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1. 发明申请

US20130068719A1 METHOD USING BLOCK COPOLYMERS AND A HARD ELECTROPLATED MASK FOR MAKING A MASTER DISK FOR NANOIMPRINTING PATTERNED MAGNETIC RECORDING DISKS 失效
标题翻译：使用块状共聚物的方法和用于制备用于印制图形磁记录盘的主磁盘的硬电极掩模
公开(公告)号：US20130068719A1
公开(公告)日：2013-03-21
申请号：US13236484
申请日：2011-09-19
申请人： Christian Rene' Bonhote , Jeffrey S. Lille , Ricardo Ruiz , Georges Gibran Siddiqi
发明人： Christian Rene' Bonhote , Jeffrey S. Lille , Ricardo Ruiz , Georges Gibran Siddiqi
IPC分类号： G11B5/84 , C25D5/02 , H01B13/00
CPC分类号： C25D1/20 , C25D1/10 , G11B5/855 , G11B5/858
摘要： A method for making a master disk to be used in the nanoimprinting process to make patterned-media disks uses an electrically conductive substrate and guided self-assembly of a block copolymer to form patterns of generally radial lines and/or generally concentric rings of one of the block copolymer components. A metal is electroplated onto the substrate in the regions not protected by the lines and/or rings. After removal of the block copolymer component, the remaining metal pattern is used as an etch mask to fabricate either the final master disk or two separate molds that are then used to fabricate the master disk.
摘要翻译：一种用于在纳米压印过程中制造母盘以使图案化介质盘使用导电基底并引导嵌段共聚物的自组装以形成大体径向线和/或大致同心环的图案的方法嵌段共聚物组分。在不受线路和/或环保护的区域中，将金属电镀到衬底上。在除去嵌段共聚物组分之后，剩余的金属图案用作蚀刻掩模以制造最终的母盘或两个单独的模具，然后用于制造母盘。

2. 发明授权

US08512583B2 Method using block copolymers and a hard electroplated mask for making a master disk for nanoimprinting patterned magnetic recording disks 失效
标题翻译：使用嵌段共聚物和硬电镀掩模的方法制造用于纳米压印图案化磁记录盘的母盘
公开(公告)号：US08512583B2
公开(公告)日：2013-08-20
申请号：US13236484
申请日：2011-09-19
申请人： Christian Rene′ Bonhote , Jeffrey S. Lille , Ricardo Ruiz , Georges Gibran Siddiqi
发明人： Christian Rene′ Bonhote , Jeffrey S. Lille , Ricardo Ruiz , Georges Gibran Siddiqi
IPC分类号： B44C1/22
CPC分类号： C25D1/20 , C25D1/10 , G11B5/855 , G11B5/858
摘要： A method for making a master disk to be used in the nanoimprinting process to make patterned-media disks uses an electrically conductive substrate and guided self-assembly of a block copolymer to form patterns of generally radial lines and/or generally concentric rings of one of the block copolymer components. A metal is electroplated onto the substrate in the regions not protected by the lines and/or rings. After removal of the block copolymer component, the remaining metal pattern is used as an etch mask to fabricate either the final master disk or two separate molds that are then used to fabricate the master disk.
摘要翻译：一种用于在纳米压印过程中制造母盘以使图案化介质盘使用导电基底并引导嵌段共聚物的自组装以形成大体径向线和/或大致同心环的图案的方法嵌段共聚物组分。在不受线路和/或环保护的区域中，将金属电镀到衬底上。在除去嵌段共聚物组分之后，剩余的金属图案用作蚀刻掩模以制造最终的母盘或两个单独的模具，然后用于制造母盘。

3. 发明授权

US09236260B2 System, method and apparatus for seedless electroplated structure on a semiconductor substrate 有权
标题翻译：半导体衬底上无电解电镀结构的系统，方法和装置
公开(公告)号：US09236260B2
公开(公告)日：2016-01-12
申请号：US13328218
申请日：2011-12-16
申请人： Christian René Bonhôte , Jeffrey S. Lille , Ricardo Ruiz , Georges Gibran Siddiqi
发明人： Christian René Bonhôte , Jeffrey S. Lille , Ricardo Ruiz , Georges Gibran Siddiqi
IPC分类号： H01L21/70 , H01L21/28 , H01L29/66 , H01L29/78 , H01L21/8238
CPC分类号： H01L21/28052 , H01L21/823814 , H01L21/823828 , H01L29/665 , H01L29/78
摘要： An integrated circuit has a doped silicon semiconductor with regions of insulators and bare silicon. The bare silicon regions are isolated from other bare silicon regions. A semiconductor device on the doped silicon semiconductor has at least two electrical connections to form regions of patterned metal. A metal is electroplated directly on each of the regions of patterned metal to form plated connections without a seed layer. A self-aligned silicide is located under each plated connection, formed by annealing, for the regions of plated metal on bare silicon.
摘要翻译：集成电路具有具有绝缘体和裸硅区域的掺杂硅半导体。裸硅区域与其他裸硅区域隔离。掺杂硅半导体上的半导体器件具有至少两个电连接以形成图案化金属的区域。将金属直接电镀在图案化金属的每个区域上，以形成没有种子层的电镀连接。自对准硅化物位于通过退火形成的每个电镀连接处，用于裸硅上的电镀金属区域。

4. 发明申请

US20130154020A1 SYSTEM, METHOD AND APPARATUS FOR SEEDLESS ELECTROPLATED STRUCTURE ON A SEMICONDUCTOR SUBSTRATE 有权
标题翻译：半导体基板上无缝电镀结构的系统，方法和装置
公开(公告)号：US20130154020A1
公开(公告)日：2013-06-20
申请号：US13328218
申请日：2011-12-16
申请人： Christian René Bonhôte , Jeffrey S. Lille , Ricardo Ruiz , Georges Gibran Siddiqi
发明人： Christian René Bonhôte , Jeffrey S. Lille , Ricardo Ruiz , Georges Gibran Siddiqi
IPC分类号： H01L27/092 , H01L21/28
CPC分类号： H01L21/28052 , H01L21/823814 , H01L21/823828 , H01L29/665 , H01L29/78
摘要： An integrated circuit has a doped silicon semiconductor with regions of insulators and bare silicon. The bare silicon regions are isolated from other bare silicon regions. A semiconductor device on the doped silicon semiconductor has at least two electrical connections to form regions of patterned metal. A metal is electroplated directly on each of the regions of patterned metal to form plated connections without a seed layer. A self-aligned silicide is located under each plated connection, formed by annealing, for the regions of plated metal on bare silicon.
摘要翻译：集成电路具有具有绝缘体和裸硅区域的掺杂硅半导体。裸硅区域与其他裸硅区域隔离。掺杂硅半导体上的半导体器件具有至少两个电连接以形成图案化金属的区域。将金属直接电镀在图案化金属的每个区域上，以形成没有种子层的电镀连接。自对准硅化物位于通过退火形成的每个电镀连接处，用于裸硅上的电镀金属区域。

5. 发明授权

US08673161B2 Structure formation using metal deposited on a RIE-able seedlayer 失效
标题翻译：使用沉积在可RIE的种子层上的金属的结构形成
公开(公告)号：US08673161B2
公开(公告)日：2014-03-18
申请号：US12345457
申请日：2008-12-29
申请人： Christian R. Bonhôte , Jeffrey S. Lille , Ricardo Ruiz
发明人： Christian R. Bonhôte , Jeffrey S. Lille , Ricardo Ruiz
IPC分类号： B44C1/22 , B23P15/00 , C03C25/00 , C23F1/00 , G11B5/127 , H04R31/00
CPC分类号： G11B5/3163 , G11B5/1278 , G11B5/3123
摘要： Methods for fabricating a device component are provided. A substrate comprising a RIE stop layer, an oxide layer formed on the RIE stop layer, and a RIE-able layer formed on the oxide layer may be provided. A resist layer may be patterned on the RIE-able layer. A metal layer may be formed on portions of the RIE-able layer that are not covered by the resist layer. The resist layer may be removed and an RIE performed to remove exposed portions of the RIE-able layer and portions of the oxide layer beneath the exposed portions of the RIE-able layer. Thereafter, the metal layer may be removed, and the component may be formed in an opening in the oxide layer formed during the RIE.
摘要翻译：提供了制造器件部件的方法。可以提供包括RIE停止层，形成在RIE停止层上的氧化物层和形成在氧化物层上的RIE能层的衬底。抗蚀剂层可以在RIE能层上图案化。可以在RIE能层的未被抗蚀剂层覆盖的部分上形成金属层。可以去除抗蚀剂层，并且执行RIE以去除RIE能层的暴露部分和在RIE能层的暴露部分下方的氧化物层的部分。此后，可以去除金属层，并且可以在RIE中形成的氧化物层的开口中形成该部件。

6. 发明授权

US09034197B2 Method for separately processing regions on a patterned medium 有权
标题翻译：在图案化介质上单独处理区域的方法
公开(公告)号：US09034197B2
公开(公告)日：2015-05-19
申请号：US13615131
申请日：2012-09-13
申请人： Jeffrey S. Lille , Kurt A. Rubin , Ricardo Ruiz , Lei Wan
发明人： Jeffrey S. Lille , Kurt A. Rubin , Ricardo Ruiz , Lei Wan
IPC分类号： B44C1/22 , G11B5/855 , G11B5/74 , G03F7/00 , B81C1/00 , H01L21/033
CPC分类号： G11B5/855 , B81C1/00031 , G03F7/0035 , G11B5/743 , H01L21/0338 , Y10S977/888
摘要： The disclosure relates generally to a method for fabricating a patterned medium. The method includes providing a substrate with an exterior layer under a lithographically patterned surface layer, the lithographically patterned surface layer comprising a first pattern in a first region and a second pattern in a second region, applying a first masking material over the first region, transferring the second pattern into the exterior layer in the second region, forming self-assembled block copolymer structures over the lithographically patterned surface layer, the self-assembled block copolymer structures aligning with the first pattern in the first region, applying a second masking material over the second region, transferring the polymer block pattern into the exterior layer in the first region, and etching the substrate according to the second pattern transferred to the exterior layer in the second region and the polymer block pattern transferred to the exterior layer in the first region.
摘要翻译：本公开一般涉及一种用于制造图案化介质的方法。该方法包括在光刻图案化的表面层下提供具有外部层的基底，光刻图案化的表面层包括第一区域中的第一图案和第二区域中的第二图案，在第一区域上施加第一掩蔽材料，转移在第二区域中的第二图案进入外层，在光刻图案化表面层上形成自组装的嵌段共聚物结构，自组装嵌段共聚物结构与第一区域中的第一图案对准，在第一区域上施加第二掩模材料第二区域，将聚合物嵌段图案转移到第一区域中的外部层中，并且根据转移到第二区域中的外部层的第二图案和在第一区域中转印到外部层的聚合物嵌段图案来蚀刻基板。

7. 发明申请

US20130126473A1 METHOD USING BLOCK COPOLYMERS FOR MAKING A MASTER DISK WITH RADIAL BINARY ENCODED NONDATA MARKS FOR NANOIMPRINTING PATTERNED MAGNETIC RECORDING DISKS 失效
标题翻译：使用块状共聚物制造具有径向二进制编码非标记标记的主磁盘用于纳米图形磁记录磁盘的方法
公开(公告)号：US20130126473A1
公开(公告)日：2013-05-23
申请号：US13299664
申请日：2011-11-18
申请人： Elizabeth Ann Dobisz , Jeffrey S. Lille , Guoliang Liu , Ricardo Ruiz , Gabriel Zeltzer
发明人： Elizabeth Ann Dobisz , Jeffrey S. Lille , Guoliang Liu , Ricardo Ruiz , Gabriel Zeltzer
IPC分类号： C23F1/02 , B05D3/00 , B05D5/00
CPC分类号： G11B5/746 , B82Y30/00 , G11B5/743 , G11B5/855 , G11B5/86
摘要： A method using directed self-assembly of BCPs enables the making of a master disk for nanoimprinting magnetic recording disks that have patterned data islands and patterned binary encoded nondata marks. The method uses guided self-assembly of a BCP to form patterns of sets of radial lines and circumferential gaps of one of the BCP components, which can be used as an etch mask to make the master disk. The sets of radial lines and circumferential gaps can be patterned so as to encode binary numbers. The pattern is replicated as binary encoded nondata marks into the nanoimprinted disks, with the marks functioning as binary numbers for data sector numbers and/or servo sector numbers. If the disks also use a chevron servo pattern, the binary numbers can function to identify groups of tracks associated with the chevron servo pattern.
摘要翻译：使用BCP的定向自组装的方法使得能够制造具有图案化数据岛和图案化二进制编码非标记的纳米压印磁记录盘的母盘。该方法使用BCP的引导自组装来形成一组BCP组件的径向线和圆周间隙的图案，其可用作蚀刻掩模以制造母盘。径向线和圆周间隙的组可以被图案化以便编码二进制数。该图案作为二进制编码的非标记标记复制到纳米压印盘中，其标记用作数据扇区号和/或伺服扇区号的二进制数。如果磁盘还使用人字形伺服模式，则二进制数字可用于识别与人字形伺服模式相关联的磁道组。

8. 发明申请

US20140072830A1 METHOD FOR SEPARATELY PROCESSING REGIONS ON A PATTERNED MEDIUM 有权
标题翻译：在图形化介质上分离处理区域的方法
公开(公告)号：US20140072830A1
公开(公告)日：2014-03-13
申请号：US13615131
申请日：2012-09-13
申请人： Jeffrey S. Lille , Kurt A. Rubin , Ricardo Ruiz , Lei Wan
发明人： Jeffrey S. Lille , Kurt A. Rubin , Ricardo Ruiz , Lei Wan
IPC分类号： G11B5/84 , G11B5/73 , B44C1/22
CPC分类号： G11B5/855 , B81C1/00031 , G03F7/0035 , G11B5/743 , H01L21/0338 , Y10S977/888
摘要： The disclosure relates generally to a method for fabricating a patterned medium. The method includes providing a substrate with an exterior layer under a lithographically patterned surface layer, the lithographically patterned surface layer comprising a first pattern in a first region and a second pattern in a second region, applying a first masking material over the first region, transferring the second pattern into the exterior layer in the second region, forming self-assembled block copolymer structures over the lithographically patterned surface layer, the self-assembled block copolymer structures aligning with the first pattern in the first region, applying a second masking material over the second region, transferring the polymer block pattern into the exterior layer in the first region, and etching the substrate according to the second pattern transferred to the exterior layer in the second region and the polymer block pattern transferred to the exterior layer in the first region.
摘要翻译：本公开一般涉及一种用于制造图案化介质的方法。该方法包括在光刻图案化的表面层下提供具有外部层的基底，光刻图案化的表面层包括第一区域中的第一图案和第二区域中的第二图案，在第一区域上施加第一掩蔽材料，转移在第二区域中的第二图案进入外层，在光刻图案化表面层上形成自组装的嵌段共聚物结构，自组装嵌段共聚物结构与第一区域中的第一图案对准，在第一区域上施加第二掩模材料第二区域，将聚合物嵌段图案转移到第一区域中的外部层中，并且根据转移到第二区域中的外部层的第二图案和在第一区域中转印到外部层的聚合物嵌段图案来蚀刻基板。

9. 发明申请

US20100163520A1 STRUCTURE FORMATION USING METAL DEPOSITED ON A RIE-ABLE SEEDLAYER 失效
标题翻译：结构形成使用金属沉积在一个独立的SEEDLAYER
公开(公告)号：US20100163520A1
公开(公告)日：2010-07-01
申请号：US12345457
申请日：2008-12-29
申请人： Christian R. Bonhote , Jeffrey S. Lille , Ricardo Ruiz
发明人： Christian R. Bonhote , Jeffrey S. Lille , Ricardo Ruiz
IPC分类号： B44C1/22 , B05D5/12
CPC分类号： G11B5/3163 , G11B5/1278 , G11B5/3123
摘要： Methods for fabricating a device component are provided. A substrate comprising a RIE stop layer, an oxide layer formed on the RIE stop layer, and a RIE-able layer formed on the oxide layer may be provided. A resist layer may be patterned on the RIE-able layer. A metal layer may be formed on portions of the RIE-able layer that are not covered by the resist layer. The resist layer may be removed and an RIE performed to remove exposed portions of the RIE-able layer and portions of the oxide layer beneath the exposed portions of the RIE-able layer. Thereafter, the metal layer may be removed, and the component may be formed in an opening in the oxide layer formed during the RIE.
摘要翻译：提供了制造器件部件的方法。可以提供包括RIE停止层，形成在RIE停止层上的氧化物层和形成在氧化物层上的RIE能层的衬底。抗蚀剂层可以在RIE能层上图案化。可以在RIE能层的未被抗蚀剂层覆盖的部分上形成金属层。可以去除抗蚀剂层，并执行RIE以去除RIE能层的暴露部分和在RIE能层的暴露部分下方的氧化物层的部分。此后，可以去除金属层，并且可以在RIE中形成的氧化物层的开口中形成该部件。

10. 发明授权

US08623223B2 Method using block copolymers for making a master disk with radial binary encoded nondata marks for nanoimprinting patterned magnetic recording disks 失效
标题翻译：使用嵌段共聚物制造具有用于纳米压印图案化磁记录盘的径向二进制编码非标记标记的母盘的方法
公开(公告)号：US08623223B2
公开(公告)日：2014-01-07
申请号：US13299664
申请日：2011-11-18
申请人： Elizabeth Ann Dobisz , Jeffrey S. Lille , Guoliang Liu , Ricardo Ruiz , Gabriel Zeltzer
发明人： Elizabeth Ann Dobisz , Jeffrey S. Lille , Guoliang Liu , Ricardo Ruiz , Gabriel Zeltzer
IPC分类号： B44C1/22
CPC分类号： G11B5/746 , B82Y30/00 , G11B5/743 , G11B5/855 , G11B5/86
摘要： A method using directed self-assembly of BCPs enables the making of a master disk for nanoimprinting magnetic recording disks that have patterned data islands and patterned binary encoded nondata marks. The method uses guided self-assembly of a BCP to form patterns of sets of radial lines and circumferential gaps of one of the BCP components, which can be used as an etch mask to make the master disk. The sets of radial lines and circumferential gaps can be patterned so as to encode binary numbers. The pattern is replicated as binary encoded nondata marks into the nanoimprinted disks, with the marks functioning as binary numbers for data sector numbers and/or servo sector numbers. If the disks also use a chevron servo pattern, the binary numbers can function to identify groups of tracks associated with the chevron servo pattern.
摘要翻译：使用BCP的定向自组装的方法使得能够制造具有图案化数据岛和图案化二进制编码非标记的纳米压印磁记录盘的母盘。该方法使用BCP的引导自组装来形成一组BCP组件的径向线和圆周间隙的图案，其可用作蚀刻掩模以制造母盘。径向线和圆周间隙的组可以被图案化以便编码二进制数。该图案作为二进制编码的非标记标记复制到纳米压印盘中，其标记用作数据扇区号和/或伺服扇区号的二进制数。如果磁盘还使用人字形伺服模式，则二进制数字可用于识别与人字形伺服模式相关联的磁道组。

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