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    • 4. 发明授权
    • Process for the aqueous purification of hydrogen peroxide containing impurities
    • 含有杂质的含水过氧化氢的纯化方法
    • US06296829B1
    • 2001-10-02
    • US09419878
    • 1999-10-15
    • Christine DevosDidier Demay
    • Christine DevosDidier Demay
    • C01B1501
    • C01B15/0135
    • Process for purifying an aqueous hydrogen peroxide solution containing impurities, some of which are in ionic form, in which the said aqueous solution is purified by passing it through at least one first resin of anionic type in order to remove at least some anionic impurities, and then through a second resin of cationic type in order to remove at least some of the cationic impurities, or vice versa, characterized in that at least a first and a second bed of a first resin of anionic type are arranged in parallel, in that the aqueous solution is directed alternately onto the said first or the said second bed, and in that changeover from the first bed to the second bed (or vice versa) is carried out when the said first [lacuna] is at least partially saturated with at least one of the anions constituting the anionic impurities.
    • 用于纯化含有杂质的一些过氧化氢溶液的方法,其中一些是离子形式,其中所述水溶液通过使其通过至少一种阴离子型的第一树脂而被纯化,以除去至少一些阴离子杂质,以及 然后通过阳离子类型的第二树脂以除去至少一些阳离子杂质,或反之亦然,其特征在于,至少第一和第二床阴离子型的第一树脂平行布置,因为其中 水溶液交替地被引导到所述第一床或所述第二床上,并且当所述第一[空隙]至少部分地被至少饱和时进行从第一床到第二床(或反之亦然)的切换 其中一种阴离子构成阴离子杂质。