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1. 发明申请

US20080125883A1 Method and apparatus for consolidating process control 审中-公开
标题翻译：整合过程控制的方法和装置
公开(公告)号：US20080125883A1
公开(公告)日：2008-05-29
申请号：US11518230
申请日：2006-09-11
申请人： Christopher Gould , Thomas Fisher , Abeer Singhal
发明人： Christopher Gould , Thomas Fisher , Abeer Singhal
IPC分类号： G05B13/02
CPC分类号： G05B13/0205 , G05B19/41865 , G05B2219/31393 , G05B2219/31395 , G05B2219/45031 , Y02P90/20
摘要： The present invention embodiments consolidate process control for a process including a plurality of control threads each associated with a stage of the process. A plurality of the control threads are analyzed to enable the process control with a reduced quantity of the control threads. Data associated with the plurality of control threads are validated and provided in a desired form. At least one parameter of each of the plurality of control threads is statistically analyzed to form at least one thread group including a plurality of the control threads satisfying the parameter analysis. Each thread group functions as a common thread to enable the process control with a reduced quantity of control threads. The present invention embodiments further include a method and program product apparatus for consolidating the process control.
摘要翻译：本发明实施例整合了包括多个控制线程的过程的过程控制，每个控制线程与过程的一个阶段相关联。分析多个控制线程以使得能够以较少量的控制线程进行过程控制。与多个控制线程相关联的数据被验证并以期望的形式提供。对多个控制线程中的每一个的至少一个参数进行统计分析以形成包括满足参数分析的多个控制线程的至少一个线程组。每个线程组用作公共线程，以使控制线程数量减少的过程控制。本发明实施例还包括用于整合过程控制的方法和程序产品装置。

2. 发明申请

US20090215206A1 System and method for controlling a semiconductor manufacturing process 审中-公开
标题翻译：用于控制半导体制造工艺的系统和方法
公开(公告)号：US20090215206A1
公开(公告)日：2009-08-27
申请号：US12071721
申请日：2008-02-26
申请人： Abeer Singhal , Christopher Gould , William Roberts
发明人： Abeer Singhal , Christopher Gould , William Roberts
IPC分类号： H01L21/66
CPC分类号： H01L22/20
摘要： A semiconductor manufacture and testing device is provided, comprising: a process device configured to perform a semiconductor processing operation on a semiconductor wafer; a testing device configured to perform a testing operation on the semiconductor wafer and generate real-time testing metrics relating to the testing operation; a data storage element configured to store the real-time testing metrics as stored testing metrics; a control and dispatch element configured to receive the stored testing metrics and generate dispatch control signals based on the stored testing metrics and a set of evaluation rules; and a test routing element located between the process element and the testing element, and configured to route the semiconductor wafer either from the process element to the testing element or from the process element around the testing element, based the dispatch control signals.
摘要翻译：提供一种半导体制造和测试装置，包括：处理装置，被配置为对半导体晶片执行半导体处理操作; 被配置为对所述半导体晶片执行测试操作并生成与所述测试操作相关的实时测试指标的测试设备; 数据存储元件，被配置为将所述实时测试度量存储为存储的测试度量; 控制和调度元件，被配置为基于存储的测试指标和一组评估规则接收存储的测试指标并生成调度控制信号; 以及测试路由元件，其位于所述过程元件和所述测试元件之间，并且被配置为基于所述调度控制信号将所述半导体晶片从所述过程元件路由到所述测试元件或者围绕所述测试元件的所述过程元件。

3. 发明申请

US20060265098A1 System and method for real time prediction and/or inheritance of process controller settings in a semiconductor manufacturing facility 审中-公开
标题翻译：用于半导体制造设备中的过程控制器设置的实时预测和/或继承的系统和方法
公开(公告)号：US20060265098A1
公开(公告)日：2006-11-23
申请号：US11132069
申请日：2005-05-18
申请人： Christopher Gould , Abeer Singhal
发明人： Christopher Gould , Abeer Singhal
IPC分类号： G06F19/00
CPC分类号： G05B19/40938 , G05B2219/36254 , Y02P90/265 , Y02P90/86
摘要： The disclosed system and method relates to the prediction of processing tool control parameters, i.e. controller state, for a particular processing tool, which has little or no utilization history, i.e. is data starved or has not gone through the learning curve, for a given process, or has undergone an event for which the current controller state has been reset or is otherwise now sub-optimal. The prediction is based on the processing tool control parameters of a substantially similar processing tool, being used in a substantially similar fashion to the given situation, which has significant utilization history. The processing tool having significant utilization history may be the same processing tool as the processing tool with little or no processing history where a manufacturing event disrupts the operations thereof. In this case, the pre-event control parameters and utilization history may be used, according to the disclosed embodiments, to predict the post-event controller state. Effectively, the disclosed embodiments provide for the processing tool with little or no utilization history to inherit the controller state, i.e. the evolved control parameters, of the processing tool with significant utilization history. Thereby, the processing tool with little or no utilization history is spared having to go through the learning curve, and the associated costs in delay and resources, to arrive at a particular controller state, i.e. the processing tool does not have to go through the iterative process-evaluate-adapt procedure to refine its control parameters to achieve results within the desired specifications.
摘要翻译：所公开的系统和方法涉及对于特定处理工具的处理工具控制参数（即，控制器状态）的预测，对于给定过程，其具有很少或没有利用历史，即数据不足或未经过学习曲线或者已经经历了当前控制器状态已被重置的事件或者现在不合适的事件。该预测基于基本相似的处理工具的处理工具控制参数，以与具有显着利用历史的给定情况基本相似的方式使用。具有显着利用历史的处理工具可以是与处理工具相同的处理工具，其中制造事件中断其操作的很少或没有处理历史。在这种情况下，根据所公开的实施例，可以使用事件前控制参数和利用历史来预测事件后控制器状态。有效地，所公开的实施例为处理工具提供了很少或没有使用历史以继承具有显着利用历史的处理工具的控制器状态，即演化的控制参数。因此，具有很少或没有利用历史的处理工具不得不经历学习曲线以及相关的延迟和资源成本，以达到特定的控制器状态，即处理工具不必经历迭代过程评估适应程序来完善其控制参数，以在期望的规范内实现结果。

4. 发明授权

US07127304B1 System and method to predict the state of a process controller in a semiconductor manufacturing facility 有权
标题翻译：用于预测半导体制造设备中的过程控制器的状态的系统和方法
公开(公告)号：US07127304B1
公开(公告)日：2006-10-24
申请号：US11131957
申请日：2005-05-18
申请人： Christopher Gould , Abeer Singhal
发明人： Christopher Gould , Abeer Singhal
IPC分类号： G05B11/01
CPC分类号： G05B19/40938 , G05B13/024 , G05B2219/36254 , G05B2219/36273 , G05B2219/36305 , G05B2219/45031 , Y02P90/265 , Y02P90/86
摘要： The disclosed system and method relates to the prediction of processing tool control parameters, i.e. controller state, for a particular processing tool, which has little or no utilization history, i.e. is data starved or has not gone through the learning curve, for a given process, or has undergone an event for which the current controller state has been reset or is otherwise now sub-optimal. The prediction is based on the processing tool control parameters of a substantially similar processing tool, being used in a substantially similar fashion to the given situation, which has significant utilization history. The processing tool having significant utilization history may be the same processing tool as the processing tool with little or no processing history where a manufacturing event disrupts the operations thereof. In this case, the pre-event control parameters and utilization history may be used, according to the disclosed embodiments, to predict the post-event controller state. Effectively, the disclosed embodiments provide for the processing tool with little or no utilization history to inherit the controller state, i.e. the evolved control parameters, of the processing tool with significant utilization history. Thereby, the processing tool with little or no utilization history is spared having to go through the learning curve, and the associated costs in delay and resources, to arrive at a particular controller state, i.e. the processing tool does not have to go through the iterative process-evaluate-adapt procedure to refine its control parameters to achieve results within the desired specifications.
摘要翻译：所公开的系统和方法涉及对于特定处理工具的处理工具控制参数（即，控制器状态）的预测，对于给定过程，其具有很少或没有利用历史，即数据不足或未经过学习曲线或者已经经历了当前控制器状态已被重置的事件或者现在不合适的事件。该预测基于基本相似的处理工具的处理工具控制参数，以与具有显着利用历史的给定情况基本相似的方式使用。具有显着利用历史的处理工具可以是与处理工具相同的处理工具，其中制造事件中断其操作的很少或没有处理历史。在这种情况下，根据所公开的实施例，可以使用事件前控制参数和利用历史来预测事件后控制器状态。有效地，所公开的实施例为处理工具提供了很少或没有使用历史以继承具有显着利用历史的处理工具的控制器状态，即演化的控制参数。因此，具有很少或没有利用历史的处理工具不得不经历学习曲线以及相关的延迟和资源成本，以达到特定的控制器状态，即处理工具不必经历迭代过程评估适应程序来完善其控制参数，以在期望的规范内实现结果。

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