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    • 1. 发明申请
    • DEVICE AND METHOD FOR INTERFEROMETRIC VIBRATION MEASUREMENT OF AN OBJECT
    • 物体的非线性振动测量装置和方法
    • US20110090508A1
    • 2011-04-21
    • US12907117
    • 2010-10-19
    • Christian RembeAlexander DrabenstedtMichael GartnerMike HerberichAndreas Leonhardt
    • Christian RembeAlexander DrabenstedtMichael GartnerMike HerberichAndreas Leonhardt
    • G01B9/02G01H9/00
    • G01H9/00
    • A device for interferometric vibration measurement on an object (8), having a radiation source (1) for generating an original beam, a first beam splitter for dividing the original beam into a measuring beam and a reference beam (4, 5), a detector (10) and a focusing device (9). The device is implemented in such a way that the measuring beam at least partly reflected by the object and the reference beam are superimposed on a detection area of the detector, and the focusing device is arranged in the beam path of the measuring beam for focusing the measuring beam onto a measuring point (7) on the object. It is important that, by using the device, a measuring beam having a wavelength greater than 1100 nm can be generated and that the device additionally has an image unit (12) for two-dimensional imaging of at least a sub-region of the object surrounding the measuring point. The focusing device is arranged in the beam path between image unit and object and being constructed such that the focus of the measuring beam lies approximately in the focal plane of the image unit and, by use of the focusing device, the focal point of the measuring beam and the focal plane of the imaging unit are displaceable simultaneously. A method for interferometric vibration measurement on an object using the device is also provided.
    • 一种用于在物体(8)上进行干涉测量的装置,具有用于产生原始光束的辐射源(1),用于将原始光束分成测量光束的第一分束器和参考光束(4,5), 检测器(10)和聚焦装置(9)。 该装置的实现方式是将至少部分地由物体和参考光束反射的测量光束叠加在检测器的检测区域上,并且聚焦装置布置在测量光束的光束路径中,以便聚焦 测量光束到物体上的测量点(7)上。 重要的是,通过使用该装置,可以产生波长大于1100nm的测量束,并且该装置还具有用于对象的至少一个子区域的二维成像的图像单元(12) 围绕测量点。 聚焦装置布置在图像单元和物体之间的光束路径中,并且被构造成使得测量光束的焦点大致位于图像单元的焦平面中,并且通过使用聚焦装置,测量的焦点 光束和成像单元的焦平面可同时移位。 还提供了一种使用该装置对物体进行干涉测量的方法。