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    • 4. 发明申请
    • NANOPOROUS MEMBRANE
    • 纳米膜
    • US20130306549A1
    • 2013-11-21
    • US13949082
    • 2013-07-23
    • Joseph W. TringeRodney L. BalhornSaleem Zaidi
    • Joseph W. TringeRodney L. BalhornSaleem Zaidi
    • B01D71/02B01D67/00
    • B01D71/027B01D67/0058B01D67/0062B01D69/02B01D71/02B01D2323/24B01D2325/021B82Y30/00B82Y40/00
    • A nano porous membrane having a uniform array of nanopores etch-formed in a thin film structure (e.g. (100)-oriented single crystal silicon) having a predetermined thickness, by (a) using interferometric lithography to create an etch pattern comprising a plurality array of unit patterns having a predetermined width/diameter, (b) using the etch pattern to etch frustum-shaped cavities or pits in the thin film structure such that the dimension of the frustum floors of the cavities are substantially equal to a desired pore size based on the predetermined thickness of the thin film structure and the predetermined width/diameter of the unit patterns, and (c) removing the frustum floors at a boundary plane of the thin film structure to expose, open, and thereby create the nanopores substantially having the desired pore size.
    • 一种具有预定厚度的薄膜结构(例如(100)取向的单晶硅)中蚀刻形成的纳米孔的均匀阵列的纳米多孔膜,通过(a)使用干涉光刻技术产生包括多个阵列的蚀刻图案 具有预定宽度/直径的单元图案,(b)使用蚀刻图案来蚀刻薄膜结构中的截头锥形空腔或凹坑,使得空腔的截头锥形地板的尺寸基本上等于基于期望的孔径尺寸 在薄膜结构的预定厚度和单位图案的预定宽度/直径上,以及(c)在薄膜结构的边界平面处去除截头锥形地板以暴露,打开,从而产生基本上具有 所需的孔径。
    • 7. 发明授权
    • Method of fabricating a scalable nanoporous membrane filter
    • 制造可扩展纳米多孔膜过滤器的方法
    • US08512588B2
    • 2013-08-20
    • US12856527
    • 2010-08-13
    • Joseph W. TringeRodney L. BalhornSaleem Zaidi
    • Joseph W. TringeRodney L. BalhornSaleem Zaidi
    • B44C1/22
    • B01D71/027B01D67/0058B01D67/0062B01D69/02B01D71/02B01D2323/24B01D2325/021B82Y30/00B82Y40/00
    • A method of fabricating a nanoporous membrane filter having a uniform array of nanopores etch-formed in a thin film structure (e.g. (100)-oriented single crystal silicon) having a predetermined thickness, by (a) using interferometric lithography to create an etch pattern comprising a plurality array of unit patterns having a predetermined width/diameter, (b) using the etch pattern to etch frustum-shaped cavities or pits in the thin film structure such that the dimension of the frustum floors of the cavities are substantially equal to a desired pore size based on the predetermined thickness of the thin film structure and the predetermined width/diameter of the unit patterns, and (c) removing the frustum floors at a boundary plane of the thin film structure to expose, open, and thereby create the nanopores substantially having the desired pore size.
    • 一种通过(a)使用干涉光刻技术制造具有预定厚度的薄膜结构(例如(100)取向的单晶硅)中蚀刻形成的纳米孔的均匀阵列的纳米多孔膜滤光片的方法,以产生蚀刻图案 包括具有预定宽度/直径的多个单元图案阵列,(b)使用蚀刻图案蚀刻薄膜结构中的截头锥形腔或凹坑,使得空腔的截头锥形地板的尺寸基本上等于 基于薄膜结构的预定厚度和单位图案的预定宽度/直径所需的孔径,以及(c)在薄膜结构的边界平面处去除截头锥形地板以暴露,打开,从而形成 基本上具有所需孔径的纳米孔。