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    • 1. 发明申请
    • Pixel with asymmetric transfer gate channel doping
    • 具有不对称传输栅极通道掺杂的像素
    • US20070262355A1
    • 2007-11-15
    • US11707848
    • 2007-02-16
    • Chintamani PalsuleChanghoon ChoiFredrick LaMasterJohn StanbackThomas DunganThomas JoyHomayoon Haddad
    • Chintamani PalsuleChanghoon ChoiFredrick LaMasterJohn StanbackThomas DunganThomas JoyHomayoon Haddad
    • H01L27/148
    • H01L27/14643H01L27/14601H01L29/66659H01L31/035281
    • A pixel including a substrate of a first conductivity type and having a surface, a photodetector of a second conductivity type that is opposite the first conductivity type, a floating diffusion region of the second conductivity type, a transfer region between the photodetector and the floating diffusion, a gate positioned above the transfer region and partially overlapping the photodetector, and a pinning layer of the first conductivity type extending at least across the photodetector from the gate. A channel implant of the first conductivity type extending from between a midpoint of the transfer gate and the floating diffusion to at least across the photodiode and having a dopant concentration such that a dopant concentration of the transfer region is greater proximate to the photodetector than the floating diffusion, and wherein a peak dopant concentration of the channel implant is at a level and at a depth below the surface such that a partially-buried channel is formed in the transfer region between the photodiode and floating diffusion when the transfer gate is energized.
    • 包括具有第一导电类型并具有表面的衬底的像素,与第一导电类型相反的第二导电类型的光电检测器,第二导电类型的浮动扩散区域,光电检测器和浮动扩散区之间的传输区域 位于所述转印区域上方并且部分地与所述光电检测器重叠的栅极以及至少从所述栅极延伸穿过所述光电检测器的所述第一导电类型的钉扎层。 第一导电类型的沟道植入物从传输栅极的中点和浮动扩散延伸到至少跨越光电二极管并具有掺杂剂浓度,使得传输区域的掺杂剂浓度在接近光电检测器处比浮置 扩散,并且其中沟道注入的峰值掺杂剂浓度处于表面以下的水平和深度,使得当传输栅极通电时,在光电二极管和浮动扩散之间的传输区域中形成部分埋置的沟道。
    • 2. 发明授权
    • Pixel with asymmetric transfer gate channel doping
    • 具有不对称传输栅极通道掺杂的像素
    • US07834383B2
    • 2010-11-16
    • US12481056
    • 2009-06-09
    • Chintamani P. PalsuleChanghoon ChoiFredrick P. LaMasterJohn H. StanbackThomas E. DunganThomas JoyHomayoon Haddad
    • Chintamani P. PalsuleChanghoon ChoiFredrick P. LaMasterJohn H. StanbackThomas E. DunganThomas JoyHomayoon Haddad
    • H01L31/062H01L31/113
    • H01L27/14643H01L27/14601H01L29/66659H01L31/035281
    • A pixel including a substrate of a first conductivity type and having a surface, a photodetector of a second conductivity type that is opposite the first conductivity type, a floating diffusion region of the second conductivity type, a transfer region between the photodetector and the floating diffusion, a gate positioned above the transfer region and partially overlapping the photodetector, and a pinning layer of the first conductivity type extending at least across the photodetector from the gate. A channel implant of the first conductivity type extending from between a midpoint of the transfer gate and the floating diffusion to at least across the photodiode and having a dopant concentration such that a dopant concentration of the transfer region is greater proximate to the photodetector than the floating diffusion, and wherein a peak dopant concentration of the channel implant is at a level and at a depth below the surface such that a partially-buried channel is formed in the transfer region between the photodiode and floating diffusion when the transfer gate is energized.
    • 包括具有第一导电类型并具有表面的衬底的像素,与第一导电类型相反的第二导电类型的光电检测器,第二导电类型的浮动扩散区域,光电检测器和浮动扩散区之间的传输区域 位于所述转印区域上方并且部分地与所述光电检测器重叠的栅极以及至少从所述栅极延伸穿过所述光电检测器的所述第一导电类型的钉扎层。 第一导电类型的沟道植入物从传输栅极的中点和浮动扩散延伸到至少跨越光电二极管并具有掺杂剂浓度,使得传输区域的掺杂剂浓度在接近光电检测器处比浮置 扩散,并且其中沟道注入的峰值掺杂剂浓度处于表面以下的水平和深度,使得当传输栅极通电时,在光电二极管和浮动扩散之间的传输区域中形成部分埋置的沟道。
    • 3. 发明申请
    • PIXEL WITH ASYMMETRIC TRANSFER GATE CHANNEL DOPING
    • 具有不对称传输门控通道的像素
    • US20090250734A1
    • 2009-10-08
    • US12481056
    • 2009-06-09
    • CHINTAMANI P. PALSULEChanghoon ChoiFredrick P. LaMasterJohn H. StanbackThomas E. DunganThomas JoyHomayoon Haddad
    • CHINTAMANI P. PALSULEChanghoon ChoiFredrick P. LaMasterJohn H. StanbackThomas E. DunganThomas JoyHomayoon Haddad
    • H01L31/06
    • H01L27/14643H01L27/14601H01L29/66659H01L31/035281
    • A pixel including a substrate of a first conductivity type and having a surface, a photodetector of a second conductivity type that is opposite the first conductivity type, a floating diffusion region of the second conductivity type, a transfer region between the photodetector and the floating diffusion, a gate positioned above the transfer region and partially overlapping the photodetector, and a pinning layer of the first conductivity type extending at least across the photodetector from the gate. A channel implant of the first conductivity type extending from between a midpoint of the transfer gate and the floating diffusion to at least across the photodiode and having a dopant concentration such that a dopant concentration of the transfer region is greater proximate to the photodetector than the floating diffusion, and wherein a peak dopant concentration of the channel implant is at a level and at a depth below the surface such that a partially-buried channel is formed in the transfer region between the photodiode and floating diffusion when the transfer gate is energized.
    • 包括具有第一导电类型并具有表面的衬底的像素,与第一导电类型相反的第二导电类型的光电检测器,第二导电类型的浮动扩散区域,光电检测器和浮动扩散区之间的传输区域 位于所述转印区域上方并且部分地与所述光电检测器重叠的栅极以及至少从所述栅极延伸穿过所述光电检测器的所述第一导电类型的钉扎层。 第一导电类型的沟道植入物从传输栅极的中点和浮动扩散延伸到至少跨越光电二极管并具有掺杂剂浓度,使得传输区域的掺杂剂浓度在接近光电检测器处比浮置 扩散,并且其中沟道注入的峰值掺杂剂浓度处于表面以下的水平和深度,使得当传输栅极通电时,在光电二极管和浮动扩散之间的传输区域中形成部分埋置的沟道。
    • 4. 发明授权
    • Pixel with asymmetric transfer gate channel doping
    • 具有不对称传输栅极通道掺杂的像素
    • US07557397B2
    • 2009-07-07
    • US11707848
    • 2007-02-16
    • Chintamani P. PalsuleChanghoon ChoiFredrick P. LaMasterJohn H. StanbackThomas E. DunganThomas JoyHomayoon Haddad
    • Chintamani P. PalsuleChanghoon ChoiFredrick P. LaMasterJohn H. StanbackThomas E. DunganThomas JoyHomayoon Haddad
    • H01L31/06H01L21/00
    • H01L27/14643H01L27/14601H01L29/66659H01L31/035281
    • A pixel including a substrate of a first conductivity type and having a surface, a photodetector of a second conductivity type that is opposite the first conductivity type, a floating diffusion region of the second conductivity type, a transfer region between the photodetector and the floating diffusion, a gate positioned above the transfer region and partially overlapping the photodetector, and a pinning layer of the first conductivity type extending at least across the photodetector from the gate. A channel implant of the first conductivity type extending from between a midpoint of the transfer gate and the floating diffusion to at least across the photodiode and having a dopant concentration such that a dopant concentration of the transfer region is greater proximate to the photodetector than the floating diffusion, and wherein a peak dopant concentration of the channel implant is at a level and at a depth below the surface such that a partially-buried channel is formed in the transfer region between the photodiode and floating diffusion when the transfer gate is energized.
    • 包括具有第一导电类型并具有表面的衬底的像素,与第一导电类型相反的第二导电类型的光电检测器,第二导电类型的浮动扩散区域,光电检测器和浮动扩散区之间的传输区域 位于所述转印区域上方并且部分地与所述光电检测器重叠的栅极以及至少从所述栅极延伸穿过所述光电检测器的所述第一导电类型的钉扎层。 第一导电类型的沟道植入物从传输栅极的中点和浮动扩散延伸到至少跨越光电二极管并具有掺杂剂浓度,使得传输区域的掺杂剂浓度在接近光电检测器处比浮置 扩散,并且其中沟道注入的峰值掺杂剂浓度处于表面以下的水平和深度,使得当传输栅极通电时,在光电二极管和浮动扩散之间的传输区域中形成部分埋置的沟道。