专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US6037273A Method and apparatus for insitu vapor generation 失效
公开(公告)号：US6037273A
公开(公告)日：2000-03-14
申请号：US33391
申请日：1998-03-02
申请人： Christian M. Gronet , Peter A. Knoot , Gary E. Miner , Guangcai Xing , David R. Lopes , Satheesh Kuppurao
发明人： Christian M. Gronet , Peter A. Knoot , Gary E. Miner , Guangcai Xing , David R. Lopes , Satheesh Kuppurao
IPC分类号： C01B13/32 , H01L21/316 , H01L21/02
CPC分类号： H01L21/02238 , C01B13/322 , H01L21/02255 , H01L21/3165 , H01L21/31662
摘要： A method of forming an oxide on a substrate. According to the method of the present invention a substrate is placed in a chamber. An oxygen containing gas and a hydrogen containing gas are then fed into the chamber. The oxygen containing gas and the hydrogen containing gas are then caused to react with one another to form water vapor in the chamber. The water vapor then oxidizes the substrate.

2. 发明授权

US6159866A Method for insitu vapor generation for forming an oxide on a substrate 有权
标题翻译：用于在基板上形成氧化物的原位蒸汽产生方法
公开(公告)号：US6159866A
公开(公告)日：2000-12-12
申请号：US507946
申请日：2000-02-22
申请人： Christian M. Gronet , Peter A. Knoot , Gary E. Miner , Guangcai Xing , David R. Lopes , Satheesh Kuppurao
发明人： Christian M. Gronet , Peter A. Knoot , Gary E. Miner , Guangcai Xing , David R. Lopes , Satheesh Kuppurao
IPC分类号： C01B13/32 , H01L21/316 , H01L21/31
CPC分类号： C01B13/322 , H01L21/02238 , H01L21/02255 , H01L21/3165 , H01L21/31662
摘要： A method of forming an oxide on a substrate. According to the method of the present invention a substrate is placed in a chamber. An oxygen containing gas and a hydrogen containing gas are then fed into the chamber. The oxygen containing gas and the hydrogen containing gas are then caused to react with one another to form water vapor in the chamber. The water vapor then oxidizes the substrate.
摘要翻译：在基板上形成氧化物的方法。根据本发明的方法，将基板放置在室中。然后将含氧气体和含氢气体进料到室中。然后使含氧气体和含氢气体彼此反应以在室中形成水蒸气。然后水蒸汽氧化底物。

3. 发明授权

US06410456B1 Method and apparatus for insitu vapor generation 有权
公开(公告)号：US06410456B1
公开(公告)日：2002-06-25
申请号：US09718443
申请日：2000-11-21
申请人： Christian M. Gronet , Peter A. Knoot , Gary E. Miner , Guangcai Xing , David R. Lopes , Satheesh Kuppurao
发明人： Christian M. Gronet , Peter A. Knoot , Gary E. Miner , Guangcai Xing , David R. Lopes , Satheesh Kuppurao
IPC分类号： C23C16455
CPC分类号： C01B13/322 , H01L21/02238 , H01L21/02255 , H01L21/3165 , H01L21/31662
摘要： A method of forming an oxide on a substrate. According to the method of the present invention a substrate is placed in a chamber. An oxygen containing gas and a hydrogen containing gas are then fed into the chamber. The oxygen containing gas and the hydrogen containing gas are then caused to react with one another to form water vapor in the chamber. The water vapor then oxidizes the substrate.

4. 发明授权

US06187133B1 Gas manifold for uniform gas distribution and photochemistry 失效
标题翻译：气体歧管用于均匀气体分布和光化学
公开(公告)号：US06187133B1
公开(公告)日：2001-02-13
申请号：US09087489
申请日：1998-05-29
申请人： Peter A. Knoot
发明人： Peter A. Knoot
IPC分类号： C23F102
CPC分类号： C23C16/45565 , C23C16/452 , C23C16/481 , C23C16/482
摘要： The invention provides a system for providing a flow of a short-lived, reactive process gas species into an RTP chamber without creating ionic species. An RTP chamber includes a transparent quartz window assembly. The window assembly has a first pane facing a wafer inside the RTP chamber. A second pane is positioned adjacent a heat lamp array on the outside of the RTP chamber. A window side wall joins the first and second panes at their peripheral edges to provide an internal chamber therebetween. A plurality of channels extend through the first pane from the internal chamber to the inside of the RTP chamber. A port communicates between the internal chamber and a process gas source. The window assembly also includes a reflective surface facing the internal chamber. An ultraviolet light source is positioned to illuminate process gas flowing through the window assembly with ultraviolet light such that the ultraviolet light alters the chemistry of the process gas. A process using the reactive gas species can be turned on and off quickly by turning on and off the ultraviolet light.
摘要翻译：本发明提供了一种用于将短寿命的反应性工艺气体物流流入RTP室而不产生离子物质的系统。 RTP室包括透明石英窗组件。窗户组件具有面向RTP室内的晶片的第一窗格。第二个窗格位于RTP室外侧的加热灯阵列附近。窗口侧壁在其周边边缘处连接第一和第二窗格，以在它们之间提供内部室。多个通道从第一玻璃板从内腔延伸到RTP室的内部。一个端口在内部腔室和一个工艺气体源之间连通。窗组件还包括面向内室的反射表面。定位紫外光源以用紫外光照亮流过窗户组件的工艺气体，使得紫外线改变工艺气体的化学性质。使用反应性气体物质的方法可以通过打开和关闭紫外线来快速打开和关闭。

5. 发明授权

US06395643B1 Gas manifold for uniform gas distribution and photochemistry 失效
标题翻译：气体歧管用于均匀气体分布和光化学
公开(公告)号：US06395643B1
公开(公告)日：2002-05-28
申请号：US09712312
申请日：2000-11-13
申请人： Peter A. Knoot
发明人： Peter A. Knoot
IPC分类号： H01L21302
CPC分类号： C23C16/45565 , C23C16/452 , C23C16/481 , C23C16/482
摘要： The invention provides a system for providing a flow of a short-lived, reactive process gas species into an RTP chamber without creating ionic species. An RTP chamber includes a transparent quartz window assembly. The window assembly has a first pane facing a wafer inside the RTP chamber. A second pane is positioned adjacent a heat lamp array on the outside of the RTP chamber. A window side wall joins the first and second panes at their peripheral edges to provide an internal chamber therebetween. A plurality of channels extend through the first pane from the internal chamber to the inside of the RTP chamber. A port communicates between the internal chamber and a process gas source. The window assembly also includes a reflective surface facing the internal chamber. An ultraviolet light source is positioned to illuminate process gas flowing through the window assembly with ultraviolet light such that the ultraviolet light alters the chemistry of the process gas. A process using the reactive gas species can be turned on and off quickly by turning on and off the ultraviolet light.
摘要翻译：本发明提供了一种用于将短寿命的反应性工艺气体物流流入RTP室而不产生离子物质的系统。 RTP室包括透明石英窗组件。窗户组件具有面向RTP室内的晶片的第一窗格。第二个窗格位于RTP室外侧的加热灯阵列附近。窗口侧壁在其周边边缘处连接第一和第二窗格，以在它们之间提供内部室。多个通道从第一玻璃板从内腔延伸到RTP室的内部。一个端口在内部腔室和一个工艺气体源之间连通。窗组件还包括面向内室的反射表面。定位紫外光源以用紫外光照亮流过窗户组件的工艺气体，使得紫外线改变工艺气体的化学性质。使用反应性气体物质的方法可以通过打开和关闭紫外线来快速打开和关闭。

6. 发明授权

US6164816A Tuning a substrate temperature measurement system 有权
标题翻译：调整基板温度测量系统
公开(公告)号：US6164816A
公开(公告)日：2000-12-26
申请号：US133993
申请日：1998-08-14
申请人： Wolfgang Aderhold , Abhilash J. Mayur , Peter A. Knoot
发明人： Wolfgang Aderhold , Abhilash J. Mayur , Peter A. Knoot
IPC分类号： G01K15/00 , G01J5/00 , G01J5/10 , H01L21/26 , H01L21/66
CPC分类号： G01J5/0003 , G01J5/0007 , G01J2005/0048
摘要： A technique and system for tuning temperature sensor readings in a thermal processing chamber includes determining an actual temperature profile for a substrate based on measurements of the substrate. A simulated temperature profile for the substrate is calculated using a respective interim temperature correction value for one or more temperature sensors associated with the chamber. A Gaussian-like distribution for thermal contributions from multiple radiation sources in the chamber can be used to simulate the temperature profile. The simulated temperature profile and the actual temperature profile are combined to form an estimated temperature profile. A final value for each respective temperature correction value is determined using an optimization algorithm which results in the estimated temperature profile being substantially uniform across the surface of the substrate. Each final temperature correction value is used as an offset to temperature measurements obtained from the corresponding temperature sensors.
摘要翻译：用于调节热处理室中的温度传感器读数的技术和系统包括基于衬底的测量来确定衬底的实际温度分布。使用与腔室相关联的一个或多个温度传感器的相应临时温度校正值来计算衬底的模拟温度曲线。可以使用室内来自多个辐射源的热贡献的高斯状分布来模拟温度分布。将模拟温度曲线和实际温度曲线组合以形成估计的温度曲线。使用优化算法来确定每个相应温度校正值的最终值，该优化算法导致估计的温度分布在衬底的表面上基本均匀。每个最终温度校正值用作从相应的温度传感器获得的温度测量的偏移。

7. 发明授权

US6130415A Low temperature control of rapid thermal processes 有权
标题翻译：快速热处理的低温控制
公开(公告)号：US6130415A
公开(公告)日：2000-10-10
申请号：US296223
申请日：1999-04-22
申请人： Peter A. Knoot
发明人： Peter A. Knoot
IPC分类号： H01L21/00 , H05B1/02 , A21B2/00 , G01J5/00
CPC分类号： H01L21/67248
摘要： An apparatus for processing a semiconductor substrate mounted in a thermal processing chamber includes a heating system for heating the substrate, which includes lamps facing a front side of the substrate and a power supply system providing power to at least one of the lamps with a DC power component and an AC power component at a selected frequency. The AC power component is a selected fraction of the DC power component. The apparatus also has a sensor facing a back side of the substrate for providing a detected signal indicative of measured radiation from the back side of the substrate. A lock-in system provides a lock-in signal indicative of a magnitude of an AC component of the detected signal at the selected frequency in response to the detected signal and a reference signal at the selected frequency. A processing system is adapted to determine a transmitted portion of the measured radiation that is transmitted through the substrate based upon the lock-in signal, the detected signal and the selected fraction.
摘要翻译：一种用于处理安装在热处理室中的半导体衬底的装置，包括用于加热衬底的加热系统，该加热系统包括面向衬底前侧的灯和向DC至少一个灯提供电力的电源系统组件和选定频率的交流电源组件。交流功率分量是直流功率分量的一部分。该装置还具有面向基板的背面的传感器，用于提供表示来自基板的背侧的测量的辐射的检测信号。锁定系统响应于检测到的信号和选定频率的参考信号，提供指示所选频率处的检测信号的AC分量的大小的锁定信号。处理系统适于基于所述锁定信号，所检测的信号和所选择的分数来确定经过所述衬底传输的所测量的辐射的透射部分。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式