专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20070227565A1 Workstation and cleaning apparatus thereof 审中-公开
标题翻译：工作站及其清洁装置
公开(公告)号：US20070227565A1
公开(公告)日：2007-10-04
申请号：US11391236
申请日：2006-03-29
申请人： Chih-Wing Chang , Chun-Yi Ho , S. Liang , Chung-Jen Chen
发明人： Chih-Wing Chang , Chun-Yi Ho , S. Liang , Chung-Jen Chen
IPC分类号： B08B3/00
CPC分类号： H01L21/67028
摘要： A workstation comprises a substrate, a cleaning apparatus used for cleaning a mask, and a controller for controlling the cleaning apparatus. The cleaning apparatus comprises a housing having dust-free surroundings, a holder, a cleaner and a blower. The holder, the cleaner and the blower are disposed in the housing. The mask comprises a glass plate with particles adhered thereto and a pellicle. The holder encloses the pellicle and exposes the glass plate with the particles adhered thereto. The cleaner comprises an acting portion used for removing the particle from the glass plate of the substrate. The blower blows a gas to dry the glass plate of the substrate when the particle is removed by the acting portion of the cleaner.
摘要翻译：工作站包括基板，用于清洁掩模的清洁装置和用于控制清洁装置的控制器。清洁装置包括具有无尘环境的壳体，保持器，清洁器和鼓风机。保持器，清洁器和鼓风机设置在壳体中。掩模包括具有粘附到其上的颗粒的玻璃板和防护薄膜。保持器围绕防护薄膜组件并暴露玻璃板，附着有颗粒。清洁器包括用于从基板的玻璃板去除颗粒的作用部分。当通过清洁器的作用部分去除颗粒时，鼓风机吹扫气体以干燥基板的玻璃板。

IPRDB

热门服务

关于我们

友情链接

联系方式