剂层之间形成一个或多个中间层。掩模和中间层可以与液晶显示面板的制造相结合。

10. 发明授权

US08488086B2 Light reflecting structure in a liquid crystal display panel 有权
标题翻译：液晶显示面板中的反光结构
公开(公告)号：US08488086B2
公开(公告)日：2013-07-16
申请号：US13136511
申请日：2011-08-02
申请人： Hsiang-Lin Lin , Chun-Chieh Tsao
发明人： Hsiang-Lin Lin , Chun-Chieh Tsao
IPC分类号： G02F1/1335
CPC分类号： G03F7/40 , G02F1/133504 , G02F1/133555 , G02F2201/123 , G03F7/0007 , H01R13/6675 , H02J7/0068 , Y10T307/625 , Y10T428/1068
摘要： A method for producing a light reflecting structure in a transflective or reflective liquid crystal display uses one or two masks for masking a photoresist layer in a back-side exposing process. The pattern on the masks is designed to produce rod-like structures or crevices and holes on exposed and developed photoresist layer. After the exposed photoresist is developed, a heat treatment process or a UV curing process is used to soften the photoresist layer so that the reshaped surface is more or less contiguous but uneven. A reflective coating is then deposited on the uneven surface. One or more intermediate layers can be made between the masks, between the lower mask and the substrate, and between the upper masks and the photoresist layers. The masks and the intermediate layers can be made in conjunction with the fabrication of the liquid crystal display panel.
摘要翻译：在半反射或反射型液晶显示器中制造光反射结构的方法使用一个或两个掩模来掩模背面曝光工艺中的光致抗蚀剂层。掩模上的图案被设计成在曝光和显影的光致抗蚀剂层上产生棒状结构或缝隙和孔。曝光的光致抗蚀剂显影后，使用热处理工艺或UV固化工艺来软化光致抗蚀剂层，使得整形表面或多或少地连续但不均匀。然后将反射涂层沉积在不平坦表面上。可以在掩模之间，下掩模和基板之间以及上掩模和光致抗蚀剂层之间形成一个或多个中间层。掩模和中间层可以与液晶显示面板的制造相结合。

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