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1. 发明授权

US07682552B2 Capacitive measurement method and system for nanoimprint process monitoring 失效
标题翻译：纳米压印过程监测的电容测量方法和系统
公开(公告)号：US07682552B2
公开(公告)日：2010-03-23
申请号：US10851113
申请日：2004-05-24
申请人： Chin-Chung Nien , Ta-Chuan Liu , Hong Hocheng
发明人： Chin-Chung Nien , Ta-Chuan Liu , Hong Hocheng
IPC分类号： G01B11/00
CPC分类号： G03F7/0002 , B81C1/0046 , B81C99/0065 , B81C2201/0153 , B82Y10/00 , B82Y40/00
摘要： The present invention relates to a capacitive measurement method and system for a nanoimprint process, which arranges a plurality of electrode plates on both the backside of the master mold and the surface of the supporting base carrying the wafer substrate to form a plurality of capacitive structures. By monitoring the capacitance variation signal caused by the continuous variations in the thickness and the material properties of the resist during the imprint process, the status of the resist can be monitored and recorded, which is used as the references for determining the timing to demold in the nanoimprint process and for maintaining the flatness of the resist. Accordingly, the nanoimprint process can be automated easier and the quality and the throughput of of the nanometer scaled imprint product can be improved.
摘要翻译：本发明涉及一种用于纳米压印工艺的电容测量方法和系统，其在主模的背面和承载晶片衬底的支撑基体的表面上布置多个电极板以形成多个电容结构。通过监测由压印过程中厚度的连续变化和抗蚀剂的材料特性引起的电容变化信号，可以监测和记录抗蚀剂的状态，作为确定脱模时间的参考纳米压印工艺和用于保持抗蚀剂的平整度。因此，纳米压印工艺可以更容易自动化，并且能够提高纳米压印产品的质量和生产量。

2. 发明申请

US20050212178A1 Capacitive measurement method and system for nanoimprint process monitoring 失效
标题翻译：纳米压印过程监测的电容测量方法和系统
公开(公告)号：US20050212178A1
公开(公告)日：2005-09-29
申请号：US10851113
申请日：2004-05-24
申请人： Chin-Chung Nien , Ta-Chuan Liu , Hong Hocheng
发明人： Chin-Chung Nien , Ta-Chuan Liu , Hong Hocheng
IPC分类号： B29C59/02 , B81C1/00 , B81C99/00 , G03F7/00 , H05K3/00
CPC分类号： G03F7/0002 , B81C1/0046 , B81C99/0065 , B81C2201/0153 , B82Y10/00 , B82Y40/00
摘要： The present invention relates to a capacitive measurement method and system for a nanoimprint process, which arranges a plurality of electrode plates on both the backside of the master mold and the surface of the supporting base carrying the wafer substrate to form a plurality of capacitive structures. By monitoring the capacitance variation signal caused by the continuous variations in the thickness and the material properties of the resist during the imprint process, the status of the resist can be monitored and recorded, which is used as the references for determining the timing to demold in the nanoimprint process and for maintaining the flatness of the resist. Accordingly, the nanoimprint process can be automated easier and the quality and the throughput of of the nanometer scaled imprint product can be improved.
摘要翻译：本发明涉及一种用于纳米压印工艺的电容测量方法和系统，其在主模的背面和承载晶片衬底的支撑基体的表面上布置多个电极板以形成多个电容结构。通过监测由压印过程中厚度的连续变化和抗蚀剂的材料特性引起的电容变化信号，可以监测和记录抗蚀剂的状态，作为确定脱模时间的参考纳米压印工艺和用于保持抗蚀剂的平整度。因此，纳米压印工艺可以更容易自动化，并且能够提高纳米压印产品的质量和生产量。

3. 发明授权

US07303703B2 Nano-imprint system with mold deformation detector and method of monitoring the same 有权
标题翻译：具有模具变形检测器的纳米压印系统及其监控方法
公开(公告)号：US07303703B2
公开(公告)日：2007-12-04
申请号：US10791926
申请日：2004-03-02
申请人： Hong Hocheng , Chin Chung Nien
发明人： Hong Hocheng , Chin Chung Nien
IPC分类号： B29C43/58 , B29C45/76
CPC分类号： B29C37/005 , B29C43/003 , B29C43/021 , B29C43/58 , B29C2043/025 , B29C2043/5825 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10S977/887
摘要： A system for nano-imprint with mold deformation detector is disclosed for real-time monitoring of the deformation of the mold. An electrostatic plate capacitor is embedded in the mold, serving as the deformation detector. The capacitor includes two opposite metal film electrodes formed by silicon micromachining technique on opposite surfaces of the mold and connected by a metal lead. During imprinting, the mold is acted upon by an external force and deformation occurs, which induces change of distance between the metal film electrodes and thus variation of the capacitance of the capacitor. The amount of deformation of the mold can then be assessed by comparing the capacitance with a reference. Thus, real-time detection and monitoring of the deformation of the nano-imprint mold is realized. Also disclosed is a method for carrying out the real-time monitoring of the deformation of the mold.
摘要翻译：公开了一种用于模具变形检测器的纳米压印系统，用于实时监测模具的变形。静电板电容器嵌入模具中，用作变形检测器。该电容器包括通过硅微加工技术在模具的相对表面上形成并通过金属引线连接的两个相对的金属膜电极。在压印期间，模具被外力作用，发生变形，这引起金属膜电极之间的距离变化，从而导致电容器的电容变化。然后可以通过将电容与参考值进行比较来评估模具的变形量。因此，实现了纳米压印模具变形的实时检测和监测。还公开了一种用于对模具变形进行实时监测的方法。

4. 发明授权

US06909998B2 In-situ monitoring method and system for mold deformation in nanoimprint 失效
标题翻译：纳米压印模具变形现场监测方法及系统
公开(公告)号：US06909998B2
公开(公告)日：2005-06-21
申请号：US10665191
申请日：2003-09-16
申请人： Hong Hocheng , Chin Chung Nien
发明人： Hong Hocheng , Chin Chung Nien
IPC分类号： G01N21/84 , G06F11/30 , H01L21/31
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10S977/887
摘要： The present invention provides a method for in-situ real-time monitoring of mold deformation by using a database to store temporary information during the following steps: (a) providing a mark on the mold body that is easy to observe in order to monitor the mold deformation, (b) installing a signal source and a monitor device for monitoring the deformation quantity on the mold, (c) transforming the above deformation quantity into computer signals for storing in the database and (d) issuing controlling or warning signals to the imprinting machine based on the processing results of the stored information in the database.
摘要翻译：本发明提供了一种通过使用数据库在以下步骤中存储临时信息的原位实时监测模具变形的方法：（a）在模具体上提供容易观察的标记，以便监视模具变形，（b）安装用于监测模具上变形量的信号源和监控装置，（c）将上述变形量变换成计算机信号，存储在数据库中;（d）发出控制或警告信号到基于存储在数据库中的信息的处理结果的打印机。

5. 发明授权

US08985056B2 Detecting platform for holding a tiny insect 有权
标题翻译：检测平台持有一个微小的昆虫
公开(公告)号：US08985056B2
公开(公告)日：2015-03-24
申请号：US13419090
申请日：2012-03-13
申请人： Rong-Shun Chen , Jhih-Shun Yang , Yu-Ching Lin , Hung-Yin Tsai , Chien-Hung Lin , Hong Hocheng , Li-An Chu
发明人： Rong-Shun Chen , Jhih-Shun Yang , Yu-Ching Lin , Hung-Yin Tsai , Chien-Hung Lin , Hong Hocheng , Li-An Chu
IPC分类号： A01K1/03 , A01K67/033
CPC分类号： A01K67/033
摘要： A detecting platform for holding a tiny insect includes a main body forming a containing space, which passes through the main body and is surrounded by side walls of the main body. A first side wall and a second side wall of the side walls are opposite to each other, and the area of the second side wall is smaller than that of the first side wall. The main body forms a first opening and a second opening passing through the first side wall and the second side wall respectively for the tiny insects entering and leaving the containing space. A bottom plate covers a first through surface of the containing space to form a bottom surface and a detecting area is configured thereon to holding the tiny insects. Accordingly, the tiny insects can stay on the detecting area so as to detect the characteristics of the tiny insects expediently.
摘要翻译：用于保持微小昆虫的检测平台包括形成容纳空间的主体，该主体穿过主体并被主体的侧壁包围。侧壁的第一侧壁和第二侧壁彼此相对，并且第二侧壁的面积小于第一侧壁的面积。主体分别形成通过第一侧壁和第二侧壁的第一开口和第二开口，用于进入和离开容纳空间的微小昆虫。底板覆盖容纳空间的第一通过表面以形成底面，并且在其上构造检测区域以保持微小的昆虫。因此，微小的昆虫可以留在检测区域，以方便地检测微小昆虫的特征。

6. 发明申请

US20130083974A1 IMAGE METHOD FOR CLASSIFYING INSECTS AND CLASSIFYING PROCESS FOR INSECTS 有权
标题翻译：图像分类方法和分类分类方法
公开(公告)号：US20130083974A1
公开(公告)日：2013-04-04
申请号：US13419155
申请日：2012-03-13
申请人： Hung-Yin Tsai , Yu-Ching Lin , Yu-Cheng Wu , Rong-Shun Chen , Hong Hocheng , Li-An Chu
发明人： Hung-Yin Tsai , Yu-Ching Lin , Yu-Cheng Wu , Rong-Shun Chen , Hong Hocheng , Li-An Chu
IPC分类号： G06K9/62
CPC分类号： G06K9/00 , G06K9/38 , G06K9/4642
摘要： An image method for classifying insects includes the following steps: obtaining detecting images of the insects in a detecting area; obtaining a first foreground image related to the insects by background subtraction; extracting the saturation from the first foreground image and eliminating the non-characteristic objects therein to obtain a second foreground image; extracting the characteristics related to the insects from the second foreground image according to a threshold; and, determining the classifications or the sexes of the insects according to the characteristics. Accordingly, the image method for classifying insects can be used for automatically classifying the insects so as to save the manpower and time.
摘要翻译：用于分类昆虫的图像方法包括以下步骤：在检测区域中获取昆虫的检测图像; 通过背景减法获得与昆虫相关的第一个前景图像; 从第一前景图像提取饱和度并消除其中的非特征对象以获得第二前景图像; 根据阈值从第二前景图像提取与昆虫相关的特征; 并根据特征确定昆虫的分类或性别。因此，用于分类昆虫的图像方法可以用于昆虫的自动分类，以节省人力和时间。

7. 发明授权

US06872662B1 Method for detecting the endpoint of a chemical mechanical polishing (CMP) process 失效
标题翻译：用于检测化学机械抛光（CMP）工艺的终点的方法
公开(公告)号：US06872662B1
公开(公告)日：2005-03-29
申请号：US10695106
申请日：2003-10-27
申请人： Hong Hocheng , Yun-Liang Huang
发明人： Hong Hocheng , Yun-Liang Huang
IPC分类号： B24B37/04 , B24B49/12 , B24B49/14 , H01L21/302 , H01L21/461
CPC分类号： B24B37/013 , B24B49/12 , B24B49/14 , Y10S438/907 , Y10S438/959
摘要： A method for detecting the endpoint of a chemical mechanical polishing (CMP) process uses the slope variation of temperature difference of polishing pad. The method combines temperature measurement at polishing pad and atmosphere, and numerical analysis to figure out the curve of temperature difference variation versus polishing time. The endpoint of CMP is determined by the change of the slope of the curve. The method allows endpoint to be detected in-situ at the polishing apparatus, without stopping polishing process.
摘要翻译：用于检测化学机械抛光（CMP）工艺的终点的方法使用抛光垫的温度差的斜率变化。该方法结合了抛光垫的温度测量和气氛，并进行了数值分析，得出了温差变化与抛光时间的关系曲线。 CMP的终点由曲线的斜率的变化决定。该方法允许在抛光装置处原地检测端点，而不停止抛光工艺。

8. 发明授权

US08755571B2 Image method for classifying insects and classifying process for insects 有权
标题翻译：用于昆虫分类和分类过程的图像方法
公开(公告)号：US08755571B2
公开(公告)日：2014-06-17
申请号：US13419155
申请日：2012-03-13
申请人： Hung-Yin Tsai , Yu-Ching Lin , Yu-Cheng Wu , Rong-Shun Chen , Hong Hocheng , Li-An Chu
发明人： Hung-Yin Tsai , Yu-Ching Lin , Yu-Cheng Wu , Rong-Shun Chen , Hong Hocheng , Li-An Chu
IPC分类号： G06K9/00
CPC分类号： G06K9/00 , G06K9/38 , G06K9/4642
摘要： An image method for classifying insects includes the following steps: obtaining detecting images of the insects in a detecting area; obtaining a first foreground image related to the insects by background subtraction; extracting the saturation from the first foreground image and eliminating the non-characteristic objects therein to obtain a second foreground image; extracting the characteristics related to the insects from the second foreground image according to a threshold; and, determining the classifications or the sexes of the insects according to the characteristics. Accordingly, the image method for classifying insects can be used for automatically classifying the insects so as to save the manpower and time.
摘要翻译：用于分类昆虫的图像方法包括以下步骤：在检测区域中获取昆虫的检测图像; 通过背景减法获得与昆虫相关的第一个前景图像; 从第一前景图像提取饱和度并消除其中的非特征对象以获得第二前景图像; 根据阈值从第二前景图像提取与昆虫相关的特征; 并根据特征确定昆虫的分类或性别。因此，用于分类昆虫的图像方法可以用于昆虫的自动分类，以节省人力和时间。

9. 发明申请

US20130081572A1 DETECTING PLATFORM FOR HOLDING A TINY INSECT 有权
标题翻译：检测平台用于控制TINY INSECT
公开(公告)号：US20130081572A1
公开(公告)日：2013-04-04
申请号：US13419090
申请日：2012-03-13
申请人： Rong-Shun Chen , Jhih-Shun Yang , Yu-Ching Lin , Hung-Yin Tsai , Chien-Hung Lin , Hong Hocheng , Li-An Chu
发明人： Rong-Shun Chen , Jhih-Shun Yang , Yu-Ching Lin , Hung-Yin Tsai , Chien-Hung Lin , Hong Hocheng , Li-An Chu
IPC分类号： A01K29/00
CPC分类号： A01K67/033
摘要： A detecting platform for holding a tiny insect includes a main body forming a containing space, which passes through the main body and is surrounded by side walls of the main body. A first side wall and a second side wall of the side walls are opposite to each other, and the area of the second side wall is smaller than that of the first side wall. The main body forms a first opening and a second opening passing through the first side wall and the second side wall respectively for the tiny insects entering and leaving the containing space. A bottom plate covers a first through surface of the containing space to form a bottom surface and a detecting area is configured thereon to holding the tiny insects. Accordingly, the tiny insects can stay on the detecting area so as to detect the characteristics of the tiny insects expediently.
摘要翻译：用于保持微小昆虫的检测平台包括形成容纳空间的主体，该主体穿过主体并被主体的侧壁包围。侧壁的第一侧壁和第二侧壁彼此相对，并且第二侧壁的面积小于第一侧壁的面积。主体分别形成通过第一侧壁和第二侧壁的第一开口和第二开口，用于进入和离开容纳空间的微小昆虫。底板覆盖容纳空间的第一通过表面以形成底面，并且在其上构造检测区域以保持微小的昆虫。因此，微小的昆虫可以留在检测区域，以方便地检测微小昆虫的特征。

10. 发明申请

US20110134440A1 MONITORING APPARATUS AND METHOD FOR UNIFORMITY AND RESIDUAL THICKNESS OF NANO-TRANSFER PRINTING PROCESS 审中-公开
标题翻译：监测装置和纳米转印印刷工艺的均匀和残留厚度的方法
公开(公告)号：US20110134440A1
公开(公告)日：2011-06-09
申请号：US12959354
申请日：2010-12-02
申请人： Hong Hocheng , Wei-Hsuan Hsu
发明人： Hong Hocheng , Wei-Hsuan Hsu
IPC分类号： G01B11/28 , G01J4/00 , G01B3/22 , G06F15/00
CPC分类号： G01B11/0625
摘要： The monitoring apparatus for uniformity and residual thickness of nano-transfer printing process is installed at a specific location in the surrounding of a transfer printing unit, and, during any stage of the transfer printing process, performs monitoring or measuring the forming rate and forming profile of the forming material inside the transfer printing unit. The monitoring apparatus includes a detection unit, a measuring unit and an analysis unit. The detection unit emits a detection ray to the transfer printing unit. The measuring unit receives a reaction signal of the detection ray passing through the transfer printing unit. The analysis unit analyzes the reaction signal to determine transfer uniformity and the material residual thickness in the transfer print unit.
摘要翻译：纳米转印印刷工艺的均匀性和残留厚度的监控装置安装在转印印刷单元的周围的特定位置，并且在转印印刷过程的任何阶段期间，执行监测或测量成型速率和形成轮廓的转印印刷单元内的成形材料。监视装置包括检测单元，测量单元和分析单元。检测单元向转印单元发出检测光线。测量单元接收通过转印机的检测光线的反应信号。分析单元分析反应信号以确定转印单元中的转印均匀性和材料残留厚度。

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